Curable composition for photo imprints, method for forming pattern, fine pattern, and method for manufacturing semiconductor device
申请人:FUJIFILM Corporation
公开号:US10175576B2
公开(公告)日:2019-01-08
Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. The curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a C1-8 fluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; R1 represents a C1-8 substituent being free from a polymerizable group; R2 represents a hydrogen atom, C1-8 substituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; R1 and R2 may combine with each other to form a ring.
本发明提供了一种用于照片印记的固化组合物,该组合物具有优异的脱模性和油墨润湿性。这种用于照片印记的可固化组合物包括:可聚合化合物(A);光聚合引发剂(B);和脱模剂(C),脱模剂(C)由下式(I)表示。Rf 代表具有两个或两个以上氟原子的 C1-8 含氟烷基;m 代表 1 或 2;L 代表单键或二价连接基团;n 代表 1 或 2;X 代表单键、氧原子、硫原子或氮原子;R1 代表不含可聚合基团的 C1-8 代基;R2 代表氢原子、C1-8 代基或二价连接基团;p 代表 1 或 2,q 代表 0 或 1,r 代表 1 或 2;R1 和 R2 可相互结合形成一个环。