Versatile synthesis of bicyclo[4.3.0]nonenes and bicyclo[4.4.0]decenes by a domino Heck-Diels-Alder reaction
作者:Kiah How Ang、Stefan Bräse、Arno G. Steinig、Frank E. Meyer、Amadeu Llebaria、Katharina Voigt、Armin de Meijere
DOI:10.1016/0040-4020(96)00639-4
日期:1996.8
afterwards in a one-pot process) to give bicyclo[4.3.0]nonene and bicyclo[4.4.0]-decene derivatives in good to excellent yields. Among the examples reported are the first cases of intramolecular Heck reactions with a (bromomethylene)cyclopropane starter or/and a methylenecyclopropane terminator which occur without ring opening of the cyclopropyl group.
Thermotropic liquid crystal polymer microcapsules, a method for preparing the same, and cosmetic compositions containing the same
申请人:——
公开号:US20030129247A1
公开(公告)日:2003-07-10
There are provided thermotropic liquid crystal polymer microcapsules which can show behavior of liquid crystal as it is within polymer phase due to phase separation between liquid crystal and polymer, so to be incorporated into cosmetic composition as an additive for visual effect, and in loading active ingredients within liquid crystal, can improve the stability of the active ingredients in cosmetic base; and a method for preparing the same; and cosmetic compositions containing the same.
Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
申请人:——
公开号:US20040167322A1
公开(公告)日:2004-08-26
A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.
BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:Hatakeyama Jun
公开号:US20120141938A1
公开(公告)日:2012-06-07
A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin.
A process for preparing N-alkenyl-amides by reacting the corresponding NH-amides with acetylenes in the liquid phase in the presence of basic alkali metal compounds and of a cocatalyst comprises using as the cocatalyst compounds of the general formulae (Ia) and/or (Ib)
R
1
O—(CH
2
CH
2
CH
2
CH
2
O)
n
—H (Ia):
R
1
O—(CH
2
CH
2
CH
2
CH
2
O)
n
—R
2
, (Ib):
where n is 1, 2 or 3 and R
1
and R
2
are independently C
1
- to C
6
-alkyl or C
2
- to C
6
-alkenyl, or together a butenyl unit.