A noble alicyclic unsaturated compound represented by the general formula (1): wherein at least one of R
1
and R
2
is a fluorine atom or a fluorinated alkyl group; a polymer formed by the polymerization of a polymer precursor comprising the alicyclic compound. The polymer is useful, in the lithography using a light having a wavelength of 190 nm or less, as a chemically amplified resist which exhibits excellent transparency with respect to the light for use in exposure and also is excellent in the adhesion to a substrate and the resistance to dry etching.
通式(1)代表的高尚脂环族不饱和化合物: 其中至少一个 R
1
和 R
2
是
氟原子或
氟化烷基; 由包含该脂环族化合物的聚合物前体聚合而成的聚合物。在使用波长为 190 nm 或以下的光进行光刻时,该聚合物可用作
化学放大抗蚀剂,它对用于曝光的光具有极佳的透明性,并且对基底具有极佳的附着力和耐干蚀刻性。