申请人:Fujifilm Corporation
公开号:EP1811341A1
公开(公告)日:2007-07-25
A positive photosensitive composition includes: a resin (A) whose dissolution rate in an alkaline developing solution increases by the action of an acid, the resin (A) containing an acid decomposable repeating unit represented by a general formula (I) and an acid nondecomposable repeating unit represented by a general formula (II); and a compound (B) capable of generating an acid upon irradiation with one of active rays and radiations:
wherein Xa1 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A1 represents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xa2 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A2 represents one of a single bond and a divalent connecting group, and ACG represents an acid nonleaving hydrocarbon group.
一种正感光组合物包括:一种树脂(A),其在碱性显影溶液中的溶解速率在酸的作用下会增加,该树脂(A)含有通式(I)表示的可分解酸的重复单元和通式(II)表示的不可分解酸的重复单元;以及一种化合物(B),该化合物能够在活性射线和辐射中的一种照射下产生酸:
其中 Xa1 代表氢原子、烷基、氰基和卤素原子中的一种,A1 代表单键和二价连接基团中的一种,ALG 代表酸性离去烃基,Xa2 代表氢原子、烷基、氰基和卤素原子中的一种,A2 代表单键和二价连接基团中的一种,ACG 代表酸性非离去烃基。