2-(1-Adamantyl)propan-2-yl 2-methylprop-2-enoate | 279218-76-7

• 物质功能分类: 有机原料 - 羧酸类化合物及衍生物 - 羧酸酯及其衍生物
• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-(1-Adamantyl)propan-2-yl 2-methylprop-2-enoate
• CAS: 279218-76-7
• 化学式: C₁₇H₂₆O₂
• 分子量: 262.4
• InChiKey: WLZMKZGLQVILBX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.6
• 重原子数：
  19
• 可旋转键数：
  4
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.82
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• ACID GENERATORS AND PHOTORESISTS COMPRISING SAME
  申请人：Rohm and Haas Electronic Materials, LLC

  公开号：US20160002199A1

  公开（公告）日：2016-01-07

  Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.

  提供了一些作为光刻胶组分特别有用的酸发生剂化合物。首选的酸发生剂包括含有共价连接的酸敏感基团的环状硫铵化合物。
• PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION
  申请人：Wada Kenji

  公开号：US20100233617A1

  公开（公告）日：2010-09-16

  A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X—B—R   (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

  一种感光组合物包括：（A）含有与下式（I）所表示的化合物对应的重复单元的树脂；该树脂能够在受到光敏射线或辐射照射后产生酸基团：Z-A-X—B—R   （I）其中Z代表一个能够在受到光敏射线或辐射照射后由阳离子离去而形成酸基团的基团；A代表一个烷基基团；X代表一个单键或含杂原子的二价连接基团；B代表一个单键、一个氧原子或—N（Rx）-；Rx代表一个氢原子或一个一价有机基团；R代表一个通过Y取代的一价有机基团；当B代表—N（Rx）-时，R和Rx可以结合在一起形成一个环；Y代表一个可聚合的基团。
• ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20160347709A1

  公开（公告）日：2016-12-01

  Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, acid generators are provided that comprise one or more hydrophilic moieties.

  提供了一些作为光刻胶组分特别有用的酸发生剂化合物。在一个首选方面，提供了包含一个或多个亲水性基团的酸发生剂。
• Process for preparation of tertiary alcohol esters
  申请人：——

  公开号：US20040015006A1

  公开（公告）日：2004-01-22

  The production process of the present invention comprises a step of allowing a carboxylic acid derivative represented by the formula (1): 1 wherein ring Z is a monocyclic or polycyclic non-aromatic or aromatic ring, and R 1 is a halogen atom or a group represented by the formula (2): —OR  (2) wherein R is a hydrogen atom or a hydrocarbon group, to react with an organometallic compound represented by the formula (3): R 2 —M  (3) wherein R 2 is a hydrocarbon group, and M is a metallic atom which may have a ligand, or the formula (4): —MgY  (4) wherein Y is a halogen atom, and a carboxylic acid halide represented by the formula (5): 2 wherein R 3 is a hydrocarbon group or a heterocyclic group, and X is a halogen atom, to yield the tertiary alcohol ester represented by the formula (6): 3 wherein Z, R 2 and R 3 have the same meanings as defined above. According to the present invention, a tertiary alcohol compound having a tertiary carbon combined with a ring group can be easily and efficiently produced from carboxylic acid derivative which is comparatively cheap and readily available.

  本发明的生产过程包括允许由式（1）表示的羧酸衍生物进行反应的步骤： 其中环Z是单环或多环非芳香或芳香环，R1是卤素原子或由式（2）表示的基团： 其中R是氢原子或碳氢基团，与由式（3）表示的有机金属化合物发生反应： 其中R2是碳氢基团，M是可能具有配体的金属原子，或由式（4）表示的： 其中Y是卤素原子，以及由式（5）表示的羧酸卤化物： 其中R3是碳氢基团或杂环基团，X是卤素原子，得到由式（6）表示的三级醇酯： 其中Z、R2和R3具有上述定义的相同含义。根据本发明，可以从相对便宜且易于获得的羧酸衍生物中轻松高效地生产具有三级碳与环基结合的三级醇化合物。
• PHOTOBASE GENERATORS AND PHOTORESIST COMPOSITIONS COMPRISING SAME
  申请人：Rohm and Haas Electronic Materials Korea Ltd.

  公开号：US20160334703A1

  公开（公告）日：2016-11-17

  New photobase generators suitable for use in photoresists are provided that correspond to Formula (I): X 1 —R 1 —O—C(═O)N(R 2 )R 3 (I) wherein X 1 is an optionally substituted aromatic group; R 1 is a linker; and R 2 and R 3 are the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of R 2 and R 3 is an optionally substituted branched alkyl group having 4 or more carbon atoms.

  提供了适用于光刻胶的新型光刻底物生成物，对应于式（I）：X1—R1—O—C(═O)N(R2)R3（I）其中X1是可选择取代的芳香族基团；R1是连接基团；R2和R3是相同或不同的可选择取代的线性、支链或环烷基基团或可选择取代的芳香族基团，其中R2和R3中至少有一个是具有4个或更多碳原子的可选择取代的支链烷基基团。