Provided are alkenyl ether-based monomers having multi-ring structure, and photosensitive polymers and resist compositions obtained from the same. The photosensitive polymer includes a monomer unit represented by the following formula:
1
wherein R
4
and R
5
are independently -H or -CH
3
, and R
4
are independently -H, -OH or a alkyl group having 1-20 carbon atoms.
提供了基于烯基醚的多环结构单体,以及从中获得的光敏聚合物和抗蚀组成物。光敏聚合物包括由以下式子表示的单体单元:1其中R4和R5分别独立地为-H或-
CH3,而R4独立地为-H、-OH或具有1-20个碳原子的烷基。