NOVEL POLYETHER COMPOUND CONTAINING ACID GROUP AND UNSATURATED GROUP, PROCESS FOR PRODUCING THE SAME, AND RESIN COMPOSITION
申请人:DAICEL CHEMICAL INDUSTRIES, Ltd.
公开号:EP1496077A1
公开(公告)日:2005-01-12
The present invention relates to a cyclohexyl ring-containing polyether compound which has, in a molecule, two or more polymeri zable unsaturated groups typified by (meth)acryloyloxy groups and one or more acid groups typified by carboxyl groups. The polyether compound provides: a resin composition which has high developability with a dilute alkali and sensitivity and is suitable for use in image formation, e.g., for forming a solder resist or pigment-dispersed resist for a printed circuit board, etc.; and a cured article obtained by curing the resin composition.
本发明涉及一种含环己基环的聚醚化合物,其分子中含有两个或多个可聚合的不饱和基团(以(甲基)丙烯酰氧基为典型)和一个或多个酸基团(以羧基为典型)。这种聚醚化合物可提供:一种树脂组合物,它在稀碱中具有高显影性和高灵敏度,适用于图像形成,例如用于形成印刷电路板等的阻焊或颜料分散阻焊;以及一种通过固化该树脂组合物而获得的固化物。