NH<sub>4</sub>HF<sub>2</sub> as a Selective TBS-Removal Reagent for the Synthesis of Highly Functionalized Spiroketal via Tandem Deprotection/Spiroketalization Procedure
作者:Hui Lu、Fu-Min Zhang、Jin-Long Pan、Tao Chen、Yi-Fan Li
DOI:10.1021/jo402167q
日期:2014.1.17
NH4HF2 has been used for the first time to selectively remove the TBS protecting groups from diol ketone precursors in the synthesis of highly functionalized spiroketals. This method allows the synthesis of [5,6], [6,6], and [6,7] spiroketal skeletons, as well as benzannulated spiroketal with retention of acid-sensitive groups. In this way, spiroketals can be synthesized with diverse substituent groups
NH 4 HF 2首次用于在高度官能化的螺酮金属的合成中从二醇酮前体中选择性除去TBS保护基。这种方法可以合成[5,6],[6,6]和[6,7]螺酮骨架,以及保留了酸敏感基团的苯并环螺酮酮。以此方式,可以合成在骨架或侧链上具有不同取代基的螺缩酮。为了证明该方法的实用性,还研究了高度功能化的螺酮3f的各种转化。