1,1-Bis(p-tert-butylphenyl)ethanol | 159838-30-9

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 1,1-Bis(p-tert-butylphenyl)ethanol
• 英文别名: 1,1-di(p-t-butylphenyl)ethanol；1,1-bis[4-(tert-butyl)phenyl]ethanol；1,1-Bis(4-tert-butylphenyl)ethanol
• CAS: 159838-30-9
• 化学式: C₂₂H₃₀O
• 分子量: 310.48
• InChiKey: MPGGPYXRZCPFNG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.3
• 重原子数：
  23
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.45
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  1,1-Bis(p-tert-butylphenyl)ethanol 在 吡啶 、 sodium hydroxide 、 sodium tetrahydroborate 、 potassium hydrogensulfate 、 三氟化硼乙醚 、 双氧水 作用下， 生成 Toluene-4-sulfonic acid 2,2-bis-(4-tert-butyl-phenyl)-ethyl ester
  参考文献：
  名称：

  Substituent Effect Studies of Aryl-Assisted Solvolyses. I. The Acetolysis of 2,2-Bis(substituted phenyl)ethylp-Toluenesulfonates

  摘要：

  在90.10 °C下，2,2-双（取代苯基）乙基对甲苯磺酸酯的醇解反应中，取代基效应可以通过Yukawa–Tsuno（LArSR）关系进行准确描述，给出了ρ值为−4.44和r值为0.53。该系统中包含两个芳香基的取代基效应与包含单个芳香基的2-甲基-2-苯基丙基系统的相关性相当可比，这表明这两个系统的过渡态结构非常相似。根据这种反应的公认机制，结果可以合理地解释为涉及一个速率决定的芳基辅助过渡态，其中两个β-芳基中的仅一个芳基参与反应。

  DOI：

  10.1246/bcsj.66.3015
• 作为产物：
  描述：

  4-叔丁基苯基溴化镁 、 乙酸乙酯 以 四氢呋喃 为溶剂， 以67%的产率得到1,1-Bis(p-tert-butylphenyl)ethanol
  参考文献：
  名称：

  轮烷和聚轮烷的双官能团

  摘要：

  几个大体积的单体为聚轮烷，其中包括α，α，ω，ω-tetraarylmethyl双酚9，二乙基二（PT丁基苄基）丙二酸二乙酯（10），和1,1-二（PT丁基苯基）乙烯（12），合成。所有的中间体（8、11）和最终产物（9、10和12）都是新化合物。

  DOI：

  10.1016/s0040-4039(00)78429-2

文献信息

• Practical Iron-Catalyzed Allylations of Aryl Grignard Reagents
  作者：Matthias Mayer、Waldemar M. Czaplik、Axel Jacobi von Wangelin

  DOI：10.1002/adsc.201000228

  日期：2010.9.10

  reaction between aryl halides and allyl electrophiles has been developed. The underlying domino process exhibits high versatility with respect to the allylic leaving group (acetate, tosylate, diethyl phosphate, methyl carbonate, trimethylsilanolate, methanethiolate, chloride, bromide) and high economic and environmental sustainability with respect to the catalyst system (0.2–5 mol% tris(acetylacetonato)iron(III)

  在芳基卤化物和烯丙基亲电试剂之间已开发出一种操作简单的铁催化的还原交叉偶联反应。基本的多米诺法工艺相对于烯丙基离去基团（乙酸根，甲苯磺酸根，磷酸二乙酯，碳酸甲酯，三甲基硅烷醇根，甲硫醇盐，氯化物，溴化物）表现出高通用性，并且相对于催化剂体系（0.2-5 mol而言）具有高度的经济和环境可持续性％三（乙酰丙酮基）铁（III），无配体）和反应条件（四氢呋喃，0°C，45分钟）。
• Scandium(III) Trifluoromethanesulfonate Catalyzed Selective Reactions of Donor-Acceptor Cyclopropanes with 1,1-Diphenylethanols: An Approach to Polysubstituted Olefins
  作者：Xiaoyan Zhu、Gang Hong、Chen Hu、Shengying Wu、Limin Wang

  DOI：10.1002/ejoc.201700221

  日期：2017.3.17

  An unexpected synthetic approach to polysubstituted olefins through the scandium(III) trifluoromethanesulfonate catalyzed ring-opening reaction of donor–acceptor cyclopropanes with 1,1-diphenylethanols was developed. The reactions, which are experimentally easy to handle, feature tolerance of various functional groups and mild reaction conditions. On the basis of experimental evidence, a plausible

  通过三氟甲磺酸钪 (III) 催化供体-受体环丙烷与 1,1-二苯基乙醇的开环反应，开发了一种出人意料的多取代烯烃合成方法。该反应在实验上易于处理，具有各种官能团的耐受性和温和的反应条件。在实验证据的基础上，还提出了一个合理的机制。
• CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND
  申请人：OSAKA UNIVERSITY

  公开号：EP3133444A1

  公开（公告）日：2017-02-22

  A chemically amplified resist material of the present invention is used in a process including: patternwise exposing a predetermined region of resist material film to ionizing radiation or nonionizing radiation; floodwise exposing the resist material film patternwise exposed to nonionizing radiation; baking the resist material film floodwise exposed; and developing resist material film to form a resist pattern, the chemically amplified resist material containing: (1) base component; and (2) a component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure, wherein the component (2) contains, among (a) a radiation-sensitive acid-and-sensitizer generating agent, (b) a radiation-sensitive sensitizer generating agent, and (c) a radiation-sensitive acid generating agent: the components (a) and (b); the components (b) and (c); or all of the components (a) to (c), and wherein the component (b) contains a compound represented by formula (A).

  本发明的一种化学放大抗蚀剂材料用于一种工艺中，该工艺包括：将抗蚀剂材料薄膜的预定区域图案化暴露于电离辐射或非电离辐射中；将抗蚀剂材料薄膜图案化暴露于非电离辐射中；烘烤被图案化暴露的抗蚀剂材料薄膜；显影抗蚀剂材料薄膜以形成抗蚀剂图案，该化学放大抗蚀剂材料包含：(1)碱成分；和(2)能在曝光时生成辐射敏感敏化剂和酸的成分，其中成分(2)包含(a)辐射敏感酸和敏化剂生成剂，(b)辐射敏感敏化剂生成剂，和(c)辐射敏感酸生成剂：组分 (a) 和 (b)；组分 (b) 和 (c)；或组分 (a) 至 (c) 的全部，其中组分 (b) 包含式 (A) 所代表的化合物。
• Knots for Molecular Strings of Beads
  作者：Shu Liu、Sang-Hun Lee、Ya Xi Shen、Harry W. Gibson

  DOI：10.1021/jo00115a035

  日期：1995.5

  Three alpha,alpha,omega,omega-tetraaryl alpha,omega-diols 10 were synthesized via Grignard reactions of p-tert-butylbromobenzene with 1,10-bis(p-carbethoxyphenoxy)decane, dimethyl terephthalate, and dimethyl adipate (8). The diols 10 were converted to 1,10-bisp-[bis(p'-tert-butylphenyl)(p ''-hydroxyphenyl)-methyl]phenoxy}decane (11a), 1,4-bis[bis(p-tert-butylphenyl)(4'-amino-3',5'-dimethylphenyl)methyl]-benzene (11b), and 1,1,6,6-tetrakis(p-tert-butylphenyl)hexane (12) via carbocation chemistry. Alkylation of 11a with 2-(2-chloroethoxy)ethanol yielded 1,10-bisp-bis[p'-tert-butylphenyl) [p ''- [2-(2'-hydroxyethoxy)ethoxy]phenyl]methy}phenoxy}decane (13), containing two tetraarylmethyl groups. 1,4-Bis[bis(p-tert-butylphenyl)hydroxymethyl]benzene (10b) was reduced to 1,4-bis[bis(p-tert-butylphenylmethyl]benzene (14) by formic acid. The reaction of tetraarylhexanediol 10c with formic acid produced 1,1,6,6-tetrakis(p-tert-butylphenyl)-1,5-hexadiene (15). Via two S(N)2 reactions in a one-step route, diethyl bis(p-tert-butylbenzyl)malonate (18) was produced from diethyl malonate and p-tert-butylbenzyl bromide. A Grignard reaction of p-tert-butylbromobenzene with ethyl acetate generated 1,1-bis(p -tert-butylphenyl)ethanol (20) which was converted to 1, 1-bis(p-tert-butylphenyl)ethene (21) by water elimination. All the intermediates and final products are new compounds. While the bisphenol 11a, bisaniline 11b, diol 13, diester 17, and the alkanes 12 and 14 with two reactive protons are suitable difunctional knots for syntheses of rotaxanes and of polyrotaxanes via step growth polymerizations, the ethene 21 can be used for polyrotaxanes prepared by chain growth polymerizations.
• DENTAL PHOTOCURABLE COMPOSITION EXCELLENT IN OPERABILITY AND STORAGE STABILITY
  申请人：SHOFU INC.

  公开号：US20220401312A1

  公开（公告）日：2022-12-22

  [Problem] To provide a dental photocurable composition which has sufficient mechanical property and whose rheological property is not deactivated even after long-term storage. [Solution] The dental photocurable composition of the present disclosure comprises (A) polymerizable monomer, (B) photosensitizer, (D) photopolymerization accelerator and (E) filler, wherein, the dental photocurable composition comprises (D1) aliphatic tertiary amine compound represented by formula (1) as the (D) photopolymerization accelerator, and the dental photocurable composition comprises (E1) hydrophobized silica fine particle having an average diameter of primary particle of 1 to 40 nm as the (E) filler. (wherein R 1 represents a substituent consisting of three or more carbons having an electron-withdrawing group at α-carbon and/or ε-carbon of an amine starting from N, R 2 represents a substituent consisting of three or more carbons which may have an electron-withdrawing group, R 3 represents a substituent consisting of one or more carbons which may have an electron-withdrawing group, and α-carbon of N in the formula (1) is not an electron-withdrawing group.)