An acid-amplifier having an acetal group and a photoresist composition including the same, are disclosed. The acid-amplifier produces an acid (second acid) during a post-exposure-bake (PEB), which is induced by an acid (first acid) generated from a photo-acid generator (PAG) at the exposure process so that a line edge roughness (LER) of the photoresist pattern and photoresist energy sensitivity are improved. The acid-amplifier has a structure of following Formula 1.
in Formula 1, R is C4~C20 mono-cyclic or multi-cyclic saturated hydrocarbon, R1 is C1∼C10 linear hydrocarbon, C1~C10 perfluoro compound or C5~C20 aromatic compound, Ra and Rb are independently hydrogen atom or C1~C4 saturated hydrocarbon and A is independently oxygen atom (O) or sulfur atom (S).
本发明公开了一种具有
缩醛基团的酸放大器和包括
缩醛基团的光刻胶组合物。该酸放大器在曝光后烘烤(PEB)过程中产生一种酸(第二酸),该酸是在曝光过程中由光酸发生器(PAG)产生的酸(第一酸)诱导产生的,从而改善了光刻胶图案的线边缘粗糙度(LER)和光刻胶的能量灵敏度。酸放大器的结构如式 1 所示。
式 1 中,R 为 C4~C20 单环或多环饱和烃,R1 为 C1∼C10 直链烃、C1~C10
全氟化合物或 C5~C20 芳香族化合物,Ra 和 Rb 分别为氢原子或 C1~C4 饱和烃,A 分别为氧原子(O)或
硫原子(S)。