Carboxyl-containing lactone compound, polymer, resist composition, and patterning process
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US08062831B2
公开(公告)日:2011-11-22
Carboxyl-containing lactone compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic ring, W is CH2, O or S, k1 is an integer of 0 to 4, and k2 is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.
具有式(1)的含羧基内酯化合物是新颖的,其中R1为H、F、甲基或三氟甲基,R2和R3为H或一价碳氢基团,或R2和R3可以共同形成一个脂肪环,W为CH2、O或S,k1为0到4的整数,k2为0或1。它们可用作单体,生产对辐射≦500 nm透明的聚合物。以该聚合物为基料的辐射敏感型光阻组合物表现出优异的性能,包括分辨率、LER、图案密度依赖性和曝光余量。