RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND
申请人:Kimoto Takakazu
公开号:US20120276482A1
公开(公告)日:2012-11-01
A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represents a (n+1) valent linking group. Each Q independently represents a group that includes an alkali-dissociable group.
一种辐射敏感性树脂组合物,包括具有下式(1)所代表的基团的第一聚合物和辐射敏感性酸发生剂。n是2到4的整数。X代表单键或二价有机基团。A代表(n+1)价的连接基团。每个Q独立地代表包括可溶于碱的基团的基团。