申请人:Hokko Chemical Industry Co., Ltd.
公开号:US04752326A1
公开(公告)日:1988-06-21
As compounds is provided a pyrazole derivative of the formula ##STR1## wherein R.sub.1a, R.sub.1b and R.sub.1c are each a hydrogen atom, a halogen atom, a nitro group, an amino group, a (lower) alkyl group, a halo-(lower)alkyl group, a(lower)alkenyl group, a (lower)alkynyl group, a (lower)alkylcarbonylamino group, a (lower)alkoxycarbonylamino group, a mono-(lower) alkylaminocarbonylamino group or a di-(lower)alkylaminocarbonylamino group; R.sub.2 is a hydrogen atom, a (lower)alkyl group, a (lower)alkenyl group, a (lower)alkynyl group, a (lower) alkoxy(lower)alkyl group, a (lower)alkylthio(lower)alkyl group, a (lower)alkylcarbonyl(lowr)alkyl group, a (lower) alkoxycarbonyl(lower)alkyl group, a (lower)alkylthiocarbonyl(lower)alkyl group, a cyano(lower)alkyl group, a (lower)alkylsulfonyl group, phenylsulfonyl group, a halogen-substituted phenylsulfonyl group or a (lower) alkyl-substituted phenylsulfonyl group, and X and Y are the same or different and each are a halogen atom. The pyrazoles are useful as herbicidal agent and may be produced by a variety of processes.
提供的化合物是公式##STR1##中的吡唑衍生物,其中R.sub.1a、R.sub.1b和R.sub.1c分别是氢原子、卤素原子、硝基、氨基、(较低)烷基、卤代(较低)烷基、(较低)烯基、(较低)炔基、(较低)烷基羰基氨基、(较低)烷氧羰基氨基、单(较低)烷基氨基羰基氨基或双(较低)烷基氨基羰基氨基;R.sub.2是氢原子、(较低)烷基、(较低)烯基、(较低)炔基、(较低)烷氧基(较低)烷基、(较低)烷硫基(较低)烷基、(较低)烷基羰基(较低)烷基、(较低)烷氧羰基(较低)烷基、(较低)烷硫羰基(较低)烷基、氰基(较低)烷基、(较低)烷基磺酰基、苯基磺酰基、卤代苯基磺酰基或(较低)烷基取代的苯基磺酰基,X和Y相同或不同,且各自是卤素原子。这些吡唑化合物可用作除草剂,并可通过各种工艺生产。