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di-(4-iodophenyl)sulfoxide | 647829-43-4

中文名称
——
中文别名
——
英文名称
di-(4-iodophenyl)sulfoxide
英文别名
Bis(4-iodophenyl) sulfoxide;1-iodo-4-(4-iodophenyl)sulfinylbenzene
di-(4-iodophenyl)sulfoxide化学式
CAS
647829-43-4
化学式
C12H8I2OS
mdl
——
分子量
454.07
InChiKey
BVNAGZDWGFKCKW-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    466.5±30.0 °C(Predicted)
  • 密度:
    2.26±0.1 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    4
  • 重原子数:
    16
  • 可旋转键数:
    2
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    36.3
  • 氢给体数:
    0
  • 氢受体数:
    2

安全信息

  • 危险性防范说明:
    P501,P270,P264,P280,P302+P352,P337+P313,P305+P351+P338,P362+P364,P332+P313,P301+P312+P330
  • 危险性描述:
    H302,H315,H319
  • 储存条件:
    存储条件:2-8°C,避光,惰性气体环境中保存。

反应信息

  • 作为反应物:
    描述:
    di-(4-iodophenyl)sulfoxidepotassium carbonate 作用下, 以 甲醇二氯甲烷 为溶剂, 反应 5.0h, 生成
    参考文献:
    名称:
    CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTORESIST COMPOSITION
    摘要:
    Provided are a carboxylate salt represented by Formula 1, a photoresist composition including the same, and a pattern forming method using the same: wherein A 11 , L 11 , L 12 , a11, a12, R 11 to R 13 , b13, n11, n12, and M + in Formula 1 are defined as described in the specification.
    公开号:
    US20240199540A1
  • 作为产物:
    描述:
    碘苯氯化亚砜 作用下, 反应 0.08h, 以75%的产率得到di-(4-iodophenyl)sulfoxide
    参考文献:
    名称:
    Highly Rapid and Direct Synthesis of Diaryl Sulfoxides
    摘要:
    芳香化合物在常温下与10 mol%的水共同存在时,能与亚硫酰氯顺利反应,得到相应的对称二芳基亚砜,产率良好至优异,并且具有高的区域选择性。
    DOI:
    10.1055/s-2003-41461
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文献信息

  • CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
    公开号:US20210263416A1
    公开(公告)日:2021-08-26
    Disclosed are a carboxylate represented by formula (I), and a carboxylic acid generator and a resist composition, including the same: wherein R 1 represents a fluorine atom or a fluorinated alkyl group having 1 to 4 carbon atoms; R 2 , R 3 and R 4 each independently represent a halogen atom, a fluorinated alkyl group having 1 to 4 carbon atoms or a hydrocarbon group having 1 to 12 carbon atoms, and —CH 2 — included in the hydrocarbon group may be replaced by —O— or —CO—; m2 and m3 represent an integer of 0 to 4, and m4 represents an integer of 0 to 5; and X 0 represents a hydrocarbon group having 1 to 72 carbon atoms which may have a substituent, and —CH 2 — included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —SO 2 —.
    本发明涉及一种由式(I)表示的羧酸盐、羧酸发生剂和抗蚀组合物,其中:其中,R1表示氟原子或具有1至4个碳原子的氟化烷基;R2、R3和R4各自独立地表示卤素原子、具有1至4个碳原子的氟化烷基或具有1至12个碳原子的碳氢基团,且所述碳氢基团中包含的—CH2—可以被—O—或—CO—所替代;m2和m3表示0至4的整数,m4表示0至5的整数;X0表示具有1至72个碳原子的碳氢基团,该碳氢基团可能具有取代基,且所述碳氢基团中包含的—CH2—可以被—O—、—S—、—CO—或—SO2—所替代。
  • SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
    公开号:US20210255545A1
    公开(公告)日:2021-08-19
    Disclosed are a salt represented by formula (1), and an acid generator and a resist composition which include the same: wherein R1 represents a fluorine atom or a fluorinated alkyl group; R2, R3 and R4 each represent a halogen atom, a fluorinated alkyl group or a hydrocarbon group; m2 and m3 represent an integer of 0 to 4; m4 represents an integer of 0 to 5; Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; L1 represents a saturated hydrocarbon group, —CH2- included in the group may be replaced by —O— or —CO—, and a hydrogen atom included in the group may be substituted with a fluorine atom or a hydroxy group; Y1 represents a methyl group which may have a substituent or an alicyclic hydrocarbon group which may have a substituent.
    本发明涉及一种由式(1)表示的盐,以及包括该盐的酸发生剂和抗蚀组合物: 其中,R1代表氟原子或氟化烷基;R2、R3和R4各代表卤素原子、氟化烷基或烃基;m2和m3代表0到4的整数;m4代表0到5的整数;Q1和Q2各代表氟原子或全氟烷基;L1代表饱和烃基,其中包括在该基团中的-CH2-可被替换为-O-或-CO-,该基团中包括的氢原子可被氟原子或羟基取代;Y1代表可带有取代基的甲基基团或可带有取代基的脂环烃基团。
  • PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF PREPARING THE PHOTOACID GENERATOR
    申请人:Samsung Electronics Co., Ltd.
    公开号:US20220171284A1
    公开(公告)日:2022-06-02
    Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1: wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.
    本发明揭示了一种光酸发生剂、包括其的光阻组合物以及制备该光酸发生剂的方法。该光酸发生剂可以包括由式1表示的化合物:其中,在式1中,CY、A1、A2和B分别如说明书所述。
  • Monomer containing electron-withdrawing group and electron-donative group, and copolymer and proton-conductive membrane comprising same
    申请人:JSR Corporation
    公开号:EP1245554A1
    公开(公告)日:2002-10-02
    A monomer containing an electron-withdrawing group and an electron-donative group which can be easily controlled in the upper limit of the amount of a sulfonic acid , which impairs the mechanical properties of a copolymer, and can provide a sulfonated polymer that forms a proton-conductive membrane having a high proton conductivity over a wide temperature range, an excellent mechanical strength and an excellent proton conductivity and showing inhibited swelling in hot water and an aqueous solution of methanol, and a copolymer obtained from the monomer. A monomer containing an electron-withdrawing group and an electron-donative group represented by the following general formula (1) : wherein Y represents a iodine atom, chlorine atom or bromine atom; X represents an electron-withdrawing group; B represents an electron-donative group; and Z represents an aryl group having a specific structure or a monovalent condensed ring hydrocarbon group such as naphthyl group.
    一种含有一个抽电子基团和一个负电子基团的单体,该单体可以很容易地控制磺酸的用量上限,而磺酸会损害共聚物的机械性能,并可以提供一种磺化聚合物,该聚合物可以在很宽的温度范围内形成具有高质子传导性、优异的机械强度和优异的质子传导性的质子传导膜,并在热水和甲醇水溶液中表现出抑制溶胀的特性,以及由该单体得到的共聚物。一种单体,含有由下式通式(1)代表的一个电子吸收基团和一个电子疏导基团: 其中 Y 代表碘原子、氯原子或溴原子;X 代表抽电子基团;B 代表弃电子基团;Z 代表具有特定结构的芳基或一价缩合环烃基团,如萘基。
  • Polymer electrolyte membrane and solid polymer electrolyte fuel cell using same
    申请人:HONDA GIKEN KOGYO KABUSHIKI KAISHA, JSR CORPORATION
    公开号:US20020172850A1
    公开(公告)日:2002-11-21
    A composite polymer electrolyte membrane is formed from a first polymer electrolyte comprising a sulfonated polyarylene polymer and a second polymer electrolyte comprising another hydrocarbon polymer electrolyte. In the first polymer electrolyte, 2-70 mol % constitutes an aromatic compound unit with an electron-attractive group in its principal chain, while 30-98 mol % constitutes an aromatic compound unit without an electron-attractive group in its principal chain. The second polymer electrolyte is a sulfonated polyether or sulfonated polysulfide polymer electrolyte. The composite polymer electrolyte membrane is formed from a matrix comprising the first polymer electrolyte selected from among sulfonated polyarylene polymers and having an ion exchange capacity in excess of 1.5 meq/g but less than 3.0 meq/g, which is supported on a reinforcement comprising the second polymer electrolyte having an ion exchange capacity in excess of 0.5 meq/g but less than 1.5 meq/g. The polymer electrolyte membrane comprises a polyarylene polymer sulfonated so that the Q value is within the range 0.09-0.18 C/cm 2 .
    一种复合聚合物电解质膜由第一种聚合物电解质和第二种聚合物电解质组成,第一种聚合物电解质由磺化聚芳烃聚合物组成,第二种聚合物电解质由另一种烃类聚合物电解质组成。在第一种聚合物电解质中,2-70 摩尔% 的芳香族化合物单元在其主链中带有电子吸引基,而 30-98 摩尔% 的芳香族化合物单元在其主链中不带有电子吸引基。第二种聚合物电解质是磺化聚醚或磺化聚硫聚合物电解质。复合聚合物电解质膜由基体形成,基体包括从磺化聚芳基聚合物中选出的第一种聚合物电解质,其离子交换容量超过 1.5 meq/g,但小于 3.0 meq/g,基体支撑在由第二种聚合物电解质组成的增强体上,第二种聚合物电解质的离子交换容量超过 0.5 meq/g,但小于 1.5 meq/g。聚合物电解质膜由聚芳基聚合物磺化而成,其 Q 值在 0.09-0.18 C/cm 范围内。 2 .
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