methacrylic acid 6-(2-trifluoromethyl-2-hydroxyl-1,1,1-trifluoropropyl)-norbornanyl ester

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: methacrylic acid 6-(2-trifluoromethyl-2-hydroxyl-1,1,1-trifluoropropyl)-norbornanyl ester
• 英文别名: 6-[3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propyl]-norbornan-2-yl 2-methacrylate；Methacrylic acid 6-[3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propyl]bicyclo[2.2.1]heptane-2-yl ester；[6-[3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propyl]-2-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate
• 化学式: C₁₅H₁₈F₆O₃
• 分子量: 360.297
• InChiKey: IRDKNIICJPQJOW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.5
• 重原子数：
  24
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.8
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  9

反应信息

• 作为产物：
  描述：

  甲基丙烯酸 、 六氟异丙醇甲基降冰片烯 在 甲烷磺酸 作用下， 反应 8.0h， 生成 methacrylic acid 5-(2-trifluoromethyl-2-hydroxyl-1,1,1-trifluoropropyl)-norbornanyl ester 、 methacrylic acid 6-(2-trifluoromethyl-2-hydroxyl-1,1,1-trifluoropropyl)-norbornanyl ester 、 5,5-bis(trifluoromethyl)-4-oxatricyclo[5.2.1.0(3,8)]decane
  参考文献：
  名称：

  Process for Producing Alpha-Substituted Norbornanyl Acrylates

  摘要：

  本发明公开了一种在工业规模下高效制备α-取代诺博烯基丙烯酸酯的方法，同时抑制了由分子内环化、过量添加丙烯酸等产生的副产物的形成。所述α-取代诺博烯基丙烯酸酯可用作诺博烯抗蚀单体。在所公开的方法中，α-取代丙烯酸直接与取代诺博烯在甲烷磺酸和樟脑磺酸中至少选择一种酸催化剂的存在下反应。在该反应中，可以抑制由分子内环化、酸的过量添加到反应产物等产生的副产物的形成。

  公开号：

  US20110137073A1

文献信息

• Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer
  申请人：Central Glass Company, Limited

  公开号：US20150361026A1

  公开（公告）日：2015-12-17

  As shown by the following reaction formula, disclosed is a fluorine-containing hydroxyaldehyde production method, including the step of obtaining a fluorine-containing hydroxyaldehyde represented by the general formula (1) by reacting a fluorine-containing ketone represented by the general formula (4) and an aldehyde represented by the general formula (5) in the presence of an organic base selected from a heterocyclic compound which contains a nitrogen atom in its ring or a tertiary amine. By this production method, it is possible to obtain the fluorine-containing hydroxyaldehyde in a high yield. Furthermore, it is possible to easily obtain in high yields a fluorine-containing propanediol, which is a derivative of this fluorine-containing hydroxyaldehyde, and a fluorine-containing alcohol monomer by using the same.

  根据以下反应方程式，揭示了一种含氟羟基醛的生产方法，包括通过在选择的含氟酮（通式（4）表示）和醛（通式（5）表示）在含有从含有氮原子的杂环化合物或三级胺中选择的有机碱的情况下反应，获得由通式（1）表示的含氟羟基醛的步骤。通过这种生产方法，可以高产率地获得含氟羟基醛。此外，可以通过使用相同方法轻松高产率地获得含氟丙二醇（这是这种含氟羟基醛的衍生物）和含氟醇单体。
• Process for producing alpha-substituted acrylic norbornanyyl compounds
  申请人：Komata Takeo

  公开号：US20050131248A1

  公开（公告）日：2005-06-16

  A process for producing an α-substituted acrylic norbornanyl compound represented by the formula [3] includes reacting an α-substituted acrylic acid anhydride represented by the formula [1] with a substituted norbornanyl alcohol represented by the formula [2]. wherein R 1 represents a hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, or perfluoroethyl group, and wherein one of R 2 , R 3 and R 4 is a CF 3 C(CF 3 )(OH)CH 2 — group, and each of the other two of R 2 , R 3 and R 4 is a hydrogen.

  生产α-取代丙烯基莽环烷基化合物的过程如下：将式[1]表示的α-取代丙烯酸酐与式[2]表示的取代莽环烷基醇反应。 其中，R1代表氢原子、甲基、乙基、正丙基、异丙基、正丁基、仲丁基、叔丁基、氟甲基、二氟甲基、三氟甲基或全氟乙基；R2、R3和R4中的一个是 C(CF3)(OH)CH2—基团，另外两个是氢原子。
• Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same
  申请人：Central Glass Company, Limited

  公开号：US20150198879A1

  公开（公告）日：2015-07-16

  Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, R 01 represents a hydrogen atom or a monovalent organic group, and M + represents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER.

  本公开了一种含氟磺酸盐树脂，其具有以下通用式（3）所代表的重复单元。在该式中，每个A独立地表示氢原子、氟原子或三氟甲基基团，n表示1-10的整数。W表示二价连接基团，R01表示氢原子或一价有机基团，M+表示一价阳离子。含有该树脂的抗蚀组合物在感光性、分辨率和掩膜图案的重现性方面更加优越，并且能够形成具有较低LER的图案。
• MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS
  申请人：Ober Matthias S.

  公开号：US20130011783A1

  公开（公告）日：2013-01-10

  Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

  提供含有缩醛基团的（甲基）丙烯酸酯单体，包含由这种单体形成的单元的聚合物，以及含有这种聚合物的光刻胶组合物。这些单体、聚合物和光刻胶组合物可用于形成光刻图案。还提供了涂有光刻胶组合物的基板、形成光刻图案的方法和电子设备。这些组合物、方法和涂层基板在半导体器件制造中具有特定的适用性。
• Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method
  申请人：MORI Kazunori

  公开号：US20130065182A1

  公开（公告）日：2013-03-14

  According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.

  根据本发明，提供了一种含氟磺酸盐重复单元为以下通式（3）的树脂。为了防止图案形成后的粗糙度或图案形成失败等不足，该含氟磺酸盐树脂具有光酸发生功能，并作为一种抗蚀树脂，其中“能够通过酸作用改变其显影剂溶解性的基团”和“具有光酸发生功能的基团”有规律地排列。