1,4-diethynyl-2-aminobenzene | 137000-70-5

• 物质功能分类: 有机原料 - 氨基化合物 - 无环单胺、多胺及其衍生物和盐
• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1,4-diethynyl-2-aminobenzene
• 英文别名: 2,5-Diethynylaniline
• CAS: 137000-70-5
• 化学式: C₁₀H₇N
• mdl: MFCD19204385
• 分子量: 141.172
• InChiKey: KLXIWNNKFUMLDY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  11
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  26
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  1,4-diethynyl-2-aminobenzene 在 sodium hydride 作用下， 以 N,N-二甲基甲酰胺 、 苯 为溶剂， 反应 17.0h， 生成 6-乙炔-1H-吲哚
  参考文献：
  名称：

  Synthesis and transformations of 1,4-diethynyl-2-nitrobenzene

  摘要：

  用POCl3加热2-硝基-1,4-双(1,3,3-三甲基吲哚啉-2-亚基乙酰)苯，然后用NaOH水溶液处理，得到2-硝基-1,4-二乙炔苯。考虑了涉及该产品的某些转化。2-乙酰氨基-1,4-二乙炔苯及其二吗啉甲基衍生物发生杂环化反应，生成末端和甲烷碳取代的吲哚乙炔。

  DOI：

  10.1007/s11172-006-0160-z
• 作为产物：
  描述：

  1,4-二乙炔基-2-硝基苯 在 ammonium hydroxide 、 锌 作用下， 反应 48.0h， 生成 1,4-diethynyl-2-aminobenzene
  参考文献：
  名称：

  Synthesis and transformations of 1,4-diethynyl-2-nitrobenzene

  摘要：

  用POCl3加热2-硝基-1,4-双(1,3,3-三甲基吲哚啉-2-亚基乙酰)苯，然后用NaOH水溶液处理，得到2-硝基-1,4-二乙炔苯。考虑了涉及该产品的某些转化。2-乙酰氨基-1,4-二乙炔苯及其二吗啉甲基衍生物发生杂环化反应，生成末端和甲烷碳取代的吲哚乙炔。

  DOI：

  10.1007/s11172-006-0160-z

文献信息

• NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20190169211A1

  公开（公告）日：2019-06-06

  The present invention has been made in view of the circumstances herein. An object of the present invention is to provide: a tetracarboxylic dianhydride which can lead to a polyimide usable as a base resin of a photosensitive resin composition capable of forming a fine pattern and obtaining high resolution without impairing excellent characteristics such as mechanical strength and adhesiveness; a polyimide resin obtained by using the tetracarboxylic dianhydride; and a method for producing the polyimide resin. The tetracarboxylic dianhydride is shown by the following general formula (1).

  本发明是基于本文中的情况而作出的。本发明的目的是提供：一种四羧酸二酐，可导致聚酰亚胺，作为感光树脂组合物的基树脂，能够形成细微图案并获得高分辨率，同时不损害优异的特性，如机械强度和粘附性；通过使用该四羧酸二酐获得的聚酰亚胺树脂；以及生产该聚酰亚胺树脂的方法。该四羧酸二酐由以下通用式（1）所示。
• ACETYLENE COMPOUND, SALT THEREOF, CONDENSATE THEREOF, AND COMPOSITION THEREOF
  申请人：Fujifilm Corporation

  公开号：EP2202220A1

  公开（公告）日：2010-06-30

  [Problem to be Solved] To provide an acetylene compound having a structure in which a unit having an amino group and a unit having an ethynyl group are bonded via a linking group, the acetylene compound being introducable to a polymer having thermal resistance. [Means for Solving the Problem] An acetylene compound represented by the following Formula (1) and a salt thereof: wherein in Formula (1), X represents a single bond or a divalent linking group; A represents a hydrocarbon group, a heteroaromatic ring or a heteroalicyclic compound; B represents a hydrocarbon group, a heteroaromatic ring, a heteroalicyclic compound or a single bond; R1 represents a hydrogen atom, a hydrocarbon group, a heteroaromatic ring, a heteroalicyclic compound or a silyl group; R4 represents a hydrogen atom or a group that can be a substituent of an amino group; and m, n and a each independently represent an integer of 1 or greater.

  解决的问题是提供一种乙炔化合物，其结构中含有通过连接基团连接的具有氨基团和乙炔基团的单元，该乙炔化合物可引入到具有热阻抗的聚合物中。解决问题的方法是通过以下式（1）表示的乙炔化合物及其盐：其中在式（1）中，X代表单键或二价连接基团；A代表烃基团、杂环芳香环或杂环脂环化合物；B代表烃基团、杂环芳香环、杂环脂环化合物或单键；R1代表氢原子、烃基团、杂环芳香环、杂环脂环化合物或硅基团；R4代表氢原子或可作为氨基团的取代基团；m、n和a分别独立表示大于或等于1的整数。
• Synthesis and optical characterisation of platinum(ii) poly-yne polymers incorporating substituted 1,4-diethynylbenzene derivatives and an investigation of the intermolecular interactions in the diethynylbenzene molecular precursorsElectronic supplementary information (ESI) available: atomic cooordinates for 6 and 7. See http://www.rsc.org/suppdata/nj/b2/b206946f/
  作者：Muhammad S. Khan、Muna R. A. Al-Mandhary、Mohammed K. Al-Suti、Timothy C. Corcoran、Yaqoub Al-Mahrooqi、J. Paul Attfield、Neil Feeder、William I. F. David、Kenneth Shankland、Richard H. Friend、Anna Köhler、Elisabeth A. Marseglia、Emilio Tedesco、Chiu C. Tang、Paul R. Raithby、Jonathan C. Collings、Karl P. Roscoe、Andrei S. Batsanov、Lorna M. Stimson、Todd B. Marder

  DOI：10.1039/b206946f

  日期：2003.1.8

  A series of 1,4-diethynylbenzene (1) derivatives, H–CC–R–CC–H with R=C6H3NH2 (2), C6H3F (3), C6H2F2-2,5 (4), C6F4 (5), C6H2(OCH3)2-2,5 (6) and C6H2(OnC8H17)2-2,5 (7) has been synthesised and their crystal structures determined by single crystal (2–5) or powder (6, 7) X-ray diffraction. The CCH⋯πCC hydrogen bonds dominating structure 1 are gradually replaced by CC–H⋯F ones with the increase of fluorination

  一系列1,4-二乙炔基苯（1）衍生物，H–C C–R–C C–H，R = C 6 H 3 NH 2 （2），C 6 H 3 F（3），C 6 H 2 F 2 -2,5（4），C 6 F 4 （5），C 6 H 2（OCH 3）2 -2,5（6）和C 6 H 2（O n C 8 H 17）2 -2,5（7）已被合成，并且其晶体结构确定由单晶（2 - 5）或粉末（6，7）的X射线衍射。与c CH⋯π Ç Ç氢键支配结构1被逐渐被C代替CH⋯˚F那些与氟化的增加（3 → 5），或完全被C代替CH⋯N和NH⋯π Ç Ç键在2和C CH⋯O在6和7中。相关的铂基聚合物，反式-[– Pt（P n Bu 3）2 –C C–R–C C–] n （R =如上，C 6 H 4）已制备并通过光谱法和热重分析表征，表明氨基-和甲氧基衍生物具有最低的热稳定性，而氟化衍生物显示出随着氟化作用的增加而增加的热稳定性。光
• NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
  申请人：International Business Machines Corporation

  公开号：US20210317270A1

  公开（公告）日：2021-10-14

  Provided is a compound that can be used as a base resin for a photosensitive resin composition. The photosensitive resin can form a fine pattern and can achieve high resolution without impairing mechanical strength and solubility. The compound is represented by the general formula (1): wherein Z represents a linear, branched or cyclic divalent hydrocarbon group having 2 to 30 carbon atoms; X 1 to X 3 represent any of —CO 2 —, —CONR X1 —, —O—, —NR X1 —, —S—, —SO 2 —, —SO 3 — and —SO 2 NR X1 — and may be the same as or different from each other, provided that R X1 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 30 carbon atoms; Ar represents a divalent aromatic group having 2 to 30 carbon atoms; L 1 and L 2 independently represent a divalent hydrocarbon group having 1 to 30 carbon atoms; and x and y are each independently 0 or 1.

  提供的是一种可以用作光敏树脂组合物的基树脂的化合物。这种光敏树脂可以形成精细图案，并且可以在不影响机械强度和溶解性的情况下实现高分辨率。该化合物由通式（1）表示：其中Z代表具有2到30个碳原子的线性、支链或环状二价碳氢基团；X1到X3代表任何一种—CO2—、—CONRX1—、—O—、—NRX1—、—S—、—SO2—、—SO3—和—SO2NRX1—中的一种，并且它们可以相同也可以不同，只要RX1是氢原子或具有1到30个碳原子的一价碳氢基团；Ar代表具有2到30个碳原子的二价芳香基团；L1和L2分别代表具有1到30个碳原子的二价碳氢基团；x和y分别独立地为0或1。
• TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20180120702A1

  公开（公告）日：2018-05-03

  The present invention provides a tetracarboxylic acid diester compound represented by the following general formula (1), wherein, X 1 represents a tetravalent organic group, and R 1 represents a group represented by the following general formula (2), wherein, the dotted line represents a bonding, Y 1 represents an organic group with a valency of k+1, Rs represents a group containing at least one silicon atom, “k” represents 1, 2 or 3, and “n” represents 0 or 1. There can be provided a tetracarboxylic acid diester compound which can lead a polymer of a polyimide precursor capable of using a base resin of a negative photosensitive resin composition which is capable of forming a fine pattern and giving high resolution, a polymer of a polyimide precursor obtained by using the tetracarboxylic acid diester compound and a method for producing the same.

  本发明提供了一种四羧酸二酯化合物，其表示为以下通式（1）：其中，X1表示四价有机基团，R1表示以下通式（2）所表示的基团：其中，虚线表示键合，Y1表示具有k+1价的有机基团，Rs表示含有至少一个硅原子的基团，“k”表示1、2或3，“n”表示0或1。可以提供一种四羧酸二酯化合物，该化合物能够引导聚合物的形成，该聚合物是由使用负光敏树脂组合物的基树脂制成的，该组合物能够形成细微图案并具有高分辨率，使用四羧酸二酯化合物制得的聚酰亚胺前体聚合物以及其制备方法。