A light- or radiation-sensitive polymer composition comprising (a) a poly(amic acid) having as a major component a repeating unit of the formula: ##STR1## (b) one or more light- or radiation-sensitive compounds having an amino group and an aromatic azide group or aromatic sulfonylazide group in one molecule, and if necessary (c) one or more photosensitizers and/or amine compounds having at least one unsaturated bonding, and/or (d) one or more compounds having at least two unsaturated bonding in one molecule, is highly sensitive to light and radiation and can give a precise relief pattern on a substrate. Further, a finally obtained polyimide film is excellent in heat resistance.
一种光或辐射敏感的聚合物组合物,包括(a)聚
酰亚胺,其主要成分为重复单元的公式为:##STR1## (b)一种或多种光或辐射敏感化合物,其在一个分子中具有
氨基和芳香基偶氮基团或芳香基磺酰偶氮基团,如有必要,(c)一种或多种光敏剂和/或具有至少一个不饱和键的胺化合物,和/或(d)一种或多种在一个分子中具有至少两个不饱和键的化合物,对光和辐射非常敏感,并且可以在衬底上给出精确的浮雕图案。此外,最终得到的聚
酰亚胺薄膜具有优异的耐热性。