The present invention recites a method comprising reacting in a solvent in the presence of a base
a) at least one diacidic monomer comprising about 1 to 100 mole % of at least one light-absorbing monomer having a light absorption maximum between about 300 nm and about 1200 nm and 99-0 mole % of a non-light absorbing monomer which does not absorb significant light at wavelengths above 300 nm or has a light absorption maximum below 300 nm, with
b) an organic compound of Formula II
X—B—X
1
wherein B is a divalent organic radical to form a light absorbing composition comprising a mixture of a polymer having the formula
1
and a cyclic compound having the general formula
2
wherein B is as defined above; n is at least 2, m is 1, 2, 3 or 4 and A comprises the residue of a diacidic monomer comprising about 1 to 100 mole % of at least one light-absorbing monomer having a light absorption maximum between about 300 nm and about 1000 nm and wherein the remaining portion of A comprises the residue of a non-light absorbing monomer which does not absorb significant light at wavelengths above 300 nm or has a light absorption maximum below 300 nm.
本发明涉及一种方法,包括在溶剂中,在碱的存在下反应:a)至少一种二酸单体,其中包括约1至100摩尔%的至少一种具有在300nm至1200nm之间的光吸收最大值的光吸收单体和99-0摩尔%的不吸收在300nm以上波长处的显著光或具有在300nm以下的光吸收最大值的非光吸收单体;b)式IIX-B-X1的有机化合物,其中B是二价有机基团,以形成一种光吸收组合物,该组合物包括具有式1的
聚合物和具有一般式2的环状化合物,其中B如上所定义;n至少为2,m为1、2、3或4,A包括约1至100摩尔%的至少一种具有在300nm至1000nm之间的光吸收最大值的光吸收单体的残基,其中A的其余部分包括不吸收在300nm以上波长处的显著光或具有在300nm以下的光吸收最大值的非光吸收单体的残基。