LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:HASEGAWA Koji
公开号:US20090233242A1
公开(公告)日:2009-09-17
Lactone-containing compounds having formula (1) are novel wherein R
1
is H, F, methyl or trifluoromethyl, R
2
and R
3
are H or monovalent hydrocarbon groups, or R
2
and R
3
may together form an aliphatic hydrocarbon ring, R
4
is H or CO
2
R
5
, R
5
is a monovalent hydrocarbon group, W is CH
2
, O or S, and k
1
is 3, 4 or 5. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.