1-cyano-5-(2-chloroacetoxy)-3-oxatricyclo[4.2.1.04,8]nonan-2-one | 1185861-66-8

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 1-cyano-5-(2-chloroacetoxy)-3-oxatricyclo[4.2.1.04,8]nonan-2-one
• 英文别名: (6-Cyano-5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl) 2-chloroacetate
• CAS: 1185861-66-8
• 化学式: C₁₁H₁₀ClNO₄
• 分子量: 255.658
• InChiKey: DLNMRWGWCWIHRR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.1
• 重原子数：
  17
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.73
• 拓扑面积：
  76.4
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  甲基丙烯酸 、 1-cyano-5-(2-chloroacetoxy)-3-oxatricyclo[4.2.1.04,8]nonan-2-one 在 potassium carbonate 、 potassium iodide 作用下， 以 N-甲基吡咯烷酮 为溶剂， 生成 1-cyano-5-(2-methacryloyloxyacetoxy)-3-oxatricyclo[4.2.1.0^4,8]nonan-2-one
  参考文献：
  名称：

  Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound

  摘要：

  公开号：

  EP2105440B1
• 作为产物：
  描述：

  1-cyano-5-hydroxy-3-oxatricyclo[4.2.1.0(4,8)]nonan-2-one 、 氯乙酰氯 在 吡啶 作用下， 以 四氢呋喃 为溶剂， 生成 1-cyano-5-(2-chloroacetoxy)-3-oxatricyclo[4.2.1.04,8]nonan-2-one
  参考文献：
  名称：

  Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound

  摘要：

  公开号：

  EP2105440B1

文献信息

• MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION
  申请人：Koyama Hiroshi

  公开号：US20100297555A1

  公开（公告）日：2010-11-25

  Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by following Formula (1), wherein R a represents, e.g., a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; R 1 represents, e.g., a halogen atom or an alkyl or haloalkyl group having 1 to 6 carbon atoms; “A” represents an alkylene group having 1 to 6 carbon atoms, oxygen atom, sulfur atom, or nonbonding; “m” denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; “n” denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbon atoms. The monomer is useful typically as a monomer component typically for a highly functional polymer, because, when the monomer is applied typically to a resist resin, the resin is satisfactory stable and resistant typically to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.

  揭示了一种具有吸电子取代基和内酯骨架的单体，由以下式（1）表示，其中R代表，例如，氢原子或具有1至6个碳原子的烷基基团；R1代表，例如，卤素原子或具有1至6个碳原子的烷基或卤代烷基基团；“A”代表具有1至6个碳原子的烷基基团、氧原子、硫原子或非键合基团；“m”表示0至8的整数；Xs各自代表吸电子取代基；“n”表示1至9的整数；Y代表具有1至6个碳原子的二价有机基团。该单体通常用作高功能聚合物的单体组分，因为当该单体通常应用于抗蚀树脂时，树脂通常具有较高的稳定性和抗化学品性能，对有机溶剂具有较高的溶解性，并在水解后具有改善的水解性和/或水溶性。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE SAME, POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND
  申请人：YAMAGUCHI Shuhei

  公开号：US20090246695A1

  公开（公告）日：2009-10-01

  An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition are provided, the composition including (A) a resin containing a repeating unit having a group represented by formula (1) as defined in the specification, the resin being capable of increasing a solubility of the resin in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a polymerizable compound represented by formula (M-1) as defined in the specification and a polymer compound obtained by polymerizing the polymerizable compound are provided.
• US8637623B2
  申请人：——

  公开号：US8637623B2

  公开（公告）日：2014-01-28
• Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound
  申请人：FUJIFILM Corporation

  公开号：EP2105440B1

  公开（公告）日：2012-10-24