松二糖 | 547-25-1

• 物质功能分类: 生物化工 - 糖类化合物 - 双糖
• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 松二糖
• 英文名称: 3-o-Hexopyranosylhex-2-ulopyranose
• 英文别名: 2-(hydroxymethyl)-3-[3,4,5-trihydroxy-6-(hydroxymethyl)oxan-2-yl]oxyoxane-2,4,5-triol
• CAS: 547-25-1；5349-40-6
• 化学式: C₁₂H₂₂O₁₁
• 分子量: 342.3
• InChiKey: SEWFWJUQVJHATO-UHFFFAOYSA-N

物化性质

• 熔点：
  170 °C (dec.)(lit.)
• 比旋光度：
  D20 +27.3° +75.8° (c = 4 in water)
• 沸点：
  397.76°C (rough estimate)
• 密度：
  1.4149 (rough estimate)
• 溶解度：
  在水中的溶解度0.1 g/mL，澄清，无色

计算性质

• 辛醇/水分配系数(LogP)：
  -5
• 重原子数：
  23
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  190
• 氢给体数：
  8
• 氢受体数：
  11

安全信息

• TSCA：
  Yes
• 危险品标志：
  Xi
• 安全说明：
  S24/25
• 危险类别码：
  R22
• WGK Germany：
  3
• 海关编码：
  29400000
• 危险性防范说明：
  P261,P305+P351+P338
• 危险性描述：
  H302,H315,H319,H335

制备方法与用途

概述

松二糖（turanose）是蜂蜜中自然存在的还原性双糖类物质，甜度相当于蔗糖的一半，具有与蔗糖类似的性质。由于它不会被致龋微生物发酵，因此可以作为不产生热量的甜味剂使用，在食品、化妆品及医药产业中发挥重要作用。

生物活性

Turanose 是一种天然存在于蜂蜜中的蔗糖异构体，具有抗炎和调节脂肪形成的作用，并且在研究肥胖症及相关慢性病方面具有潜在价值。

目的与作用

松二糖是一种蔗糖类似物，尽管高等植物无法代谢它，许多细菌、真菌和其他有机物却可以将其作为碳源。松二糖通过蔗糖转运蛋白被吸收进植物细胞，并参与细胞内的糖信号传导过程。

文献信息

• Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2826826A1

  公开（公告）日：2015-01-21

  The present invention provides a composition for forming a coating type BPSG film, which comprises: one or more structures comprising a silicic acid represented by the following general formula (1) as a skeletal structure, one or more structures comprising a phosphoric acid represented by the following general formula (2) as a skeletal structure and one or more structures comprising a boric acid represented by the following general formula (3) as a skeletal structure. There can be provided a composition for forming a coating type BPSG film which is excellent in adhesiveness in fine pattern, can be easily wet etched by a peeling solution which does not cause any damage to the semiconductor apparatus substrate, the coating type organic film or the CVD film mainly comprising carbon which are necessary in the patterning process, and can suppress generation of particles by forming it in the coating process.

  本发明提供了一种用于形成涂层型 BPSG 薄膜的组合物，该组合物包括：由以下通式 (1) 所代表的硅酸作为骨架结构的一种或多种结构、由以下通式 (2) 所代表的磷酸作为骨架结构的一种或多种结构以及由以下通式 (3) 所代表的硼酸作为骨架结构的一种或多种结构。本发明可提供一种用于形成涂层型 BPSG 薄膜的组合物，该组合物在精细图案方面具有优异的粘附性，可通过剥离溶液轻松进行湿蚀刻，不会对半导体设备基板、涂层型有机薄膜或图案化过程中所需的主要由碳构成的 CVD 薄膜造成任何损害，并且通过在涂层过程中形成该组合物，可抑制颗粒的生成。
• Method of pattern formation and method of producing polysilane resin precursor
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US10747113B2

  公开（公告）日：2020-08-18

  A method of pattern formation. The method is capable of inhibiting a post-development residue from remaining on a support equipped with an electrode, and a method of producing a polysilane-polysiloxane resin precursor that is suitable for use in the method of pattern formation. The method of pattern formation includes forming a film of a silicon-containing composition on the support equipped with an electrode forming a film of a resin composition on the film of a silicon-containing composition, and forming the film of a resin composition into a pattern.

  一种图案形成方法。该方法能够抑制显影后残留物残留在装有电极的支架上，以及生产适合用于图案形成方法的聚硅烷-聚硅氧烷树脂前体的方法。图案形成方法包括在装有电极的支架上形成一层含硅组合物薄膜，在含硅组合物薄膜上形成一层树脂组合物薄膜，以及将树脂组合物薄膜形成图案。
• Resin composition, method for producing resin composition, film formation method, and cured product
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US10767017B2

  公开（公告）日：2020-09-08

  A resin composition including a silicon-containing resin component and a solvent, the silicon-containing resin component including at least one of (I) and (II) mentioned below, the solvent including at least one of a terpene compound having at least one of a hydroxy group and an acetoxy group, and a cyclic skeleton-containing acetate compound (excluding the terpene compound): (I) a polysilane-polysiloxane resin having a polysilane structure and a polysiloxane structure, and (II) a mixture of a resin having a polysilane structure and a resin having a polysiloxane structure.

  一种树脂组合物，包括含硅树脂组分和溶剂，含硅树脂组分包括下述（I）和（II）中的至少一种，溶剂包括具有羟基和乙酰氧基中的至少一种的萜烯化合物和含环骨架的乙酸酯化合物（不包括萜烯化合物）中的至少一种： (I) 具有聚硅烷结构和聚硅氧烷结构的聚硅烷-聚硅氧烷树脂，以及 (II) 具有聚硅烷结构的树脂和具有聚硅氧烷结构的树脂的混合物。
• COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE FORMED A FILM BY SAID COMPOSITION, AND PATTERNING PROCESS USING SAID COMPOSITION
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2826826B1

  公开（公告）日：2018-08-01
• COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160096978A1

  公开（公告）日：2016-04-07

  A composition for forming a coating type BPSG film, containing one or more silicic acid skeletal structures represented by formula (1), one or more phosphoric acid skeletal structures represented by formula (2), one or more boric acid skeletal structures represented by formula (3), and one or more silicon skeletal structures represented by formula (4), wherein the composition contains a coupling between units in formula (4). The composition is capable of forming a BPSG film that has excellent adhesiveness in fine patterning, can be easily wet etched by a removing liquid which does not cause damage to a semiconductor substrate and a coating type organic film or a CVD film mainly consisting of carbon which is required in the patterning process, can maintain the peelability even after dry etching, and can suppress generation of particles by forming it in the coating process.