Dielectric properties of highly<i>c</i>-axis oriented chemical solution deposition derived SrBi<sub>4</sub>Ti<sub>4</sub>O<sub>15</sub>thin films
作者:Hiroyuki Kambara、Theodor Schneller、Yukio Sakabe、Rainer Waser
DOI:10.1002/pssa.200824317
日期:2009.1
C-axis oriented thin films of SrBi4Ti4O15 were prepared by a chemical solution deposition method. The influence of precursor chemistry and processing conditions on the resulting film morphology and the dielectric properties of SrBi4Ti4O15 thin films were investigated. By controlling the film formation process, highly c-axis oriented SrBi4Ti4O15 thin films on (111)Pt/Si substrates were obtained at temperatures
SrBi4Ti4O15 的 C 轴取向薄膜是通过化学溶液沉积法制备的。研究了前驱体化学和加工条件对所得薄膜形态和 SrBi4Ti4O15 薄膜介电性能的影响。通过控制成膜过程,在600℃和700℃的温度下,在(111)Pt/Si衬底上获得了高c轴取向的SrBi4Ti4O15薄膜。薄膜的介电常数约为 200,与 55 至 160 nm 的薄膜厚度无关。随着温度从 25 °C 升高到 200 °C,介电常数也显示出稳定值。在 500 kV/cm 的施加电场下,薄膜在 125 °C 下的漏电流约为 10-7 A/cm2。这些薄膜表现出稳定的介电常数和优异的绝缘性能。