4-[3,5-二甲基-4-(4-硝基苄氧基)苯基]-4-氧代丁酸琥珀酰亚胺酯 | 948995-62-8

• 物质功能分类: 生物 - 细胞培养 - 添加剂
• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 4-[3,5-二甲基-4-(4-硝基苄氧基)苯基]-4-氧代丁酸琥珀酰亚胺酯
• 英文名称: 4-[3,5-dimethyl-4-(4-nitro-benzyloxy)-phenyl]-4-oxo-butyric acid 2,5-dioxo-pyrrolidin-1-yl ester
• 英文别名: Succinimidyl 4-[3,5-Dimethyl-4-(4-nitrobenzyloxy)phenyl]-4-oxobutyrate；(2,5-dioxopyrrolidin-1-yl) 4-[3,5-dimethyl-4-[(4-nitrophenyl)methoxy]phenyl]-4-oxobutanoate
• CAS: 948995-62-8
• 化学式: C₂₃H₂₂N₂O₈
• 分子量: 454.436
• InChiKey: CUTCHWUKZOOSRX-UHFFFAOYSA-N

物化性质

• 沸点：
  652.0±65.0 °C(Predicted)
• 密度：
  1.39±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  33
• 可旋转键数：
  9
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.3
• 拓扑面积：
  136
• 氢给体数：
  0
• 氢受体数：
  8

安全信息

• 储存条件：
  存储条件：2-8℃，充氩保存

SDS

Succinimidyl 4-[3,5-Dimethyl-4-(4-
nitrobenzyloxy)phenyl]-4-oxobutyrate
SAFETY DATA SHEET

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Section 1. IDENTIFICATION
Product name: Succinimidyl 4-[3,5-Dimethyl-4-(4-nitrobenzyloxy)phenyl]-4-oxobutyrate

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Section 2. HAZARDS IDENTIFICATION
GHS classification
PHYSICAL HAZARDS Not classified
Not classified
HEALTH HAZARDS
ENVIRONMENTAL HAZARDS Not classified
GHS label elements, including precautionary statements
Pictograms or hazard symbols None
Signal word No signal word
Hazard statements None
Precautionary statements: None

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Section 3. COMPOSITION/INFORMATION ON INGREDIENTS
Substance
Substance/mixture:
Components: Succinimidyl 4-[3,5-Dimethyl-4-(4-nitrobenzyloxy)phenyl]-4-oxobutyrate
>96.0%(LC)
Percent:
CAS Number: 948995-62-8
4-[3,5-Dimethyl-4-(4-nitrobenzyloxy)phenyl]-4-oxobutyric Acid Succinimidyl Ester
Synonyms:
Chemical Formula: C23H22N2O8

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Section 4. FIRST AID MEASURES
Inhalation: Remove victim to fresh air and keep at rest in a position comfortable for breathing.
Get medical advice/attention if you feel unwell.
Skin contact: Remove/Take off immediately all contaminated clothing. Rinse skin with
water/shower. If skin irritation or rash occurs: Get medical advice/attention.
Eye contact: Rinse cautiously with water for several minutes. Remove contact lenses, if present
and easy to do. Continue rinsing. If eye irritation persists: Get medical
advice/attention.
Get medical advice/attention if you feel unwell. Rinse mouth.
Ingestion:
Protection of first-aiders: A rescuer should wear personal protective equipment, such as rubber gloves and air-
tight goggles.

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Section 5. FIRE-FIGHTING MEASURES
Dry chemical, foam, water spray, carbon dioxide.
Suitable extinguishing
media:
Specific hazards arising Take care as it may decompose upon combustion or in high temperatures to
from the chemical: generate poisonous fume.
Succinimidyl 4-[3,5-Dimethyl-4-(4-
nitrobenzyloxy)phenyl]-4-oxobutyrate

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Section 5. FIRE-FIGHTING MEASURES
Precautions for firefighters: Fire-extinguishing work is done from the windward and the suitable fire-extinguishing
method according to the surrounding situation is used. Uninvolved persons should
evacuate to a safe place. In case of fire in the surroundings: Remove movable
containers if safe to do so.
Special protective When extinguishing fire, be sure to wear personal protective equipment.
equipment for firefighters:

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Section 6. ACCIDENTAL RELEASE MEASURES
Use personal protective equipment. Keep people away from and upwind of spill/leak.
Personal precautions,
protective equipment and Entry to non-involved personnel should be controlled around the leakage area by
emergency procedures: roping off, etc.
Environmental precautions: Prevent product from entering drains.
Methods and materials for Sweep dust to collect it into an airtight container, taking care not to disperse it.
containment and cleaning Adhered or collected material should be promptly disposed of, in accordance with
up: appropriate laws and regulations.

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Section 7. HANDLING AND STORAGE
Precautions for safe handling
Handling is performed in a well ventilated place. Wear suitable protective equipment.
Technical measures:
Prevent dispersion of dust. Wash hands and face thoroughly after handling.
Use a local exhaust if dust or aerosol will be generated.
Advice on safe handling: Avoid contact with skin, eyes and clothing.
Conditions for safe storage, including any
incompatibilities
Storage conditions: Keep container tightly closed. Store in a refrigerator.
Store under inert gas.
Protect from moisture.
Store away from incompatible materials such as oxidizing agents.
Heat-sensitive, Moisture-sensitive
Packaging material: Comply with laws.

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Section 8. EXPOSURE CONTROLS / PERSONAL PROTECTION
Engineering controls: Install a closed system or local exhaust as possible so that workers should not be
exposed directly. Also install safety shower and eye bath.
Personal protective equipment
Respiratory protection: Dust respirator. Follow local and national regulations.
Hand protection: Protective gloves.
Safety glasses. A face-shield, if the situation requires.
Eye protection:
Skin and body protection: Protective clothing. Protective boots, if the situation requires.

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Section 9. PHYSICAL AND CHEMICAL PROPERTIES
Physical state (20°C): Solid
Crystal- Powder
Form:
Colour: White - Almost white
No data available
Odour:
pH: No data available
Melting point/freezing point:No data available
Boiling point/range: No data available
No data available
Flash point:
Flammability or explosive
limits:
Lower: No data available
Upper: No data available
Relative density: No data available
Solubility(ies):
[Water] No data available
Succinimidyl 4-[3,5-Dimethyl-4-(4-
nitrobenzyloxy)phenyl]-4-oxobutyrate

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Section 9. PHYSICAL AND CHEMICAL PROPERTIES
[Other solvents] No data available

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Section 10. STABILITY AND REACTIVITY
Chemical stability: Stable under proper conditions.
Possibility of hazardous No special reactivity has been reported.
reactions:
Incompatible materials: Oxidizing agents
Hazardous decomposition Carbon monoxide, Carbon dioxide, Nitrogen oxides (NOx)
products:

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Section 11. TOXICOLOGICAL INFORMATION
Acute Toxicity: No data available
Skin corrosion/irritation: No data available
Serious eye No data available
damage/irritation:
Germ cell mutagenicity: No data available
Carcinogenicity:
IARC = No data available
No data available
NTP =
Reproductive toxicity: No data available

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Section 12. ECOLOGICAL INFORMATION
Ecotoxicity:
Fish: No data available
Crustacea: No data available
No data available
Algae:
Persistence / degradability: No data available
No data available
Bioaccumulative
potential(BCF):
Mobility in soil
Log Pow: No data available
Soil adsorption (Koc): No data available
Henry's Law No data available
constant(PaM3/mol):

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Section 13. DISPOSAL CONSIDERATIONS
Recycle to process, if possible. Consult your local regional authorities. You may be able to dissolve or mix material
with a combustible solvent and burn in a chemical incinerator equipped with an afterburner and scrubber system.
Observe all federal, state and local regulations when disposing of the substance.

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Section 14. TRANSPORT INFORMATION
Hazards Class: Does not correspond to the classification standard of the United Nations
UN-No: Not listed

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Section 15. REGULATORY INFORMATION
Safe management ordinance of dangerous chemical product (State Council announces on January 26, 2002
and revised on February 16,2011): Safe use and production, the storage of a dangerous chemical, transport,
loading and unloading were prescribed.
Succinimidyl 4-[3,5-Dimethyl-4-(4-
nitrobenzyloxy)phenyl]-4-oxobutyrate

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SECTION 16 - ADDITIONAL INFORMATION
N/A

制备方法与用途

制备方法

4-[3,5-二甲基-4-(4-硝基苄氧基)苯基]-4-氧代丁酸琥珀酰亚胺酯是由Maki等人开发的一种光裂解分子标记物，在离子激光照射后能够选择性和重复性地产生一个MS检测离子。例如，该化合物与氨基酸、短肽或糖衍生物反应生成加成物；在负离子模式下的LDI-MS检测中，无需其他基质即可完成。应用实例如下图所示。

用途简介

暂无内容

用途

4-[3,5-二甲基-4-(4-硝基苄氧基)苯基]-4-氧代丁酸琥珀酰亚胺酯是由Maki等人开发的一种光裂解分子标记物，在离子激光照射后能够选择性和重复性地产生一个MS检测离子。例如，该化合物与氨基酸、短肽或糖衍生物反应生成加成物；在负离子模式下的LDI-MS检测中，无需其他基质即可完成。应用实例如下图所示：

反应信息

• 作为反应物：
  描述：

  4-[3,5-二甲基-4-(4-硝基苄氧基)苯基]-4-氧代丁酸琥珀酰亚胺酯 在 吡啶 、 sodium azide 、 copper(I) sulfate 、 copper(II) sulfate 、 sodium ascorbate 作用下， 以 二氯甲烷 、 N,N-二甲基甲酰胺 为溶剂， 反应 39.0h， 生成 [(2R,3R,4S,5R,6R)-4,5-diacetyloxy-6-[[1-[2-[2-[[4-[3,5-dimethyl-4-[(4-nitrophenyl)methoxy]phenyl]-4-oxobutanoyl]amino]ethoxy]ethyl]triazol-4-yl]methoxy]-3-[(2R,3R,4S,5R,6R)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxyoxan-2-yl]methyl acetate
  参考文献：
  名称：

  Photocleavable Molecule for Laser Desorption Ionization Mass Spectrometry

  摘要：

  A new photocleavable molecule for laser desorption ionization mass spectrometry (LDI-MS) was designed and synthesized. The molecule exhibited high sensitivity for negative mode MS detection with good chemical stability. The molecule was successfully applied to molecular tag for (LDI-MS). Kinetic measurement of the amidation reaction and monitoring of aminolysis of acetylated sugars were demonstrated with the molecular tag.

  DOI：

  10.1021/jo070621b
• 作为产物：
  描述：

  4-(4-甲氧基-3,5-二甲基苯基)-4-氧代丁酸 在 sodium hydroxide 、 三溴化硼 、 potassium carbonate 、 盐酸-N-乙基-Nˊ-(3-二甲氨基丙基)碳二亚胺 作用下， 以 四氢呋喃 、 二氯甲烷 、 N,N-二甲基甲酰胺 为溶剂， 反应 33.0h， 生成 4-[3,5-二甲基-4-(4-硝基苄氧基)苯基]-4-氧代丁酸琥珀酰亚胺酯
  参考文献：
  名称：

  Photocleavable Molecule for Laser Desorption Ionization Mass Spectrometry

  摘要：

  A new photocleavable molecule for laser desorption ionization mass spectrometry (LDI-MS) was designed and synthesized. The molecule exhibited high sensitivity for negative mode MS detection with good chemical stability. The molecule was successfully applied to molecular tag for (LDI-MS). Kinetic measurement of the amidation reaction and monitoring of aminolysis of acetylated sugars were demonstrated with the molecular tag.

  DOI：

  10.1021/jo070621b

文献信息

• POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME
  申请人：FUJIMI INCORPORATED

  公开号：EP2237311A1

  公开（公告）日：2010-10-06

  A polishing composition according to a first aspect of the present invention contains a nitrogen-containing compound and abrasive grains, and the pH of the composition is in the range of 1 to 7. The nitrogen-containing compound in the polishing composition preferably has a structure expressed by a formula: R1-N(-R2)-R3 in which R1, R2, and R3 each represent an alkyl group with or without a characteristic group, two of R1 to R3 may form a part of a heterocycle, and two of R1 to R3 may be identical and form a part of a heterocycle with the remaining one, Alternatively, the nitrogen-containing compound is preferably selected from a group consisting of a carboxybetaine type ampholytic surfactant, a sulfobetaine type ampholytic surfactant, an imidazoline type ampholytic surfactant, and an amine oxide type ampholytic surfactant. A polishing composition according to a second aspect of the present invention contains a water-soluble polymer and abrasive grains, and the pH of the composition is in the range of 1 to 8.

  根据本发明第一方面的抛光组合物含有含氮化合物和磨粒，组合物的 pH 值在 1 至 7 之间。抛光组合物中的含氮化合物最好具有由式表示的结构：R1-N(-R2)-R3，其中 R1、R2 和 R3 各代表一个带或不带特征基团的烷基，R1 至 R3 中的两个可构成杂环的一部分，R1 至 R3 中的两个可相同并与其余一个构成杂环的一部分，或者，R1 至 R3 中的两个可相同并与其余一个构成杂环的一部分，或者，R1 至 R3 中的两个可相同并与其余一个构成杂环的一部分、含氮化合物最好选自由羧基甜菜碱型两性表面活性剂、磺基甜菜碱型两性表面活性剂、咪唑啉型两性表面活性剂和氧化胺型两性表面活性剂组成的组。根据本发明第二方面的抛光组合物含有水溶性聚合物和磨粒，组合物的 pH 值在 1 至 8 之间。
• Polishing composition and polishing method using the same
  申请人：Mizuno Takahiro

  公开号：US10144849B2

  公开（公告）日：2018-12-04

  A polishing composition contains a nitrogen-containing compound and abrasive grains, and the pH of the composition is in the range of 1 to 7. The nitrogen-containing compound in the polishing composition preferably has a structure expressed by a formula: R1—N(—R2)—R3 in which R1, R2, and R3 each represent an alkyl group with or without a characteristic group, two of R1 to R3 may form a part of a heterocycle, and two of R1 to R3 may be identical and form a part of a heterocycle with the remaining one. Alternatively, the nitrogen-containing compound is preferably selected from a group consisting of a carboxybetaine type ampholytic surfactant, a sulfobetaine type ampholytic surfactant, an imidazoline type ampholytic surfactant, and an amine oxide type ampholytic surfactant. A polishing composition may contain a water-soluble polymer and abrasive grains, and the pH of the composition is in the range of 1 to 8.

  一种抛光组合物含有一种含氮化合物和磨粒，组合物的 pH 值在 1 至 7 之间。抛光组合物中的含氮化合物最好具有由式表示的结构：R1-N(-R2)-R3，其中 R1、R2 和 R3 各代表一个带或不带特征基团的烷基，R1 至 R3 中的两个可构成杂环的一部分，R1 至 R3 中的两个可相同并与其余一个构成杂环的一部分。另外，含氮化合物最好选自羧基甜菜碱型两性表面活性剂、磺基甜菜碱型两性表面活性剂、咪唑啉型两性表面活性剂和氧化胺型两性表面活性剂组成的组。抛光组合物可包含水溶性聚合物和磨粒，组合物的 pH 值范围为 1 至 8。
• Concise Synthesis of Photocleavable Molecular Tag for Laser Desorption Ionization Mass Spectrometry via Fries Reaction
  作者：Jeremiah W. Gathirwa、Toshihide Maki

  DOI：10.1080/00397911.2011.619678

  日期：2013.3.1

  A new synthetic route for the photocleavable molecular tag for laser desorption ionization mass spectrometry (LDI-MS) was achieved using the Fries reaction of 2,6-dimethylphenyl ester as its key reaction. Zirconium chloride was used as uniquely efficient adjuvant to promote the reaction. The molecular tag was obtained in five steps without chromatographic purification. Supplemental materials are available for this article. Go to the publisher's online edition of Synthetic Communications (R) to view the free supplemental file.
• Polishing Composition and Polishing Method Using the Same
  申请人：Mizuno Takahiro

  公开号：US20100301014A1

  公开（公告）日：2010-12-02

  A polishing composition contains a nitrogen-containing compound and abrasive grains, and the pH of the composition is in the range of 1 to 7. The nitrogen-containing compound in the polishing composition preferably has a structure expressed by a formula: R 1 —N(—R 2 )—R 3 in which R 1 , R 2 , and R 3 each represent an alkyl group with or without a characteristic group, two of R 1 to R 3 may form a part of a heterocycle, and two of R 1 to R 3 may be identical and form a part of a heterocycle with the remaining one. Alternatively, the nitrogen-containing compound is preferably selected from a group consisting of a carboxybetaine type ampholytic surfactant, a sulfobetaine type ampholytic surfactant, an imidazoline type ampholytic surfactant, and an amine oxide type ampholytic surfactant. A polishing composition may contain a water-soluble polymer and abrasive grains, and the pH of the composition is in the range of 1 to 8.
• RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE
  申请人：KAWASHIMA Takashi

  公开号：US20120146264A1

  公开（公告）日：2012-06-14

  A resin composition for laser engraving is provided that includes a low molecular weight compound containing at least one type of polymerizable group selected from the group consisting of an ethylenically unsaturated group, an epoxy group, an oxetanyl group, a hydrolyzable silyl group, and a silanol group and further containing a sulfonamide group, a low molecular weight compound containing a residue selected from the group consisting of a maleimide group, a succinimide group, and a phthalimide group, or a polymer compound containing a constituent unit derived from a compound containing a maleimide group or a constituent unit containing a sulfonamide group.