申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20220146931A1
公开(公告)日:2022-05-12
Disclosed are a salt represented by formula (I), an acid generator and a resist composition:
wherein Q
1
and Q
2
each represent a fluorine atom or a perfluoroalkyl group; R
11
and R
12
each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; X
1
and X
2
each represent *—CO—O—, *—O—CO—, etc.; L
1
represents a single bond or a hydrocarbon group which may have a substituent; A
1
represents a group having a lactone structure which may have a substituent; L
2
and L
3
each represent a single bond or an alkanediyl group; R
1
represents an iodine atom or a haloalkyl group; R
2
represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m2 represents an integer of 0 to 4; and Z
+
represents an organic cation.
公开了一种由式(I)表示的盐、酸发生剂和抗蚀组合物:其中Q1和Q2分别表示氟原子或全氟烷基;R11和R12分别表示氢原子、氟原子或全氟烷基;z表示0至6的整数;X1和X2分别表示*—CO—O—、*—O—CO—等;L1表示单键或可具有取代基的碳氢基团;A1表示具有内酯结构的基团,可能具有取代基;L2和L3分别表示单键或脂肪二烷基基团;R1表示碘原子或卤代烷基;R2表示卤原子、羟基、卤代烷基或烷基;m2表示0至4的整数;Z+表示有机阳离子。