Tertiary alkyl, allylic and benzylic halides react with zinc thiolacetate, prepared in situ, under optimised conditions to yield the corresponding thiolacetates in moderate to good yields.
Solvolytic displacement of alkyl halides by metal salts
作者:K.N. Gurudutt、B. Ravindranath、P. Srinivas
DOI:10.1016/0040-4020(82)80261-5
日期:1982.1
Reaction of allylic, benzylic and tertiary alkyl halides with zinc oxide in protic solvents leads to the formation of the corresponding alcohol, ethers and esters in good yields. The scope and limitations of this reaction have been examined. The possible involvement of ion quadruplets in the reaction is suggested.
Ultrasound-Assisted Nucleophilic Substitution Reaction of<i>t</i>-Alkyl Halides with Zinc and Titanium Thiocyanate
作者:B. K. Bettadaiah、K. N. Gurudutt、P. Srinivas
DOI:10.1081/scc-120021510
日期:2003.1.7
Abstract Ultrasound promotes nucleophilicsubstitution of t-alkyl halides with ambident thiocyanate nucleophile, in the form of its zinc or titanium thiocyanate, under mild conditions to afford the corresponding thiocyanates selectively, in good to excellent yields. This improved synthetic methodology affords a facile access to tertiary thiols via the corresponding thiocyanate intermediates.
Tertiary alkyl halides undergo facile substitution reactionsundersolvolyticconditions in presence of zinc ions yielding alcohols, ethers and esters.
叔烷基卤化物在锌离子存在下,在溶剂分解条件下容易进行取代反应,生成醇,醚和酯。
Organosilicon compounds
申请人:NIPPON TELEGRAPH AND TELEPHONE CORPORATION
公开号:EP0612756A1
公开(公告)日:1994-08-31
The present invention provides an oganosilicon compound possessing a β-branched alkyl group or a β-branched aralkyl group represented by Formula (I):
wherein R¹ represents methyl group or ethyl group; R² represents C1-C18 alkyl group or aryl group. The present invention relates to optically active organosilicon compounds for use as a new type of enantio-recognitive material, and organosilicons which can be anticipated for use as a high polymer standard material in one-dimensional semiconductor · quantum wire structures.