(E)-3-(2,4-dihydroxyphenyl)-1-(piperidin-1-yl)prop-2-en-1-one | 1246948-10-6

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 肉桂酸及其衍生物
• 英文名称: (E)-3-(2,4-dihydroxyphenyl)-1-(piperidin-1-yl)prop-2-en-1-one
• 英文别名: (E)-3-(2,4-dihydroxyphenyl)-1-piperidin-1-ylprop-2-en-1-one
• CAS: 1246948-10-6
• 化学式: C₁₄H₁₇NO₃
• 分子量: 247.294
• InChiKey: UKQCAEMYGCOWGZ-FNORWQNLSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.9
• 重原子数：
  18
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.36
• 拓扑面积：
  60.8
• 氢给体数：
  2
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  2,4-二苄氧基苯甲醛 在 N-甲基吗啉 、 三溴化硼 、 potassium carbonate 、 1,8-二氮杂双环[5.4.0]十一碳-7-烯 、 sodium hydroxide 、 氯甲酸异丁酯 作用下， 以 四氢呋喃 、 1,4-二氧六环 、 二氯甲烷 、 N,N-二甲基甲酰胺 为溶剂， 反应 73.0h， 生成 (E)-3-(2,4-dihydroxyphenyl)-1-(piperidin-1-yl)prop-2-en-1-one
  参考文献：
  名称：

  肉桂酰胺衍生物的设计，合成及抗黑色素作用

  摘要：

  色素沉着障碍归因于酪氨酸酶可能产生过多的黑色素。因此，酪氨酸酶被认为是治疗与色素沉着过度有关的疾病的重要靶标。根据我们先前的发现，（E）-β-苯基-α，β-不饱和羰基支架可以在抑制酪氨酸酶活性方面发挥关键作用，而肉桂酸是具有支架结构的安全天然物质，据推测，适当的肉桂酸衍生物可表现出有效的酪氨酸酶抑制活性。因此，设计了十种肉桂酰胺，并以霍纳-埃蒙斯烯化为关键步骤合成了十种肉桂酰胺。肉桂酰胺4（抑制93.72％），9（抑制78.97％）和10具有2,4-二羟基苯基或4-羟基-3-甲氧基苯基取代基的化合物（抑制率为59.09％）在25 µM处的蘑菇酪氨酸酶抑制作用比曲酸（抑制作用为18.81％）高得多，后者用作阳性对照。特别地，具有2，4-二羟基苯基的两种肉桂酰胺4和9显示出最强的抑制作用。与酪氨酸酶对接模拟显示，这三个cinnamamides，4，9，和10，与曲酸相比，与酪氨酸酶的活性位点的

  DOI：

  10.1016/j.bmc.2018.10.014

文献信息

• BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Katayama Mami

  公开号：US20110086311A1

  公开（公告）日：2011-04-14

  A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.

  一种光敏树脂组合物，具有分辨率优良、成本低廉和可用于一系列聚合物前体结构的特点，其中每种聚合物前体都可以通过碱性物质或在碱性物质的存在下加热反应成为最终产物。该光敏树脂组合物包括一种具有特定结构并通过电磁辐射和加热产生碱性物质的基发生剂，以及一种聚合物前体，该聚合物前体通过基发生剂和碱性物质或在碱性物质的存在下加热反应成为最终产物。
• BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME
  申请人：Katayama Mami

  公开号：US20120070781A1

  公开（公告）日：2012-03-22

  An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The base generator generates a base by exposure to electromagnetic radiation and heating. The photosensitive resin composition comprises a polymer precursor in which reaction into a final product is promoted by the base generator and a basic substance or by heating in the presence of a basic substance.

  本发明的目的是提供一种具有灵敏度并适用于广泛应用的基础发生器，以及一种光敏树脂组合物，由于聚合物前体的结构在碱性物质的促进下或在碱性物质存在下加热反应成最终产物，因此适用于广泛的应用范围。基础发生器通过电磁辐射和加热生成碱性物质。光敏树脂组合物包括聚合物前体，其在基础发生器和碱性物质的促进下或在碱性物质存在下加热反应成最终产物。
• PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION
  申请人：DAI NIPPON PRINTING CO., LTD.

  公开号：US20130309607A1

  公开（公告）日：2013-11-21

  A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.
• US8476444B2
  申请人：——

  公开号：US8476444B2

  公开（公告）日：2013-07-02
• US8778596B2
  申请人：——

  公开号：US8778596B2

  公开（公告）日：2014-07-15