申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US06030746A1
公开(公告)日:2000-02-29
Di- or triphenyl monoterpene hydrocarbon derivatives of formula (1) are novel. ##STR1## X is a di- or trivalent monoterpene hydrocarbon group, R.sup.1 to R.sup.3 are hydrogen or an alkyl, alkoxy, alkoxyalkyl, alkenyl or aryl group, R.sup.4 is hydrogen or an acid labile group, at least one R.sup.4 being an acid labile group, letter n is an integer of 1-5, j, k and m are integers of 0-4, n+j+k+m=5, and p is 2 or 3. When used as a dissolution rate regulator, the compound of formula (1) exerts remarkably enhanced dissolution inhibitory effect and minimized light absorption in the deep-UV region. A chemically amplified positive resist composition having the compound of formula (1) blended therein is highly sensitive to actinic radiation such as deep-UV radiation, electron beam and X-ray, especially KrF excimer laser light, and has improved sensitivity, resolution and plasma etching resistance.
Di-或三苯基单萜烃衍生物的化学式(1)是新颖的。X是二价或三价的单萜烃基,R.sup.1至R.sup.3是氢或烷基、烷氧基、烷氧基烷基、烯基或芳基,R.sup.4是氢或酸敏感基团,至少一个R.sup.4是酸敏感基团,字母n是1-5的整数,j、k和m是0-4的整数,n+j+k+m=5,p是2或3。当作为溶解速率调节剂使用时,化合物的化学式(1)具有显著增强的溶解抑制效果,并在深紫外区域最小化光吸收。含有化学式(1)化合物的化学增感正性光刻胶组合物对深紫外辐射、电子束和X射线等光刻辐射非常敏感,特别是KrF准分子激光光,具有改善的灵敏度、分辨率和等离子刻蚀抗性。