申请人:JSR Corporation
公开号:EP1162506A1
公开(公告)日:2001-12-12
A radiation-sensitive resin composition used as a chemically amplified positive tone resist responsive to short wavelength active radiation such as KrF excimer laser and ArF excimer laser is disclosed. The resin composition comprises: (A) an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, the resin comprising a lactone cyclic structure of the following formula (1),
wherein a is an integer from 1-3, b is an integer from 0-9, and R1 represents a monovalent organic group, and (B) a photoacid generator. The composition has high transmittance of radiation, exhibits high sensitivity, resolution, and pattern shape, and can produce semiconductors at a high yield without producing resolution defects during microfabrication.
本发明公开了一种对辐射敏感的树脂组合物,可用作对 KrF 准分子激光器和 ArF 准分子激光器等短波长有源辐射有反应的化学放大正调抗蚀剂。该树脂组合物包括:(A) 不溶于碱或几乎不溶于碱的含酸可解离基团的树脂,当酸可解离基团解离时,该树脂变为可溶于碱,该树脂包括下式(1)的内酯环状结构、
其中 a 是 1-3 的整数,b 是 0-9 的整数,R1 代表一价有机基团,以及 (B) 光酸发生器。该组合物具有较高的辐射透过率,表现出较高的灵敏度、分辨率和图案形状,并能以较高的产量生产半导体,而不会在微细加工过程中产生分辨率缺陷。