3-iodo-p-menthane | 64240-81-9

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 3-iodo-p-menthane
• 英文别名: 3-Jod-p-menthan；Cyclohexane, 2-iodo-4-methyl-1-(1-methylethyl)-；2-iodo-4-methyl-1-propan-2-ylcyclohexane
• CAS: 64240-81-9
• 化学式: C₁₀H₁₉I
• 分子量: 266.165
• InChiKey: LXMCEJFXTJVFGL-UHFFFAOYSA-N

物化性质

• 沸点：
  247.8±9.0 °C(Predicted)
• 密度：
  1.34±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  5
• 重原子数：
  11
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为反应物：
  描述：

  3-iodo-p-menthane 在 氢氧化钾 作用下， 生成 对薄荷-3-烯
  参考文献：
  名称：

  Kondakow; Bachtschiew, Journal fur praktische Chemie (Leipzig 1954), 1901, vol. <2> 63, p. 56

  摘要：

  DOI：
• 作为产物：
  描述：

  薄荷脑 在 4-aminophenyl diphenylphosphinite 、 碘 作用下， 以 二氯甲烷 为溶剂， 反应 2.0h， 以92.5%的产率得到3-iodo-p-menthane
  参考文献：
  名称：

  4-氨基苯基二苯基次膦酸盐 (APDPP)，一种新的异质酸清除剂次膦酸盐 — 将醇、三甲基甲硅烷基和四氢吡喃基醚转化为具有卤素或 N-卤代琥珀酰亚胺的烷基卤

  摘要：

  制备了一种新的非均相次膦酸盐，即 4-氨基苯基二苯基次膦酸盐 (APDPP)，并用于在分子卤素或 N-卤代琥珀酰亚胺存在下将醇、三甲基甲硅烷基醚和四氢吡喃基醚有效转化为其相应的溴化物、碘化物和氯化物。该次膦酸盐中的氨基充当酸清除剂并去除产生的酸。简单的过滤很容易去除副产物次膦酸盐。关键词：4-氨基苯基二苯基次膦酸盐，醇，三甲基甲硅烷基醚，四氢吡喃基醚，卤代烷。

  DOI：

  10.1139/v06-120

文献信息

• BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20160340374A1

  公开（公告）日：2016-11-24

  An object of the present invention is to provide a compound which is capable of attaining a composition having high storage stability without reacting with a base-reactive compound, even in the case of storage for a long period of time in a mixed state with the base-reactive compound, such as an epoxy-based compound, as well as capable of generating a strong base (guanidines, biguanides, phosphazenes or phosphoniums) by irradiation of light (active energy rays) or heating; a base generator comprising the compound; and a base-reactive composition comprising the base generator and the base-reactive compound. The present invention relates to the compound represented by the general formula (A); the base generator comprising the compound; and the base-reactive composition comprising the base generator and the base-reactive compound. (wherein R 1 represents an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; an alkenyl group; a 2-furylethynyl group; a 2-thiophenylethynyl group; or a 2,6-dithianyl group; R 2 to R 4 each independently represent an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; the aryl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; a furanyl group; a thienyl group; or an N-alkyl-substituted pyrrolyl group; Z + represents an ammonium cation having a guanidinium group, a biguanidium group or a phosphazenium group, or a phosphonium cation.)

  本发明的目的是提供一种化合物，能够在与碱反应性化合物混合状态长时间存储的情况下，仍能获得具有高储存稳定性的组合物，而不与碱反应性化合物发生反应，同时还能通过光照（活性能量射线）或加热产生强碱（胍胺、双胍胺、磷氮烷或磷銨）；包括该化合物的碱发生器；以及包括该碱发生器和碱反应性化合物的碱反应性组合物。本发明涉及由通式（A）表示的化合物；包括该化合物的碱发生器；以及包括该碱发生器和碱反应性化合物的碱反应性组合物。（其中R1代表烷基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基炔基；烯基；2-呋喃基炔基；2-噻吩基炔基；或2,6-二硫基基；R2到R4各自独立地代表烷基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基炔基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基；呋喃基；噻吩基；或N-烷基取代的吡咯基；Z+代表具有胍胺基团、双胍胺基团或磷氮烷基团的铵阳离子，或磷銨阳离子。）
• ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20190002403A1

  公开（公告）日：2019-01-03

  The present invention relates to a compound represented by the general formula (A), a base- and/or radical-generating agent comprising the compound, and so on. In the formula, four pieces of R 1 each independently represents a hydrogen atom or a fluorine atom; four pieces of R 2 each independently represent a fluorine atom or a trifluoromethyl group; R 3 , R 6 , R 7 and R 10 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R 4 and R 5 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, or R 4 and R 5 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; and R 8 and R 9 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 14 carbon atoms and optionally having a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, a dialkylamino group having 2 to 12 carbon atoms, a halogen atom, and a nitro group, or R 8 and R 9 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; provided that two or three of the eight groups R 3 to R 10 are each a hydrogen atom, and, in a case where two of the eight groups are each a hydrogen atom, then three to six of the remaining groups are each an alkyl group having 1 to 12 carbon atoms, and, in a case where three of the eight groups are each a hydrogen atom, then four or five of the remaining groups are each an alkyl group having 1 to 12 carbon atoms.

  本发明涉及一种由通式（A）表示的化合物，包括该化合物的生成碱基和/或基团产生剂等。在该式中，四个R1分别独立表示氢原子或氟原子；四个R2分别独立表示氟原子或三氟甲基基团；R3、R6、R7和R10分别独立表示氢原子或具有1至12个碳原子的烷基基团；R4和R5分别独立表示氢原子或具有1至12个碳原子的烷基基团，或者R4和R5相互连接表示具有2至4个碳原子的亚烷基基团；R8和R9分别独立表示氢原子、具有1至12个碳原子的烷基基团或具有6至14个碳原子且可选地具有选自包括具有1至6个碳原子的烷基基团、具有1至6个碳原子的烷氧基团、具有1至6个碳原子的烷硫基团、具有2至12个碳原子的二烷基氨基团、卤素原子和硝基基团的取代基的芳基团，或者R8和R9相互连接表示具有2至4个碳原子的亚烷基基团；前提是八个基团R3至R10中的两个或三个分别是氢原子，并且在其中两个基团分别是氢原子的情况下，其余基团中的三到六个分别是具有1至12个碳原子的烷基基团，而在其中三个基团分别是氢原子的情况下，其余基团中的四个或五个分别是具有1至12个碳原子的烷基基团。
• BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20160122292A1

  公开（公告）日：2016-05-05

  It is a subject of the present invention to provide a base generator which has high solubility to general-purpose organic solvents, can dissolve directly into a base-reactive compound, such as an epoxy-based compound, further is provided with both performance of high heat resistance and low nucleophilicity, and generates a strong base, a base-reactive composition comprising the base generator and a base-reactive compound, as well as a method for generating a base, etc. The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc. (wherein R 1 to R 5 each independently represent a hydrogen atom; an alkyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R 6 represents a hydrogen atom; an alkyl group which may have a substituent; an alkenyl group; an alkynyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R 7 represents a hydrogen atom; an alkyl group which may have an amino group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, and Z − represents an anion derived from a carboxylic acid having a specific structure.)

  本发明的一个目的是提供一种基发生剂，其对通用有机溶剂具有高溶解度，可以直接溶解为一种碱反应性化合物，例如基于环氧树脂的化合物，进一步具有高耐热性和低亲核性的性能，并生成强碱，包括基发生剂和碱反应性化合物的碱反应性组合物，以及生成碱的方法等。本发明涉及一种由通式（A）表示的化合物，包括该化合物的基发生剂，包括基发生剂和碱反应性化合物的碱反应性组合物，以及生成碱的方法等。（其中R1至R5各自独立地表示氢原子；烷基基团；可能具有取代基的芳基团；或可能具有取代基的芳基烷基基团，R6表示氢原子；可能具有取代基的烷基基团；烯基基团；炔基基团；可能具有取代基的芳基团；或可能具有取代基的芳基烷基基团，R7表示氢原子；可能具有氨基的烷基基团；可能具有取代基的芳基团；或可能具有取代基的芳基烷基基团，Z-表示从具有特定结构的羧酸衍生的阴离子。）
• Ultra-violet filtration with certain aminosalicylic acid esters
  申请人：Synergistics, Inc.

  公开号：US04036951A1

  公开（公告）日：1977-07-19

  Alkyl esters of aminosalicylic acid, said alkyl group having from 1 to 18 carbon atoms in chain length; alkenyl esters of aminosalicylic acid, said alkenyl group selected from the group consisting of vinyl, allyl, undecenyl, oleyl and linolenyl groups, and cyclic esters of aminosalicylic acid, said cyclic group being the cyclohexyl, phenyl and menthyl groups, having ultra-violet screening properties to absorb light rays within the wave-length range of 2950 A. to 3200 A. while transmitting the light rays beyond the 3200 A. range to permit the desirable tanning of the skin without solar burn. The respective esters of aminosalicylic acid are prepared by the reduction of the appropriate nitro-salicylic acid ester with Raney nickel and hydrogen in the presence of ethyl acetate. The respective esters are obtained as oils or solid crystalline substances and are soluble in alcohols, chloroform, acetone and benzene but insoluble in water. The ultra-violet absorption spectra for the respective compounds are described. Compositions comprising the above compounds together with the method for their preparation and the method for the use to achieve an ultraviolet filtering action on the skin of humans and animals are described.

  含有1到18个碳原子链长度的烷基氨基水杨酸酯；含有乙烯基、丙烯基、十一烯基、油酸基和亚麻酸基的烯基氨基水杨酸酯；以及环状氨基水杨酸酯，其环状基为环己基、苯基和薄荷基，具有吸收2950 A到3200 A波长范围内的光线的紫外线屏障性能，同时透过3200 A范围外的光线，使皮肤得到理想的晒黑效果而不会晒伤。通过在乙酸乙酯存在下使用Raney镍和氢气还原适当的硝基水杨酸酯制备所述氨基水杨酸酯。所述氨基水杨酸酯以油或固体结晶物的形式获得，并且可溶于醇类、氯仿、丙酮和苯，但不溶于水。描述了各种化合物的紫外线吸收光谱。还描述了包含上述化合物的组合物、其制备方法以及实现对人类和动物皮肤的紫外线过滤作用的方法。
• GAS-BARRIER RESIN COMPOSITION AND USE THEREOF
  申请人：Showa Denko K.K.

  公开号：EP3660105A1

  公开（公告）日：2020-06-03

  The present invention relates to a gas-barrier resin composition, including: a gas-barrier resin (A) having an oxygen permeability coefficient of 1.0×10-14 (cm3·cm/cm2·s·Pa) or less; and a copolymer (B) containing monomer structural units represented by the formula (1), the formula (2), and the formula (3): where: R1 represents a hydrogen atom or a methyl group; R2 represents a hydrocarbon group having 1 to 20 carbon atoms that may be substituted with a halogen atom, a hydroxy group, an alkoxy group, or an amino group; l, m, and n represent numerical values representing molar proportions of the respective monomer structural units, and n may represent 0; and p represents an integer of from 1 to 4, wherein a ratio of a mass of the copolymer (B) to a total mass of the gas-barrier resin (A) and the copolymer (B) is from 1 mass% to 40 mass%. Preferred as the gas-barrier resin (A) are a vinyl alcohol-based resin (A1), a polyamide-based resin (A2), and a polyester-based resin (A3). The present invention can provide a resin composition ameliorated in low flexibility and low impact resistance, which are drawbacks of a gas-barrier resin, without impairing excellent gas barrier properties of the gas-barrier resin.

  本发明涉及一种气体阻隔树脂组合物，包括：氧气渗透系数为 1.0×10-14 (cm3-cm/cm2-s-Pa) 或以下的气体阻隔树脂 (A)；以及含有式 (1)、式 (2) 和式 (3) 所代表的单体结构单元的共聚物 (B)： 其中R1 代表氢原子或甲基； R2 代表具有 1 至 20 个碳原子的烃基，可被卤素原子、羟基、烷氧基或氨基取代；l、m 和 n 代表数值，代表各自单体结构单元的摩尔比例，n 可以代表 0；p 代表 1 至 4 的整数，其中共聚物（B）的质量与气体阻隔树脂（A）和共聚物（B）的总质量之比为 1 质量％至 40 质量％。作为气体屏障树脂（A），首选乙烯醇基树脂（A1）、聚酰胺基树脂（A2）和聚酯基树脂（A3）。本发明可提供一种树脂组合物，在不影响气体阻隔性树脂的优异气体阻隔性的前提下，改善气体阻隔性树脂的缺点--低柔韧性和低抗冲击性。