银树脂酸盐MR4704-P | 68683-18-1

• 物质功能分类: 有机原料 - 羧酸类化合物及衍生物
• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 中文名称: 银树脂酸盐MR4704-P
• 中文别名: 银树脂酸盐
• 英文名称: Silver(1+) neodecanoate
• 英文别名: silver;3,3,5,5-tetramethylhexanoate
• CAS: 68683-18-1
• 化学式: C10H19AgO2
• 分子量: 279.12
• InChiKey: VITNGSZYDJOSPP-UHFFFAOYSA-M

物化性质

• 熔点：
  106-116°C (dec.)
• 密度：
  0,944 g/cm3
• 闪点：
  30°C (86°F)
• 稳定性/保质期：
  远离氧化物、光和热。

计算性质

• 辛醇/水分配系数(LogP)：
  1.59
• 重原子数：
  13
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.9
• 拓扑面积：
  40.1
• 氢给体数：
  0
• 氢受体数：
  2

安全信息

• TSCA：
  Yes
• 海关编码：
  2915900090
• 危险性防范说明：
  P261,P264,P270,P271,P280,P301+P312,P302+P352,P304+P340,P330,P363,P501
• 危险性描述：
  H302,H312,H332

文献信息

• METHOD OF MANUFACTURING AN ELECTROMAGNETIC INTERFERENCE SHIELDING LAYER
  申请人：Heraeus Deutschland GmbH & Co KG

  公开号：EP3648161A1

  公开（公告）日：2020-05-06

  The present invention relates to a method of manufacturing a semiconductor package, which is at least in part covered by an electromagnetic interference shielding layer, comprising at least these steps: i. Providing the semiconductor package and an ink composition; wherein the ink composition comprises at least these constituents: a) A compound comprising at least one metal precursor; b) At least one organic compound; and ii. Applying at least a part of the ink composition onto the semiconductor package, wherein a precursor layer is formed; iii. Treating the precursor layer with an irradiation of a peak wavelength in the range from 100 nm to 1 mm, and to a semiconductor package comprising an electromagnetic interference shielding layer comprising at least one metal, wherein the semiconductor package is obtainable by the aforementioned method. The present invention relates also to a semiconductor package comprising a electromagnetic interference shielding layer, wherein the specific conductance of the first layer of electromagnetic interference shielding material is in the range from 5 to 90 % of bulk metal; and wherein the thickness of the first layer of electromagnetic interference shielding material is in the range from 5 nm to 5 µm. The present invention relates further to some uses of an ink composition.

  本发明涉及一种至少部分由电磁干扰屏蔽层覆盖的半导体封装的制造方法，该方法至少包括以下步骤： i. 提供半导体封装和油墨组合物；其中油墨组合物至少包括以下成分： a) 由至少一种金属前体组成的化合物； b) 至少一种有机化合物；以及 ii.将至少一部分油墨组合物涂在半导体封装上，其中形成前驱体层； iii.用峰值波长在 100 nm 至 1 mm 范围内的辐照处理前驱体层，以及包含由至少一种金属组成的电磁干扰屏蔽层的半导体封装，其中半导体封装可通过上述方法获得。本发明还涉及一种包含电磁干扰屏蔽层的半导体封装，其中第一层电磁干扰屏蔽材料的比电导率在块状金属的 5% 至 90% 之间；第一层电磁干扰屏蔽材料的厚度在 5 nm 至 5 µm 之间。本发明还涉及油墨组合物的一些用途。
• METHOD FOR FORMING HIGH-RESOLUTION PATTERN WITH DIRECT WRITING MEANS
  申请人：LG Chem, Ltd.

  公开号：EP1880412A1

  公开（公告）日：2008-01-23
• Method for forming high-resolution pattern with direct writing means
  申请人：Shin Dong-Youn

  公开号：US20060281333A1

  公开（公告）日：2006-12-14

  Disclosed is a method for forming a pattern which comprises the steps of: (a) providing a substrate having a sacrificial layer made of a first material, partially or totally formed on the substrate; (b) forming pattern grooves, which are free from the first material and have a line width of a first resolution or lower, on the sacrificial layer by using a first means, by which the sacrificial layer is directly processed to form a line; (c) filling the pattern grooves with a second material to a second resolution by using a second means, to form a pattern of the second material on the substrate. A substrate having a pre-pattern formed by the method is also disclosed. The method for forming a pattern provides a high-resolution pattern with little or no waste of the second material, thereby reducing production costs. The method includes use of the first means with a high resolution, such as focused energy beams of laser, combined with the second means with a low resolution, such as ink-jet, and provides a high-resolution pattern with high processing efficiency.
• US7510951B2
  申请人：——

  公开号：US7510951B2

  公开（公告）日：2009-03-31
• [EN] METHOD FOR FORMING HIGH-RESOLUTION PATTERN WITH DIRECT WRITING MEANS<br/>[FR] METHODE DE FORMATION DE MOTIF DE HAUTE RESOLUTION FAISANT APPEL A UN MOYEN D'ECRITURE DIRECTE
  申请人：LG CHEMICAL LTD

  公开号：WO2006121298A1

  公开（公告）日：2006-11-16

  [EN] Disclosed is a method for forming a pattern which comprises the steps of: (a) providing a substrate having a sacrificial layer made of a first material, partially or totally formed on the substrate; (b) forming pattern grooves, which are free from the first material and have a line width of a first resolution or lower, on the sacrificial layer by using a first means, by which the sacrificial layer is directly processed to form a line; (c) filling the pattern grooves with a second material to a second resolution by using a second means, to form a pattern of the second material on the substrate. A substrate having a pre-pattern formed by the method is also disclosed. The method for forming a pattern provides a high-resolution pattern with little or no waste of the second material, thereby reducing production costs. The method includes use of the first means with a high resolution, such as focused energy beams of laser, combined with the second means with a low resolution, such as ink-jet, and provides a high-resolution pattern with high processing efficiency.
  [FR] L'invention concerne une méthode pour former un motif. Cette méthode comprend les étapes consistant à: (a) fournir un substrat présentant une couche sacrificielle constituée d'une première matière, partiellement ou totalement formée sur le substrat; (b) former des rainures de motif exemptes de la première matière et présentant une largeur de ligne inférieure ou égale à une première résolution, sur la couche sacrificielle, à l'aide d'un premier moyen grâce auquel la couche sacrificielle est directement traitée pour former une ligne; (c) remplir les rainures de motif d'une seconde matière, à une seconde résolution, à l'aide d'un second moyen, pour former un motif de seconde matière sur le substrat. Un substrat présentant un prémotif formé par la méthode susmentionnée est également décrit. La méthode de formation d'un motif permet d'obtenir un motif de haute résolution présentant peu ou pas de déchets de la seconde matière, ce qui permet de réduire les coûts de production. La méthode de l'invention fait appel à l'utilisation du premier moyen à une haute résolution, notamment des faisceaux d'énergie focalisés d'un laser, combiné au second moyen présentant une faible résolution, notamment un jet d'encre, pour obtenir un motif de haute résolution avec une haute efficacité de traitement.