申请人:Sawai Pharmaceutical Co., Ltd.
公开号:US05457099A1
公开(公告)日:1995-10-10
1. A compound of the formula: ##STR1## wherein the symbol of a solid line with a broken line means a single bond or a double bond, R and R' are independently selected from the group consisting of hydrogen atom, halogen atom, lower alkyl, nitro, unsubstituted amino and substituted amino, A and B are independently selected from the group consisting of hydrogen atom, lower alkyl optionally substituted with a lower cycloalkyl, aryl optionally substituted with one or more halogen atoms and the group: -Y-R.sup.2 wherein Y is lower alkylene and R.sup.2 is the group: ##STR2## wherein m is integer of 1 to 3, n is 0 or 1, Z is >N-, >CH-- or >C=, R.sup.3 is diaryl (lower) alkyl optionally substituted with one or more halogen atoms or is condensed heterocyclic group optionally substituted with oxo, with the proviso that (a) at least one of A and B is the group -Y-R.sup.2 and (b) when A is hydrogen atom and B is the group -Y-R.sup.2, then Z is >CH-- or >C= if R.sup.3 is condensed heterocyclic group optionally substituted with oxo and n is O or a pharmaceutically acceptable salt thereof. The compounds of the above formula have antiallergic activity.
该化合物的结构式如下:##STR1##其中实线和虚线表示单键或双键,R和R'分别选自氢原子、卤素原子、低烷基、硝基、未取代氨基和取代氨基的群体,A和B分别选自氢原子、可选择用低环烷基取代的低烷基、可选择用一个或多个卤素原子取代的芳基以及该群体:-Y-R.sup.2,其中Y为低烷基,R.sup.2为该群体:##STR2##其中m为1至3的整数,n为0或1,Z为>N-、>CH--或>C=,R.sup.3为可选择用一个或多个卤素原子取代的二芳基(低)烷基或是可选择用氧代取代的缩杂环基团,但须满足(a)至少一个A和B为该群体-Y-R.sup.2,以及(b)当A为氢原子且B为该群体-Y-R.sup.2时,若R.sup.3为可选择用氧代取代的缩杂环基团且n为0,则Z为>CH--或>C=或其药用盐。上述结构的化合物具有抗过敏活性。