tert-butyl 6-hydroxy-2-oxohexahydro-3,5-methano-2H-cyclopenta[b]furan-7-carboxylate | 1004532-11-9

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: tert-butyl 6-hydroxy-2-oxohexahydro-3,5-methano-2H-cyclopenta[b]furan-7-carboxylate
• 英文别名: tert-butyl 6-hydroxy-2-oxohexahydro-3,5-methano-2H-cyclopenta [b] furan-7-carboxylic acid；tert-butyl 6-hydroxy-2-oxohexahydro-3,5-methano-2H-cyclopenta[b]furane-7-carboxylate；tert-butyl 2-hydroxy-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-9-carboxylate
• CAS: 1004532-11-9
• 化学式: C₁₃H₁₈O₅
• 分子量: 254.283
• InChiKey: GZJDWDXNIQJKEG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.6
• 重原子数：
  18
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.85
• 拓扑面积：
  72.8
• 氢给体数：
  1
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  tert-butyl 6-hydroxy-2-oxohexahydro-3,5-methano-2H-cyclopenta[b]furan-7-carboxylate 在 4-二甲氨基吡啶 、 甲酸 、 草酰氯 、 三乙胺 作用下， 以 二氯甲烷 、 水 、 甲苯 、 乙腈 为溶剂， 反应 19.5h， 生成 2'-(6-adamantanecarbonyloxy-2-oxohexahydro-3,5-methano-2H-cyclopenta [b] furan-7-carbonyloxy)ethanesulfonate triphenylsulfonium
  参考文献：
  名称：

  술포늄염, 레지스트 조성물 및 레지스트 패턴 형성 방법

  摘要：

  本发明提供一种如下化学式（1）所示的砜季铵盐：在该式中，A表示可以被杂原子取代，表示二价碳氢基，A表示二价碳氢基，A表示可以被氢原子或杂原子取代，表示一价碳氢基，B表示可以包含醚氧原子的亚烷基或芳烃基，k表示0或1。R、R和R表示烷基、烯烃基、氧代烷基、芳基、芳基烷基或芳基氧代烷基。本发明提供了将上述砜季铵盐引入作为光刻胶组合物的解决方案，该组合物在微细加工技术，特别是电子束或EUV光刻技术中具有非常高的分辨率，并且具有能够赋予LER较小图案的效果。

  公开号：

  KR20150071677A

文献信息

• ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Kinsho Takeshi

  公开号：US20100304295A1

  公开（公告）日：2010-12-02

  An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R 2 is H or monovalent hydrocarbon, R 3 and R 4 are H or monovalent hydrocarbon, or R 3 and R 4 , taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.

  一种酸敏感酯单体具有螺环结构，其化学式如下（1），其中Z是具有可聚合双键的一价基团，X是形成环戊烷、环己烷或诺邦烷环的二价基团，R2是H或一价碳氢基团，R3和R4是H或一价碳氢基团，或者R3和R4一起表示形成环戊烷或环己烷环的二价基团，n为1或2。从酸敏感酯单体获得的聚合物在酸催化消除反应中具有很高的反应性，因此可以用于制备具有高分辨率的抗蚀组合物。
• LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：HASEGAWA Koji

  公开号：US20090233242A1

  公开（公告）日：2009-09-17

  Lactone-containing compounds having formula (1) are novel wherein R 1 is H, F, methyl or trifluoromethyl, R 2 and R 3 are H or monovalent hydrocarbon groups, or R 2 and R 3 may together form an aliphatic hydrocarbon ring, R 4 is H or CO 2 R 5 , R 5 is a monovalent hydrocarbon group, W is CH 2 , O or S, and k 1 is 3, 4 or 5. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.

  含有式（1）的内酯化合物是新颖的，其中R1为H、F、甲基或三氟甲基，R2和R3为H或一价碳氢基团，或R2和R3可以共同形成脂肪烃环，R4为H或CO2R5，R5为一价碳氢基团，W为CH2、O或S，k1为3、4或5。它们可用作单体以生产对辐射≦500纳米透明的聚合物。包含这些聚合物作为基础树脂的辐射敏感抗蚀组合物表现出优异的性能，包括分辨率、LER、图案密度依赖性和曝光余量。
• SULFONIUM SALT, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION USING SAID POLYMER, AND RESIST PATTERNING PROCESS
  申请人：DOMON Daisuke

  公开号：US20120308920A1

  公开（公告）日：2012-12-06

  There is disclosed a sulfonium salt shown by the following general formula (1). There can be a sulfonium salt capable of introducing an acid-generating unit generating an acid having an appropriate acid strength and not impairing adhesion with a substrate into a base polymer; a polymer using the said sulfonium salt; a chemically amplified resist composition using the said polymer as a base polymer; and a patterning process using the said chemically amplified resist composition.

  公开了一种由以下一般式（1）所示的硫銨鹽。可以有一种硫銨鹽，能夠將一個能夠生成具有適當酸度並不損害與基材的粘附性的酸的酸生成單元引入到基聚合物中；使用所述硫銨鹽的聚合物；使用所述聚合物作為基聚合物的化學放大的抗蝕組成物；以及使用所述化學放大的抗蝕組成物的圖案形成過程。
• Sulfonium salt, resist composition and resist pattern forming process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US09285678B2

  公开（公告）日：2016-03-15

  A sulfonium salt of formula (1) is provided wherein A1 is a divalent hydrocarbon group, A2 is a divalent hydrocarbon group, A3 is hydrogen or a monovalent hydrocarbon group, B1 is an alkylene or arylene group, k is 0 or 1, R1, R2 and R3 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl. A resist composition comprising the sulfonium salt as PAG exhibits a very high resolution when processed by EB and EUV lithography. A pattern with minimal LER is obtainable.

  提供了公式（1）的磺鎓盐，其中A1是二价碳氢基团，A2是二价碳氢基团，A3是氢或一价碳氢基团，B1是烷基或芳基，k为0或1，R1、R2和R3为烷基、烯基、氧代烷基、芳基、芳基烷基或芳基氧代烷基。含有该磺鎓盐作为PAG的抗蚀剂组合物在经过EB和EUV光刻处理时展现出非常高的分辨率。可以获得最小的LER图案。
• CARBOXYL-CONTAINING LACTONE COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHINACHI Satoshi

  公开号：US20090274984A1

  公开（公告）日：2009-11-05

  Carboxyl-containing lactone compounds having formula (1) are novel wherein R 1 is H, F, methyl or trifluoromethyl, R 2 and R 3 are H or monovalent hydrocarbon groups, or R 2 and R 3 may together form an aliphatic ring, W is CH 2 , O or S, k 1 is an integer of 0 to 4, and k 2 is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.

  具有式（1）的含羧基内酯化合物是新型的，其中R1为H、F、甲基或三氟甲基，R2和R3为H或一价碳氢基团，或者R2和R3可以共同形成脂肪环，W为CH2、O或S，k1为0到4的整数，k2为0或1。它们可用作单体，生产透射辐射≦500nm的聚合物。以这些聚合物为基础树脂的辐射敏感抗蚀剂组合物具有优异的性能，包括分辨率、LER、图案密度依赖性和曝光余量。