甲基丙烯酸二环戊基酯 | 34759-34-7

• 物质功能分类: 有机原料 - 羧酸类化合物及衍生物
• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 中文名称: 甲基丙烯酸二环戊基酯
• 中文别名: 二环戊基甲基丙烯酸酯；八氢-4,7-甲桥-1H-茚-5-基甲基丙烯酸酯；甲基丙烯酸三环[5.2.1.02,6]癸-8-基酯；甲基丙烯酸三环[5.2.1.2,6]癸-8-基酯
• 英文名称: tricyclo[5.2.1.02,6 ]deca-8-yl methacrylate
• 英文别名: Octahydro-1H-4,7-methanoinden-5-yl methacrylate；8-tricyclo[5.2.1.02,6]decanyl 2-methylprop-2-enoate
• CAS: 34759-34-7
• 化学式: C₁₄H₂₀O₂
• 分子量: 220.312
• InChiKey: NWAHZAIDMVNENC-UHFFFAOYSA-N

物化性质

• 沸点：
  296℃
• 密度：
  1.04
• 闪点：
  145 °C
• 稳定性/保质期：

  密封、冷藏保存。

计算性质

• 辛醇/水分配系数(LogP)：
  3.8
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.79
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

安全信息

• 海关编码：
  2916209090
• 危险性防范说明：
  P264,P280,P302+P352+P332+P313+P362+P364,P305+P351+P338+P337+P313
• 危险性描述：
  H315,H319

反应信息

• 作为反应物：
  描述：

  甲基丙烯酸二环戊基酯 在 2,4,5,6-四(9H-咔唑-9-基)异酞腈 、 碘 、 sodium phosphate 作用下， 以 乙醇 、 水 、 甲苯 为溶剂， 反应 26.0h， 生成 octahydro-1H-4,7-methanoinden-5-yl 2-((tert-butyldiphenylsilyl)methyl)acrylate
  参考文献：
  名称：

  有机光催化实现硅烷羧酸的脱羧烯丙基化

  摘要：

  在此，我们提出了一种在温和条件下可见光促进的无过渡金属的烯丙基硅烷化反应。该方案由廉价的有机光催化剂实现，并提供了高效且简洁的取代烯丙基硅烷的合成路线，特别是使用容易获得的烯丙基砜和稳定的硅烷羧酸作为甲硅烷基自由基前体。进一步的研究表明，该策略通常也与乙烯基砜相容以获取乙烯基硅烷。银催化体系为实现硅烷羧酸的脱羧烯丙基化开辟了新的途径。

  DOI：

  10.1021/acs.orglett.3c02907
• 作为产物：
  描述：

  八羟基-4,7-亚甲基-1H-吲哚-5-醇 、 甲基丙烯酰氯 在 4-二甲氨基吡啶 作用下， 以 四氢呋喃 为溶剂， 反应 24.5h， 生成 甲基丙烯酸二环戊基酯
  参考文献：
  名称：

  Glass transition temperature enhancement of PMMA through copolymerization with PMAAM and PTCM mediated by hydrogen bonding

  摘要：

  A series of poly(methyl methacrylate-co-methacrylamide-co-tricyclodecyl methacrylate) (PMMA-co-PMAAM-co-PTCM) copolymers possessing high glass transition temperatures and high transparency are prepared. By incorporating the aliphatic tricyclodecyl methacrylate moiety into the PMMA-co-PMAA main chain results in high glass transition temperature and high transparency of PMMA-based polymeric material. The TCM content affects the fraction of hydrogen bonding in these terpolymers, small content of TCM does not sacrifice the fraction of hydrogen-bonded association in and does not cause T-g decrease. The extent of free amide group plays the major role in dictating moisture absorption of terpolymers. The incorporation of TCM significantly reduces the moisture absorption of terpolymers due to its hydrophobic and bulky tricyclodecyl group. In addition, the TCM plays the role of inert diluent to convert portion of the strong self-associated hydrogen bonded amide groups into inter-associated hydrogen bonding between carbonyl groups of ester units and MAAM. (C) 2010 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.polymer.2009.12.039

文献信息

• BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20120141938A1

  公开（公告）日：2012-06-07

  A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin.

  一种化学放大型光刻胶组合物，包括基础聚合物、酸发生剂和胺淬灭剂，后者为β-丙氨酸、γ-氨基丁酸或5-氨基戊酸的衍生物，具有一个被酸不稳定基团所取代的羧基，这种组合物在曝光前后具有高对比度的碱性溶解速率，并且能够形成高分辨率、最小粗糙度和宽焦深度的良好图案轮廓。
• PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION
  申请人：Wada Kenji

  公开号：US20100233617A1

  公开（公告）日：2010-09-16

  A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X—B—R   (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

  一种感光组合物包括：（A）含有与下式（I）所表示的化合物对应的重复单元的树脂；该树脂能够在受到光敏射线或辐射照射后产生酸基团：Z-A-X—B—R   （I）其中Z代表一个能够在受到光敏射线或辐射照射后由阳离子离去而形成酸基团的基团；A代表一个烷基基团；X代表一个单键或含杂原子的二价连接基团；B代表一个单键、一个氧原子或—N（Rx）-；Rx代表一个氢原子或一个一价有机基团；R代表一个通过Y取代的一价有机基团；当B代表—N（Rx）-时，R和Rx可以结合在一起形成一个环；Y代表一个可聚合的基团。
• RESIN COMPOSITION
  申请人：TORAY INDUSTRIES, INC.

  公开号：US20190241716A1

  公开（公告）日：2019-08-08

  The present invention provides a resin composition having a high sensitivity and serving to produce a cured film with a low water absorption rate. The resin composition includes: (a) an alkali-soluble resin and (b1) an amido-phenol compound containing a phenolic hydroxyl group in which a monovalent group as represented by the undermentioned general formula (1) is located at the ortho position and/or (b2) an aromatic amido acid compound containing a carboxy group in which a monovalent group as represented by the undermentioned general formula (2) is located at the ortho position: wherein in general formula (1), X is a monovalent organic group having an alkyl group that contains 2 to 20 carbon atoms and bonds directly to the carbonyl carbon in general formula (1) or a monovalent organic group that has —(YO) n —; and in general formula (2), U is a monovalent organic group that has an alkyl group containing 2 to 20 carbon atoms and bonding directly to the amide nitrogen in general formula (2) or a monovalent organic group that has —(YO) n —; wherein Y is an alkylene group containing 1 to 10 carbon atoms and n is an integer of 1 to 20.

  本发明提供了一种树脂组合物，具有高灵敏度，并用于生产具有低吸水率的固化膜。该树脂组合物包括：(a)可溶于碱的树脂和(b1)含有酚羟基的酰胺酚化合物，其中酚羟基化合物中的单价基在邻位上，和/或(b2)含有羧基的芳香酰胺酸化合物，其中羧基化合物中的单价基在邻位上，其通式如下所示：在通式(1)中，X是一个单价有机基，具有含有2到20个碳原子的烷基，并直接连接到通式(1)中的羰基碳，或具有—(YO)n—的单价有机基；在通式(2)中，U是一个单价有机基，具有含有2到20个碳原子的烷基，并直接连接到通式(2)中的酰胺氮，或具有—(YO)n—的单价有机基；其中Y是含有1到10个碳原子的烷基，n是1到20的整数。
• NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, DISPLAY DEVICE PROVIDED WITH ELEMENT, AND ORGANIC EL DISPLAY
  申请人：TORAY INDUSTRIES, INC.

  公开号：US20190302617A1

  公开（公告）日：2019-10-03

  The present invention provides a negative photosensitive resin composition that has high pigment dispersibility and stability and can reduce residues of unexposed portions during development. The present invention provides a negative photosensitive resin composition containing an (A) alkali-soluble resin, a (B) dispersant having an amine value exceeding 0, a (C) benzofuranone based organic pigment having an amide structure, a (D) radical polymerizable compound, and a (E) photoinitiator. In this negative photosensitive resin composition, the (A) alkali-soluble resin contains one or more selected from the group consisting of a (A1) polyimide, a (A2) polyimide precursor, a (A3) polybenzoxazole, and a (A4) polybenzoxazole precursor, and the (B) dispersant having an amine value exceeding 0 contains a (B1) dispersant including a repeating unit represented by general formula (2) and a repeating unit represented by general formula (3) and a (B2) dispersant that is an acrylic block copolymer having an amine value of 15 to 60 mgKOH/g and/or a (B3) dispersant having a urethane bond. (In general formula (2), R 1 represents an alkylene group. R 2 and R 3 , which may be the same or different, each represents hydrogen, an alkyl group or a hydroxyl group. x represents an integer of 0 to 20. However, when x is 0, at least one of R 2 and R 3 is an alkyl group. m represents an integer of 1 to 100. In general formula (3), n represents an integer of 1 to 100.)

  本发明提供了一种具有高颜料分散性和稳定性的负性感光树脂组合物，可以减少在显影过程中未曝光部分的残留物。本发明提供了一种包含（A）可溶于碱性树脂、（B）胺值超过0的分散剂、（C）苯并呋喃酮基有机颜料（具有酰胺结构）、（D）自由基聚合化合物和（E）光引发剂的负性感光树脂组合物。在这种负性感光树脂组合物中，（A）可溶于碱性树脂包含从以下组中选择的一种或多种：（A1）聚酰亚胺、（A2）聚酰亚胺前体、（A3）聚苯并噁唑和（A4）聚苯并噁唑前体；而具有胺值超过0的（B）分散剂包括具有由通用公式（2）表示的重复单元和由通用公式（3）表示的重复单元的（B1）分散剂，以及胺值为15至60 mgKOH/g的丙烯酸酯嵌段共聚物（B2）和/或具有脲键的（B3）分散剂。（在通用公式（2）中，R1表示烷基基团。R2和R3，可能相同也可能不同，每个表示氢、烷基基团或羟基。x表示0到20的整数。但是，当x为0时，R2和R3中至少有一个是烷基基团。m表示1到100的整数。在通用公式（3）中，n表示1到100的整数。）
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20210356862A1

  公开（公告）日：2021-11-18

  An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin. M 1 + A − -L-B − M 2 + (I)

  一种感光射线或辐射敏感的树脂组合物，包括通式（I）所表示的化合物和可酸分解树脂。M1+A−-L-B−M2+（I）

表征谱图