(6-Cyano-5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl) 4-chlorobutanoate | 1189185-35-0

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: (6-Cyano-5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl) 4-chlorobutanoate
• CAS: 1189185-35-0
• 化学式: C₁₃H₁₄ClNO₄
• 分子量: 283.711
• InChiKey: KVNYJBLSDAZKRI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.3
• 重原子数：
  19
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.77
• 拓扑面积：
  76.4
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  甲基丙烯酸 、 (6-Cyano-5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl) 4-chlorobutanoate 在 potassium carbonate 、 potassium iodide 作用下， 以 N-甲基吡咯烷酮 为溶剂， 反应 8.0h， 生成 (6-Cyano-5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl) 4-(2-methylprop-2-enoyloxy)butanoate
  参考文献：
  名称：

  Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound

  摘要：

  公开号：

  EP2105440B1
• 作为产物：
  描述：

  1-cyano-5-hydroxy-3-oxatricyclo[4.2.1.0(4,8)]nonan-2-one 、 4-氯丁酰氯 在 吡啶 作用下， 以 四氢呋喃 为溶剂， 生成 (6-Cyano-5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl) 4-chlorobutanoate
  参考文献：
  名称：

  Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound

  摘要：

  公开号：

  EP2105440B1

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE SAME, POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND
  申请人：YAMAGUCHI Shuhei

  公开号：US20090246695A1

  公开（公告）日：2009-10-01

  An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition are provided, the composition including (A) a resin containing a repeating unit having a group represented by formula (1) as defined in the specification, the resin being capable of increasing a solubility of the resin in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a polymerizable compound represented by formula (M-1) as defined in the specification and a polymer compound obtained by polymerizing the polymerizable compound are provided.
• Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound
  申请人：FUJIFILM Corporation

  公开号：EP2105440B1

  公开（公告）日：2012-10-24