Photosensitive composition, image forming method, film forming method, resin, image, and film
申请人:FUJIFILM CORPORATION
公开号:US10407531B2
公开(公告)日:2019-09-10
Provided are a photosensitive composition containing a resin which includes a structural unit A represented by Formula (1) or (2) and a structural unit B represented by Formula (3), (4), or (5); and a radically polymerizable monomer, an image forming method, a film forming method, a resin, an image, and a film. R11, R21, R31, R41, and R51 represent H or a hydrocarbon group, R12 to R14 and R22 to R24 represent a hydrocarbon group, H, or an OH group, R42, R43, R52, and R53 represent H or a hydrocarbon group, L1 to L3 represent a single bond or a linking group, X1 represents —O— or —NR15—, X2 represent —O— or —NR25—, R15 and R25 represent H or a hydrocarbon group, and Cy1 represents a hydrocarbon group which may contain O and has a cyclic structure.
本发明提供了一种光敏组合物,该组合物含有一种树脂,其中包括由式(1)或(2)表示的结构单元 A 和由式(3)、(4)或(5)表示的结构单元 B;以及一种可辐射聚合的单体、一种图像形成方法、一种薄膜形成方法、一种树脂、一种图像和一种薄膜。R11、R21、R31、R41 和 R51 代表 H 或烃基,R12 至 R14 和 R22 至 R24 代表烃基、H 或 OH 基,R42、R43、R52 和 R53 代表 H 或烃基,L1 至 L3 代表单键或连接基团、X1 代表-O-或-NR15-,X2 代表-O-或-NR25-,R15 和 R25 代表 H 或烃基,Cy1 代表可能含有 O 并具有环状结构的烃基。