bicyclo[2.2.1]heptane-7-thiol | 1286181-19-8

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: bicyclo[2.2.1]heptane-7-thiol
• 英文别名: Bicyclo[2.2.1]heptane-7-thiol
• CAS: 1286181-19-8
• 化学式: C₇H₁₂S
• 分子量: 128.238
• InChiKey: GWACXNIJFBZZDS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.1
• 重原子数：
  8
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  1
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  bicyclo[2.2.1]heptane-7-thiol 、 methyl 3-bromo-6-bromomethyl-2-methoxybenzoate 在 potassium carbonate 作用下， 以 四氢呋喃 为溶剂， 反应 72.0h， 生成 methyl 6-(bicyclo[2.2.1]hept-7-ylthiomethyl)-3-bromo-2-methoxybenzoate
  参考文献：
  名称：

  [EN] SULPHONE COMPOUNDS FOR USE IN THE TREATMENT OF OBESITY
  [FR] COMPOSÉS SULFONÉS ET LEURS PROCÉDÉS DE FABRICATION ET D'UTILISATION

  摘要：

  公开号：

  WO2011044506A3
• 作为产物：
  描述：

  7-benzylthiobicyclo[2.2.1]heptane 在 氨 、 sodium 、 盐酸 作用下， 以 四氢呋喃 、 水 为溶剂， 生成 bicyclo[2.2.1]heptane-7-thiol
  参考文献：
  名称：

  [EN] SULPHONE COMPOUNDS FOR USE IN THE TREATMENT OF OBESITY
  [FR] COMPOSÉS SULFONÉS ET LEURS PROCÉDÉS DE FABRICATION ET D'UTILISATION

  摘要：

  公开号：

  WO2011044506A3

文献信息

• CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20190121233A1

  公开（公告）日：2019-04-25

  A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

  一种化学增感型正型光敏树脂组合物，能够抑制“足部”现象的发生，即底部（靠近支撑表面的一侧）的宽度变窄，小于顶部（靠近抗蚀层表面的一侧）的宽度，同时在使用该光敏树脂组合物在基板的金属表面上形成用作电镀物品模板的抗蚀图案时，能够减少残留物的产生。该光敏树脂组合物中包含一种具有特定结构的巯基化合物，其中包括一个酸发生剂，该酸发生剂在暴露于辐射活性光线或辐射时产生酸，以及一种树脂，在酸的作用下其在碱性溶液中的溶解度增加。
• CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20200209739A1

  公开（公告）日：2020-07-02

  A chemically amplified photosensitive composition which forms a resist pattern whose cross-sectional shape is rectangular, and which has a wide depth of focus margin; a photosensitive dry film having a photosensitive layer made from the composition; a method of manufacturing a patterned-resist film using the composition; a method of manufacturing a substrate with a template using the composition; a method of manufacturing a plated article using the substrate with a template; and a novel compound. An acid diffusion suppressing agent having a specific structure is blended into the composition including an acid generator which generates acid upon exposure to an irradiated active ray or radiation.

  一种化学增感光敏组合物，形成一个截面形状为矩形的抗蚀图案，具有宽广的焦深度余量；一种具有由该组合物制成的感光层的感光干膜；使用该组合物制造图案抗蚀膜的方法；使用该组合物制造带有模板的基板的方法；使用带有模板的基板制造电镀物品的方法；以及一种新型化合物。酸扩散抑制剂与包括在暴露于辐射活性光线或辐射时生成酸的酸发生剂的组合物中混合，具有特定的结构。
• Sulphone Compounds and Methods of Making and Using Same
  申请人：Dyke Hazel J.

  公开号：US20130053364A1

  公开（公告）日：2013-02-28

  The invention provides sulphone compounds and their use in treating medical disorders, such as obesity. Pharmaceutical compositions and methods of making various sulphone compounds are provided. The compounds are contemplated to have activity against methionyl aminopeptidase 2.

  本发明提供了磺酰化合物及其在治疗医学疾病（如肥胖症）中的应用。同时提供了制备各种磺酰化合物的药物组合物和方法。这些化合物被认为对甲硫氨酰肽酶2具有活性。
• Sulphone compounds and methods of making and using same
  申请人：Dyke Hazel J.

  公开号：US09067905B2

  公开（公告）日：2015-06-30

  The invention provides sulphone compounds and their use in treating medical disorders, such as obesity. Pharmaceutical compositions and methods of making various sulphone compounds are provided. The compounds are contemplated to have activity against methionyl aminopeptidase 2.

  本发明提供了磺酰化合物及其在治疗医学疾病，如肥胖症方面的应用。还提供了制备各种磺酰化合物的药物组合物和方法。预计这些化合物对甲硫氨酰胺肽酶2具有活性。
• SULPHONE COMPOUNDS AND METHODS OF MAKING AND USING SAME
  申请人：Zafgen, Inc.

  公开号：US20160051531A1

  公开（公告）日：2016-02-25

  The invention provides sulphone compounds and their use in treating medical disorders, such as obesity. Pharmaceutical compositions and methods of making various sulphone compounds are provided. The compounds are contemplated to have activity against methionyl aminopeptidase 2.

  本发明提供了磺酰化合物及其在治疗医学疾病（如肥胖症）中的应用。还提供了制备各种磺酰化合物的药物组合物和方法。这些化合物被认为对甲硫氨酸氨肽酶2具有活性。