申请人:Kuchta Cornyn Matthew
公开号:US20050137367A1
公开(公告)日:2005-06-23
This invention relates to a catalyst precursor compound comprising a tridentate phenoxy-amide-amine group bound to a group 3 to 12 metal or lanthanide metal. In particular, this invention relates to a catalyst precursor compound represented by the formula:
wherein: M is a group 3 to group 12 transition metal or lanthanide metal, provided however
N
1
is not part of a pyridine ring when M is a group 8, 9, or 10 metal; Q is oxygen or sulfur; N is nitrogen;
N
1
is nitrogen;
R
1
, is a hydrogen, a hydrocarbyl, a substituted hydrocarbyl, a halocarbyl, a substituted halocarbyl, a heteroatom or heteroatom containing group;
R
2
and R
3
are independently, a hydrogen, a halogen, a hydrocarbyl, a substituted hydrocarbyl, a halocarbyl, or a substituted halocarbyl, a heteroatom or heteratom containing group and R
2
and R
3
together may form a multidentate ligand, such as a bidentate dianionic ligand;
R
4
is hydrogen, a hydrocarbyl, a substituted hydrocarbyl, a halocarbyl, a substituted halocarbyl, a heteroatom or heteroatom containing group;
R
5
is a hydrogen, a hydrocarbyl, a substituted hydrocarbyl, a halocarbyl, a substituted halocarbyl, a heteroatom or heteroatom containing group;
R
6
, R
7
, and R
8
are, independently, a hydrogen, a hydrocarbyl, a substituted hydrocarbyl, a halocarbyl, a substituted halocarbyl, a heteroatom or heteroatom containing group, and any two of R
1
, R
6
, R
7
, and R
8
may form a fused ring system; each Ris, independently, hydrogen, a hydrocarbyl, a substituted hydrocarbyl, a halocarbyl, a substituted halocarbyl group, or a heteroatom or heteroatom containing group;
R
10
is a hydrocarbyl, a substituted hydrocarbyl, a halocarbyl, a substituted halocarbyl group, or a heteroatom or heteroatom containing group; where any two adjacent R groups may form a ring structure.
本发明涉及一种催化剂前体化合物,其包括一个三齿腈酚酰胺胺基团与3至12族金属或镧系金属结合。具体而言,本发明涉及一种由下式表示的催化剂前体化合物:其中:M是3至12族过渡金属或镧系金属,但当M是8、9或10族金属时,N1不是吡啶环的一部分;Q是氧或硫;N是氮;N1是氮;R1是氢、烃基、取代烃基、卤代烃基、取代卤代烃基、杂原子或含杂原子的基团;R2和R3分别是氢、卤素、烃基、取代烃基、卤代烃基或取代卤代烃基、杂原子或含杂原子的基团,且R2和R3可以共同形成多齿配体,例如双阴离子双齿配体;R4是氢、烃基、取代烃基、卤代烃基、取代卤代烃基、杂原子或含杂原子的基团;R5是氢、烃基、取代烃基、卤代烃基、取代卤代烃基、杂原子或含杂原子的基团;R6、R7和R8分别是氢、烃基、取代烃基、卤代烃基、取代卤代烃基、杂原子或含杂原子的基团,且R1、R6、R7和R8中的任意两个可形成融合环系统;每个R独立地是氢、烃基、取代烃基、卤代烃基、取代卤代烃基或含杂原子的基团;R10是烃基、取代烃基、卤代烃基、取代卤代烃基或含杂原子的基团,其中任意相邻的两个R基团可形成环结构。