methacrylic acid 5-(2-trifluoromethyl-2-hydroxyl-1,1,1-trifluoropropyl)-norbornanyl ester

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: methacrylic acid 5-(2-trifluoromethyl-2-hydroxyl-1,1,1-trifluoropropyl)-norbornanyl ester
• 英文别名: 5-[3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propyl]-norbornan-2-yl 2-methacrylate；Methacrylic acid 5-[2-hydroxy-2-(trifluoromethyl)-3,3,3-trifluoropropyl]norbornane-2-yl ester；[5-[3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propyl]-2-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate
• 化学式: C₁₅H₁₈F₆O₃
• 分子量: 360.297
• InChiKey: ILUNASHCBGOSKM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.3
• 重原子数：
  24
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.8
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  9

反应信息

• 作为产物：
  描述：

  甲基丙烯酸 、 六氟异丙醇甲基降冰片烯 在 甲烷磺酸 作用下， 反应 8.0h， 生成 methacrylic acid 5-(2-trifluoromethyl-2-hydroxyl-1,1,1-trifluoropropyl)-norbornanyl ester 、 methacrylic acid 6-(2-trifluoromethyl-2-hydroxyl-1,1,1-trifluoropropyl)-norbornanyl ester 、 5,5-bis(trifluoromethyl)-4-oxatricyclo[5.2.1.0(3,8)]decane
  参考文献：
  名称：

  Process for Producing Alpha-Substituted Norbornanyl Acrylates

  摘要：

  本发明公开了一种在工业规模下高效制备α-取代诺博烯基丙烯酸酯的方法，同时抑制了由分子内环化、过量添加丙烯酸等产生的副产物的形成。所述α-取代诺博烯基丙烯酸酯可用作诺博烯抗蚀单体。在所公开的方法中，α-取代丙烯酸直接与取代诺博烯在甲烷磺酸和樟脑磺酸中至少选择一种酸催化剂的存在下反应。在该反应中，可以抑制由分子内环化、酸的过量添加到反应产物等产生的副产物的形成。

  公开号：

  US20110137073A1

文献信息

• Process for producing alpha-substituted acrylic norbornanyyl compounds
  申请人：Komata Takeo

  公开号：US20050131248A1

  公开（公告）日：2005-06-16

  A process for producing an α-substituted acrylic norbornanyl compound represented by the formula [3] includes reacting an α-substituted acrylic acid anhydride represented by the formula [1] with a substituted norbornanyl alcohol represented by the formula [2]. wherein R 1 represents a hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, or perfluoroethyl group, and wherein one of R 2 , R 3 and R 4 is a CF 3 C(CF 3 )(OH)CH 2 — group, and each of the other two of R 2 , R 3 and R 4 is a hydrogen.

  生产α-取代丙烯基莽环烷基化合物的过程如下：将式[1]表示的α-取代丙烯酸酐与式[2]表示的取代莽环烷基醇反应。 其中，R1代表氢原子、甲基、乙基、正丙基、异丙基、正丁基、仲丁基、叔丁基、氟甲基、二氟甲基、三氟甲基或全氟乙基；R2、R3和R4中的一个是CF3C(CF3)(OH)CH2—基团，另外两个是氢原子。
• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND
  申请人：ASANO Yuusuke

  公开号：US20120237875A1

  公开（公告）日：2012-09-20

  A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R 1 represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O— # or —SO 2 —O— ## , wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” indicates a bonding hand bonded to R 1 . -A-R 1 (x)

  一种辐射敏感树脂组合物包括第一聚合物，其中包括酸敏感基团，酸发生剂用于在辐射照射后生成酸，以及第二聚合物，其中包括氟原子和由通用公式（x）表示的功能基团。第二聚合物的氟原子含量高于第一聚合物的氟原子含量。R1代表碱性易裂解基团。A代表氧原子，-NR′—，-CO—O—#或-SO2—O—##，其中A代表的氧原子不是直接与芳香环、酰基或亚砜基结合的氧原子，R′代表氢原子或碱性易裂解基团，“#”和“##”表示与R1结合的键合手。-A-R1(x)
• Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt
  申请人：Nagamori Masashi

  公开号：US20110112306A1

  公开（公告）日：2011-05-12

  A fluorine-containing sulfonic acid salt or a compound having a fluorine-containing sulfonic acid group, either of which having a structure represented by the following general formula (1), is provided. Such a salt or compound can act as a suitable photo-acid generator, and can form a resist pattern having excellent sensitivity, resolution and mask-dependence. [In general formula (1), R represents a substituted or unsubstituted linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms, a substituted or unsubstituted monovalent hydrocarbon group having 3 to 30 carbon atoms and a cyclic or a partially cyclic structure, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted monovalent heterocyclic organic group having 4 to 30 carbon atoms.]

  提供一种含氟磺酸盐或含有含氟磺酸基团的化合物，其结构由下列通式（1）表示。这种盐或化合物可以作为合适的光酸发生剂，并且可以形成具有优异敏感度、分辨率和掩模依赖性的光阻图案。[在通式（1）中，R代表取代或未取代的具有1至30个碳原子的线性或支链一价碳氢基团，取代或未取代的具有3至30个碳原子且具有环状或部分环状结构的一价碳氢基团，取代或未取代的具有6至30个碳原子的芳基团，或取代或未取代的具有4至30个碳原子的一价杂环有机基团。]
• RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
  申请人：JSR CORPORATION

  公开号：US20210364918A1

  公开（公告）日：2021-11-25

  A radiation-sensitive resin composition contains a resin including a structural unit having a phenolic hydroxyl group; and a compound represented by formula (1). In the formula (1), Ar is a substituted or unsubstituted aromatic ring having 6 to 20 carbon atoms; n is an integer of 2 to 4; Z + is a monovalent onium cation; a plurality of Ys are each independently a polar group; and at least one of the plurality of Ys is an —OH group or an —SH group bonded to a carbon atom adjacent to a carbon atom to which a COO − group is bonded.

  一种辐射敏感的树脂组合物包含一种树脂，其中包括具有酚羟基的结构单元;以及由公式（1）表示的化合物。 在公式（1）中，Ar是具有6到20个碳原子的取代或未取代的芳香环; n是2到4的整数; Z +是一价阳离子; 多个Y分别是极性基团; 并且多个Y中至少有一个是与COO-基团相邻的碳原子上结合的-OH基团或-SH基团。
• RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND METHOD OF CONTROLLING ACID DIFFUSION
  申请人：JSR CORPORATION

  公开号：US20200393755A1

  公开（公告）日：2020-12-17

  The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar 1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar 1 ; and R G represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like.

  这种辐射敏感的树脂组合物包含：具有包含酸敏感基团的结构单元的聚合物；以及由公式（1）表示的化合物。在公式（1）中，Ar1代表从具有6到30个碳原子的芳香族化合物的芳香环中去除（m + n + 2）个氢原子得到的基团; -OH和-COO-在Ar1的同一苯环上的邻位上彼此结合; RG代表由公式（V-1）表示的基团，由公式（V-2）表示的基团，包括内酯结构的基团，包括环状碳酸酯结构的基团，包括磺酸酯结构的基团，包括酮基的羰基基团，包括硫代碳酸酯基团或包括由公式（V-3）表示的基团的基团，或类似的基团。