3-(2-hydroxy-1-naphthalenyl)-acrylic acid | 93970-75-3

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 肉桂酸及其衍生物
• 英文名称: 3-(2-hydroxy-1-naphthalenyl)-acrylic acid
• 英文别名: 3-(2-hydroxy-[1]naphthyl)-acrylic acid；β-(2-Oxy-naphthyl-(1))-acrylsaeure；3-(2-Hydroxy-[1]naphthyl)-acrylsaeure；3-(2-Hydroxy-naphthalen-1-yl)-acrylic acid；3-(2-hydroxynaphthalen-1-yl)prop-2-enoic acid
• CAS: 93970-75-3
• 化学式: C₁₃H₁₀O₃
• 分子量: 214.221
• InChiKey: UJKNDDUIEZLBAG-UHFFFAOYSA-N

物化性质

• 熔点：
  165 °C (decomp)
• 沸点：
  450.3±20.0 °C(Predicted)
• 密度：
  1.359±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  16
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  57.5
• 氢给体数：
  2
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  3-(2-hydroxy-1-naphthalenyl)-acrylic acid 、 乙酸酐 在 硝酸 作用下， 生成 2-nitro-3H-benzo[f]chromen-3-one
  参考文献：
  名称：

  Dey et al., Journal of the Indian Chemical Society, 1932, vol. 9, p. 281,288

  摘要：

  DOI：
• 作为产物：
  描述：

  3H-萘并[2,1-b]吡喃-3-酮 在 氢氧化钾 、 水 作用下， 生成 3-(2-hydroxy-1-naphthalenyl)-acrylic acid
  参考文献：
  名称：

  Kauffmann, Chemische Berichte, 1883, vol. 16, p. 685

  摘要：

  DOI：

文献信息

• Base generator
  申请人：Katayama Mami

  公开号：US08476444B2

  公开（公告）日：2013-07-02

  A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.

  这是一种光敏树脂组合物，具有高分辨率、低成本和可用于各种聚合物前体结构的优点，每种聚合物前体通过碱性物质反应或在碱性物质存在下加热反应成为最终产品。光敏树脂组合物包括一种具有特定结构的碱发生剂，通过电磁辐射和加热产生碱性物质，以及一种聚合物前体，通过碱发生剂和碱性物质反应或在碱性物质存在下加热反应成为最终产品。
• Molecular Fingerprints With Enhanced Identifying Capability, Method for Preparing Same and Use Thereof
  申请人：Bay-Oudh Sami

  公开号：US20090123411A1

  公开（公告）日：2009-05-14

  The invention concerns a method for preparing a molecular fingerprint comprising sites for identifying at least one target molecule, said fingerprint being obtained from at least one master molecule of polymeric type, called master polymer. The invention is characterized in that said master polymer is different from the target molecule(s), and is capable of being eliminated by degradation and/or washing, and that at least 5% in number of monomer units constituting the master polymer are involved in the formation of the sites for identifying the target molecule(s).

  本发明涉及一种制备分子指纹的方法，该指纹包括用于识别至少一种目标分子的位点，该指纹是从至少一种聚合型母体分子，称为母体聚合物中获得的。本发明的特点在于，所述母体聚合物与目标分子不同，并且能够通过降解和/或清洗被消除，而且构成用于识别目标分子的位点的单体单位中至少有5％参与其中。
• BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Katayama Mami

  公开号：US20110086311A1

  公开（公告）日：2011-04-14

  A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.

  一种光敏树脂组合物，具有分辨率优良、成本低廉和可用于一系列聚合物前体结构的特点，其中每种聚合物前体都可以通过碱性物质或在碱性物质的存在下加热反应成为最终产物。该光敏树脂组合物包括一种具有特定结构并通过电磁辐射和加热产生碱性物质的基发生剂，以及一种聚合物前体，该聚合物前体通过基发生剂和碱性物质或在碱性物质的存在下加热反应成为最终产物。
• PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION
  申请人：DAI NIPPON PRINTING CO., LTD.

  公开号：US20130309607A1

  公开（公告）日：2013-11-21

  A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.
• US7910383B2
  申请人：——

  公开号：US7910383B2

  公开（公告）日：2011-03-22