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2-庚基-1-十一烷醇 | 5333-44-8

中文名称
2-庚基-1-十一烷醇
中文别名
2-庚基十一醇;庚基十一醇
英文名称
2-heptylundecyl alcohol
英文别名
2-heptyl-1-undecanol;2-heptyl undecanol;2-nonyl-1-nonanol;8-hydroxymethyl-heptadecane;8-Hydroxymethyl-heptadecan;2-heptylundecanol;1-Undecanol, 2-heptyl-;2-heptylundecan-1-ol
2-庚基-1-十一烷醇化学式
CAS
5333-44-8
化学式
C18H38O
mdl
——
分子量
270.499
InChiKey
YEGNTQBFSQBGJT-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    198 °C
  • 密度:
    0.8446 g/cm3(Temp: 15 °C)
  • LogP:
    7.815 (est)

计算性质

  • 辛醇/水分配系数(LogP):
    8.1
  • 重原子数:
    19
  • 可旋转键数:
    15
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    20.2
  • 氢给体数:
    1
  • 氢受体数:
    1

安全信息

  • 海关编码:
    2905199090

SDS

SDS:d93ca767885410de49af86a0e3bcc5a3
查看

制备方法与用途

具有无色无味且对皮肤低刺激性的特征,它主要用于化妆品中增加对皮肤的渗透性,提升滋润效果,使其光泽而不油腻。作为润滑、柔软及保湿的油性成分,这种物质是制取高档膏霜、增白润肤膏和透明卸妆胶的主要乳化剂。此外,它还广泛应用于纺织工业中的洗涤、丝光处理和染色等工序,能够提高加工速度和产品质量;同时,也可用作纤维油剂、印刷油墨助剂以及高级润滑油添加剂。

反应信息

  • 作为反应物:
    参考文献:
    名称:
    Phosphoric triesters and external compositions containing the same
    摘要:
    本发明公开了由式(1)表示的磷酸三酯,其中R1代表C12-C24烷基或烯基,R2代表C6-C24烷基、烯基或芳基,R3代表C1-C6烷基、C2-C6烯基或芳基;含有磷酸三酯的外部组合物;以及制备不对称磷酸三酯的方法。本发明的组合物与皮肤具有良好的相容性,在使用过程中具有良好的感觉,并具有较高的安全性。
    公开号:
    US06299887B1
  • 作为产物:
    描述:
    2-庚基-2-十一碳烯醛氢气 作用下, 125.0 ℃ 、2.07 MPa 条件下, 反应 24.0h, 生成 2-庚基-1-十一烷醇
    参考文献:
    名称:
    [EN] GUERBET ALCOHOLS AND METHODS FOR PREPARING AND USING SAME
    [FR] ALCOOLS DE GUERBET ET LEURS PROCÉDÉS DE PRÉPARATION ET D'UTILISATION
    摘要:
    本发明涉及Guerbet醇前体和Guerbet醇,以及合成它们的过程。
    公开号:
    WO2013142206A1
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文献信息

  • LOW VISCOSITY LOW VOLATILITY LUBRICATING OIL BASE STOCKS AND METHODS OF USE THEREOF
    申请人:ExxonMobil Research and Engineering Company
    公开号:US20170183595A1
    公开(公告)日:2017-06-29
    A lubricating oil base stock including one or more monoesters represented by the formula (I), (II), (III) and (IV) as defined herein. The lubricating oil base stock has a high temperature high shear (HTHS) viscosity of less than about 1.7 cP as determined by ASTM D4683, and a Noack volatility from about 15 to about 90 percent as determined by ASTM D5800. A lubricating oil containing the lubricating oil base stock including one or more monoesters represented by the formula (I), (II), (III) and (IV) as defined herein. A method for improving one or more of thermal and oxidative stability, solubility and dispersancy of polar additives, deposit control and traction control in a lubricating oil by using as the lubricating oil a formulated oil containing the lubricating oil base stock including one or more monoesters represented by the formula (I), (II), (III) and (IV) as defined herein.
    一种润滑油基础油,包括根据本文所定义的公式(I)、(II)、(III)和(IV)表示的一个或多个单酯。该润滑油基础油的高温高剪切(HTHS)粘度小于约1.7厘泊,由ASTM D4683确定,挥发性从约15%到约90%,由ASTM D5800确定。一种含有根据本文所定义的公式(I)、(II)、(III)和(IV)表示的一个或多个单酯的润滑油基础油的润滑油。一种通过使用包含根据本文所定义的公式(I)、(II)、(III)和(IV)表示的一个或多个单酯的润滑油基础油的配制油来改善润滑油中的热稳定性、氧化稳定性、溶解性和分散性、沉积控制和牵引控制的方法。
  • NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS
    申请人:SHIN-ETSU CHEMICAL CO., LTD.
    公开号:US20190169211A1
    公开(公告)日:2019-06-06
    The present invention has been made in view of the circumstances herein. An object of the present invention is to provide: a tetracarboxylic dianhydride which can lead to a polyimide usable as a base resin of a photosensitive resin composition capable of forming a fine pattern and obtaining high resolution without impairing excellent characteristics such as mechanical strength and adhesiveness; a polyimide resin obtained by using the tetracarboxylic dianhydride; and a method for producing the polyimide resin. The tetracarboxylic dianhydride is shown by the following general formula (1).
    本发明是基于本文中的情况而作出的。本发明的目的是提供:一种四羧酸二酐,可导致聚酰亚胺,作为感光树脂组合物的基树脂,能够形成细微图案并获得高分辨率,同时不损害优异的特性,如机械强度和粘附性;通过使用该四羧酸二酐获得的聚酰亚胺树脂;以及生产该聚酰亚胺树脂的方法。该四羧酸二酐由以下通用式(1)所示。
  • [EN] METHOD OF PREPARING HYDROXYALKYLCARBOXYLIC ACID ESTERS<br/>[FR] PROCÉDÉ DE PRÉPARATION D'ESTERS D'ACIDE HYDROXYALKYLCARBOXYLIQUE
    申请人:BASF SE
    公开号:WO2018069372A1
    公开(公告)日:2018-04-19
    The present invention relates to a method of preparing an ester by reacting a carboxyl acid with a (C1-C36)alcohol in the presence of a catalyst. The method is particularly suitable for the reaction of hydroxyalkylcarboxylic acids and fatty alcohols.
    本发明涉及一种通过在催化剂存在下将羧酸与(C1-C36)醇反应制备酯的方法。该方法特别适用于羟基烷基羧酸和脂肪醇的反应。
  • NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
    申请人:International Business Machines Corporation
    公开号:US20210317270A1
    公开(公告)日:2021-10-14
    Provided is a compound that can be used as a base resin for a photosensitive resin composition. The photosensitive resin can form a fine pattern and can achieve high resolution without impairing mechanical strength and solubility. The compound is represented by the general formula (1): wherein Z represents a linear, branched or cyclic divalent hydrocarbon group having 2 to 30 carbon atoms; X 1 to X 3 represent any of —CO 2 —, —CONR X1 —, —O—, —NR X1 —, —S—, —SO 2 —, —SO 3 — and —SO 2 NR X1 — and may be the same as or different from each other, provided that R X1 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 30 carbon atoms; Ar represents a divalent aromatic group having 2 to 30 carbon atoms; L 1 and L 2 independently represent a divalent hydrocarbon group having 1 to 30 carbon atoms; and x and y are each independently 0 or 1.
    提供的是一种可以用作光敏树脂组合物的基树脂的化合物。这种光敏树脂可以形成精细图案,并且可以在不影响机械强度和溶解性的情况下实现高分辨率。该化合物由通式(1)表示:其中Z代表具有2到30个碳原子的线性、支链或环状二价碳氢基团;X1到X3代表任何一种—CO2—、—CONRX1—、—O—、—NRX1—、—S—、—SO2—、—SO3—和—SO2NRX1—中的一种,并且它们可以相同也可以不同,只要RX1是氢原子或具有1到30个碳原子的一价碳氢基团;Ar代表具有2到30个碳原子的二价芳香基团;L1和L2分别代表具有1到30个碳原子的二价碳氢基团;x和y分别独立地为0或1。
  • TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM
    申请人:SHIN-ETSU CHEMICAL CO., LTD.
    公开号:US20180120702A1
    公开(公告)日:2018-05-03
    The present invention provides a tetracarboxylic acid diester compound represented by the following general formula (1), wherein, X 1 represents a tetravalent organic group, and R 1 represents a group represented by the following general formula (2), wherein, the dotted line represents a bonding, Y 1 represents an organic group with a valency of k+1, Rs represents a group containing at least one silicon atom, “k” represents 1, 2 or 3, and “n” represents 0 or 1. There can be provided a tetracarboxylic acid diester compound which can lead a polymer of a polyimide precursor capable of using a base resin of a negative photosensitive resin composition which is capable of forming a fine pattern and giving high resolution, a polymer of a polyimide precursor obtained by using the tetracarboxylic acid diester compound and a method for producing the same.
    本发明提供了一种四羧酸二酯化合物,其表示为以下通式(1):其中,X1表示四价有机基团,R1表示以下通式(2)所表示的基团:其中,虚线表示键合,Y1表示具有k+1价的有机基团,Rs表示含有至少一个硅原子的基团,“k”表示1、2或3,“n”表示0或1。可以提供一种四羧酸二酯化合物,该化合物能够引导聚合物的形成,该聚合物是由使用负光敏树脂组合物的基树脂制成的,该组合物能够形成细微图案并具有高分辨率,使用四羧酸二酯化合物制得的聚酰亚胺前体聚合物以及其制备方法。
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