4-isopropyl-cycloheptanone | 13656-84-3

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 4-isopropyl-cycloheptanone
• 英文别名: 4-Isopropyl-cycloheptanon；Hexahydro-nezukon, 4-Isopropyl-cycloheptanonon；4-(Propan-2-yl)cycloheptan-1-one；4-propan-2-ylcycloheptan-1-one
• CAS: 13656-84-3
• 化学式: C₁₀H₁₈O
• mdl: MFCD22566095
• 分子量: 154.252
• InChiKey: UXKHYNGZHNLMJD-UHFFFAOYSA-N

物化性质

• 沸点：
  153-157 °C(Press: 100 Torr)
• 密度：
  0.892±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  11
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.9
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  4-isopropyl-cycloheptanone 在 selenium(IV) oxide 、 乙醇 作用下， 生成 桧木醇
  参考文献：
  名称：

  Nozoe et al., Proceedings of the Japan Academy, 1950, vol. 26, # 7, p. 38,42

  摘要：

  DOI：
• 作为产物：
  描述：

  alkaline earth salt of/the/ methylsulfuric acid 在 水 、 溶剂黄146 、 sodium nitrite 作用下， 生成 4-isopropyl-cycloheptanone
  参考文献：
  名称：

  β- 和 γ-侧柏素的合成

  摘要：

  β- 和 γ-侧柏素是通过紫苏醛和 4-异丙基环己酮通过 4-异丙基环庚酮合成的。

  DOI：

  10.1246/bcsj.30.700

文献信息

• A novel electroreductive alkylation of cycloheptatriene systems and its application to facile synthesis of β-thujaplicin
  作者：Tatsuya Shono、Tetsuo Nozoe、Yoshihide Yamaguchi、Manabu Ishifune、Masashi Sakaguchi、Haruhisa Masuda、Shigenori Kashimura

  DOI：10.1016/s0040-4039(00)74485-6

  日期：1991.2

  Electroreduction of cycloheptatriene or substituted cycloheptatrienes in the presence of an alkyl halide was found to be a unique and effective method for introducing regioselectively an alkyl group into seven-membered ring system and it was applied to a new synthesis of β-thujaplicin (hinokitiol).

  发现在烷基卤存在下电还原环庚三烯或取代的环庚烯是将区域选择性地引入烷基到七元环系统中的独特而有效的方法，并将其用于β-thujaplicin（hin醇）的新合成。
• COPOLYMER, METHOD FOR PRODUCING SAME, RESIN MATERIAL FOR ELECTRIC WIRE SHEATHING, AND ELECTRIC WIRE
  申请人：Asahi Glass Company, Limited

  公开号：EP3330301A1

  公开（公告）日：2018-06-06

  To provide an ETFE copolymer and a wire coating resin material capable of forming a coating layer which is excellent in stress cracking resistance under a high temperature and which has a high heat resistance temperature, and an electric wire having a coating layer which is excellent in stress cracking resistance under a high temperature and which has a high heat resistance temperature. A copolymer comprising structural units derived from ethylene, structural units derived from tetrafluoroethylene, and structural units derived from a third monomer, wherein in an elution curve obtained by a temperature rising elution fractionation method with respect to the copolymer, a ratio (L/H) of a proportion (L: area%) of components with elution temperatures of from 190 to 200°C to a proportion (H: area%) of components with elution temperatures of at least 205°C, and a proportion (M: mol%) of structural units derived from the third monomer based on all structural units of the copolymer, satisfy a relation of log (L/H)/M≧0.90.

  提供一种 ETFE 共聚物和一种电线涂覆树脂材料，该材料能够形成在高温下抗应力开裂性能优异且耐热温度高的涂覆层，以及一种具有在高温下抗应力开裂性能优异且耐热温度高的涂覆层的电线。一种共聚物，由乙烯衍生的结构单元、四氟乙烯衍生的结构单元和第三种单体衍生的结构单元组成，其中在通过升温洗脱分馏法获得的与共聚物有关的洗脱曲线中，洗脱比例（L：洗脱温度为 190 至 200℃的组分的比例（L：面积％）与洗脱温度至少为 205℃的组分的比例（H：面积％），以及衍生自第三单体的结构单元的比例（M：摩尔％）（基于共聚物的所有结构单元），满足 log (L/H)/M≧0 的关系。90.
• Developer, pattern forming method, and electronic device manufacturing method
  申请人：FUJIFILM Corporation

  公开号：US10562991B2

  公开（公告）日：2020-02-18

  Provided is a pattern forming method including the successive steps of: a resist film forming step of forming a resist film using an actinic ray-sensitive or radiation-sensitive composition; an exposure step of exposing the resist film; a step of developing the exposed resist film using a developer, and a step of rinsing the developed resist film using a rinsing liquid containing an organic solvent. The developer includes a ketone-based or ether-based solvent having a branched alkyl group. The organic solvent contained in the rinsing liquid includes an ether-based solvent having a branched alkyl group.

  本发明提供了一种图案形成方法，包括以下连续步骤：使用对放热射线或辐射敏感的组合物形成抗蚀剂薄膜的抗蚀剂薄膜形成步骤；曝光抗蚀剂薄膜的曝光步骤；使用显影剂显影曝光的抗蚀剂薄膜的步骤，以及使用含有有机溶剂的漂洗液漂洗显影的抗蚀剂薄膜的步骤。显影剂包括具有支链烷基的酮基或醚基溶剂。漂洗液中的有机溶剂包括具有支链烷基的醚基溶剂。
• Copolymer, method for its production, wire coating resin material and electric wire
  申请人：AGC Inc.

  公开号：US10607749B2

  公开（公告）日：2020-03-31

  To provide an ETFE copolymer and a wire coating resin material capable of forming a coating layer which is excellent in stress cracking resistance under a high temperature and which has a high heat resistance temperature, and an electric wire having a coating layer which is excellent in stress cracking resistance under a high temperature and which has a high heat resistance temperature. A copolymer comprising structural units derived from ethylene, structural units derived from tetrafluoroethylene, and structural units derived from a third monomer, wherein in an elution curve obtained by a temperature rising elution fractionation method with respect to the copolymer, a ratio (L/H) of a proportion (L: area %) of components with elution temperatures of from 190 to 200° C. to a proportion (H: area %) of components with elution temperatures of at least 205° C., and a proportion (M: mol %) of structural units derived from the third monomer based on all structural units of the copolymer, satisfy a relation of log (L/H)/M≥0.90.

  提供一种 ETFE 共聚物和一种电线涂覆树脂材料，该材料能够形成在高温下抗应力开裂性能优异且耐热温度高的涂覆层，以及一种具有在高温下抗应力开裂性能优异且耐热温度高的涂覆层的电线。一种共聚物，由乙烯衍生的结构单元、四氟乙烯衍生的结构单元和第三种单体衍生的结构单元组成，其中在通过升温洗脱分馏法获得的与共聚物有关的洗脱曲线中，洗脱温度为 190 至 200 摄氏度的组分比例（L：面积百分比）与洗脱温度至少为 205 摄氏度的组分比例（H：面积百分比）之比（L/H）、第三单体衍生的结构单元占共聚物所有结构单元的比例（M：摩尔百分比）满足 log (L/H)/M≥0.90 的关系。
• Cook et al., Journal of the Chemical Society, 1951, p. 695,697
  作者：Cook et al.

  DOI：——

  日期：——