12H-benzoxanthene-12-thione | 2009-53-2

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 异黄酮类化合物
• 英文名称: 12H-benzoxanthene-12-thione
• 英文别名: benzo[a]xanthene-12-thione；Benzo[a]xanthen-12-thion；1.2-Benzo-xanthion；1,2-Benzoxanthion；12H-Benzo[a]xanthene-12-thione；benzo[a]xanthene-12-thione
• CAS: 2009-53-2
• 化学式: C₁₇H₁₀OS
• 分子量: 262.332
• InChiKey: LXWZULUTRICYDX-UHFFFAOYSA-N

物化性质

• 熔点：
  141 °C
• 沸点：
  437.6±38.0 °C(Predicted)
• 密度：
  1.36±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.8
• 重原子数：
  19
• 可旋转键数：
  0
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  41.3
• 氢给体数：
  0
• 氢受体数：
  2

SDS

反应信息

• 作为反应物：
  描述：

  12H-benzoxanthene-12-thione 、 1,2-丙二胺 以 乙醇 为溶剂， 反应 80.0h， 以40%的产率得到N,N'-bis(12H-benzoxanthen-12-ylidene)-1,2-propanediamine
  参考文献：
  名称：

  自组装手性金属裂；N，N′-双（12 H-苯并[α]黄嘌呤-12-亚烷基）-1,2-乙二胺锌（II）-二氯化物的合成及分子结构

  摘要：

  由硫代酮和二胺合成的裂缝型金属配合物的大配体，产率在20％至80％之间。进行了一种配体N，N′-双（12 H-苯并[ a ]-黄嘌呤-12-亚烷基）-1，2-丙二胺（19）的分子结构测定。Metallocleft是通过自组装过程与氯化锌（II）构造而成的。对该锌配合物的晶体学研究（24）令人惊讶地发现，在配合过程中发生了配体的亚胺部分的反syn反演。

  DOI：

  10.1002/recl.19931120612
• 作为产物：
  描述：

  2-氯苯甲酸 在 copper bronze PPA 、 tetraphosphorus decasulfide 、 potassium carbonate 作用下， 以 戊醇 、 甲苯 为溶剂， 反应 28.5h， 生成 12H-benzoxanthene-12-thione
  参考文献：
  名称：

  自组装手性金属裂；N，N′-双（12 H-苯并[α]黄嘌呤-12-亚烷基）-1,2-乙二胺锌（II）-二氯化物的合成及分子结构

  摘要：

  由硫代酮和二胺合成的裂缝型金属配合物的大配体，产率在20％至80％之间。进行了一种配体N，N′-双（12 H-苯并[ a ]-黄嘌呤-12-亚烷基）-1，2-丙二胺（19）的分子结构测定。Metallocleft是通过自组装过程与氯化锌（II）构造而成的。对该锌配合物的晶体学研究（24）令人惊讶地发现，在配合过程中发生了配体的亚胺部分的反syn反演。

  DOI：

  10.1002/recl.19931120612

文献信息

• METHOD FOR PURIFYING COMPOUND OR RESIN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20170001972A1

  公开（公告）日：2017-01-05

  The method according to the present invention is a method for purifying a compound represented by a specific formula (1) or a resin having a structure represented by a specific formula (2), the method including a step of bringing a solution (A) including an organic solvent optionally immiscible with water, and the compound or the resin into contact with an acidic aqueous solution.

  根据本发明的方法是一种用于纯化由特定化学式（1）表示的化合物或具有特定化学式（2）表示的结构的树脂的方法，该方法包括将含有有机溶剂（可选择与水不相容）的溶液（A）与该化合物或树脂接触酸性水溶液的步骤。
• COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING COMPOUND OR RESIN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20180065930A1

  公开（公告）日：2018-03-08

  A compound represented by the following formula (1). (in formula (1), each X independently represents an oxygen atom, a sulfur atom, or non-crosslinking, each R 1 is independently selected from the group consisting of a hydrogen atom, a halogen group, a nitro group, an amino group, a hydroxyl group, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms and combinations thereof, in which the alkyl group, the alkenyl group and the aryl group may have an ether bond, a ketone bond or an ester bond, each R 2 independently represents a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, a thiol group or a hydroxyl group, in which at least one R 2 represents a group having a hydroxyl group or a thiol group, each m is independently an integer of 1 to 7, each p is independently 0 or 1, each q is independently an integer of 0 to 4, and n is 0 or 1.)

  以下是公式（1）代表的化合物的中文翻译：在公式（1）中，每个X独立地代表一个氧原子、一个硫原子或非交联，每个R1独立地选自包括氢原子、卤素基团、硝基、氨基、羟基、具有1至30个碳原子的烷基基团、具有2至30个碳原子的烯烃基团、具有6至40个碳原子的芳基团及其组合的群，其中烷基基团、烯烃基团和芳基团可能具有醚键、酮键或酯键，每个R2独立地代表具有1至30个碳原子的线性、支链或环状烷基基团、具有6至40个碳原子的芳基团、具有2至30个碳原子的烯烃基团、硫醇基团或羟基，其中至少一个R2代表具有羟基或硫醇基团的基团，每个m独立地是1至7的整数，每个p独立地为0或1，每个q独立地是0至4的整数，n为0或1。
• RADIATION-SENSITIVE COMPOSITION
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP3285119A1

  公开（公告）日：2018-02-21

  The present invention provides a radiation-sensitive composition containing (A) a resist base material, (B) an optically active diazonaphthoquinone compound, and (C) a solvent, wherein the content of a solid component in the composition is within the range of 1 to 80% by mass, the content of the solvent is within the range of 20 to 99% by mass, and the resist base material (A) is a compound represented by a specific formula.

  本发明提供了一种辐射敏感组合物，该组合物含有 (A) 抗蚀剂基材、(B) 光学活性重氮萘醌化合物和 (C) 溶剂，其中组合物中固体成分的含量在 1% 至 80% （按质量计）的范围内，溶剂的含量在 20% 至 99% （按质量计）的范围内，抗蚀剂基材 (A) 是由特定式表示的化合物。
• COMPOUND, RESIN, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP3327005A1

  公开（公告）日：2018-05-30

  A compound or a resin represented by the following formula (1). (in formula (1), each X independently represents an oxygen atom, a sulfur atom, or an uncrosslinked state, each R1 is independently selected from the group consisting of a halogen group, a cyano group, a nitro group, an amino group, a hydroxyl group, a thiol group, a heterocyclic group, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, and combinations thereof, in which the alkyl group, the alkenyl group and the aryl group optionally include an ether bond, a ketone bond or an ester bond, each R2 independently represents an alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, a thiol group or a hydroxyl group, in which at least one R2 represents a group including a hydroxyl group or a thiol group, each m is independently an integer of 0 to 7 (in which at least one m is an integer of 1 to 7.), each p is independently 0 or 1, q is an integer of 0 to 2, and n is 1 or 2.)

  下式(1)所代表的化合物或树脂。 (在式 (1) 中，每个 X 独立地代表氧原子、硫原子或未交联状态，每个 R1 独立地选自卤素基、氰基、硝基、氨基、羟基、硫醇基、杂环基、具有 1 至 30 个碳原子的烷基、具有 2 至 30 个碳原子的烯基、具有 6 至 40 个碳原子的芳基及其组合，其中烷基、烯基和芳基可选地包括醚键、酮键或酯键，每个 R2 独立地代表氧原子、硫原子或未交联状态，每个 R1 独立地选自卤素基、氰基、硝基、氨基、羟基、硫醇基、杂环基、具有 1 至 30 个碳原子的烷基、具有 2 至 30 个碳原子的烯基、具有 6 至 40 个碳原子的芳基及其组合、每个 R2 独立地代表具有 1 至 30 个碳原子的烷基、具有 6 至 40 个碳原子的芳基、具有 2 至 30 个碳原子的烯基、硫醇基或羟基，其中至少一个 R2 代表包括羟基或硫醇基在内的基团，每个 m 独立地为 0 至 7 的整数（其中至少一个 m 为 1 至 7 的整数。每个 p 独立地为 0 或 1，q 为 0 至 2 的整数，n 为 1 或 2）。
• Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US10364314B2

  公开（公告）日：2019-07-30

  A compound or a resin represented by the following formula (1). (in formula (1), each X independently represents an oxygen atom, a sulfur atom, or an uncrosslinked state, each R1 is independently selected from the group consisting of a halogen group, a cyano group, a nitro group, an amino group, a hydroxyl group, a thiol group, a heterocyclic group, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, and combinations thereof, in which the alkyl group, the alkenyl group and the aryl group optionally include an ether bond, a ketone bond or an ester bond, each R2 independently represents an alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, a thiol group or a hydroxyl group, in which at least one R2 represents a group including a hydroxyl group or a thiol group, each m is independently an integer of 0 to 7 (in which at least one m is an integer of 1 to 7.), each p is independently 0 or 1, q is an integer of 0 to 2, and n is 1 or 2).

  下式(1)所代表的化合物或树脂。 (在式 (1) 中，每个 X 独立地代表氧原子、硫原子或未交联状态，每个 R1 独立地选自卤素基、氰基、硝基、氨基、羟基、硫醇基、杂环基、具有 1 至 30 个碳原子的烷基、具有 2 至 30 个碳原子的烯基、具有 6 至 40 个碳原子的芳基及其组合，其中烷基、烯基和芳基可选地包括醚键、酮键或酯键，每个 R2 独立地代表氧原子、硫原子或未交联状态，每个 R1 独立地选自卤素基、氰基、硝基、氨基、羟基、硫醇基、杂环基、具有 1 至 30 个碳原子的烷基、具有 2 至 30 个碳原子的烯基、具有 6 至 40 个碳原子的芳基及其组合、每个 R2 独立地代表具有 1 至 30 个碳原子的烷基、具有 6 至 40 个碳原子的芳基、具有 2 至 30 个碳原子的烯基、硫醇基或羟基，其中至少一个 R2 代表包括羟基或硫醇基在内的基团，每个 m 独立地为 0 至 7 的整数（其中至少一个 m 为 1 至 7 的整数。每个 p 独立地为 0 或 1，q 为 0 至 2 的整数，n 为 1 或 2）。