Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.
Salt suitable for an acid generator and a chemically amplified resist composition containing the same
申请人:Harada Yukako
公开号:US20070078269A1
公开(公告)日:2007-04-05
The present invention provides a salt of the formula (I):
wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one —CH
2
— group is substituted with —COO— group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q
1
and Q
2
each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A
+
represents organic counter ion; and n shows an integer of 0 to 12.
The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
申请人:ICHIKAWA Koji
公开号:US20100304293A1
公开(公告)日:2010-12-02
A salt represented by the formula (a):
wherein Q
1
and Q
2
each independently represent a fluorine atom etc.,
X
1
represents a single bond etc.,
X
2
represents a single bond etc.,
Y
1
represents a C3-C6 alicyclic hydrocarbon group etc., with the proviso that —X
2
—Y
1
group has one or more fluorine atoms, and
Z
+
represents an organic counter cation, and a photoresist composition comprising the salt represented by the formula (a) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
A salt represented by the formula (I0):
wherein Q
1
and Q
2
each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L
1
represents a divalent C1-C17 hydrocarbon group in which one or more —CH
2
— can be replaced by —O— or —CO—, m represents 1 or 2, and Z
m+
represents m-valent organic or inorganic cation.
SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20160052877A1
公开(公告)日:2016-02-25
A salt represented by the formula (I);
wherein Q
1
and Q
2
each independently represent a fluorine atom or a C
1
to C
6
perfluoroalkyl group, L
b1
represents a single bond or a divalent C
1
to C
24
saturated hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C
3
to C
18
alicyclic hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C
6
to C
20
aromatic hydrocarbon group, and Z
+
represents an organic sulfonium cation or an organic iodonium cation.