New copolymers are disclosed which are copolymers of 1-(1'-cyanoethenyl)adamantane or 2-norbornene-2-carbonitrile monomer with an acrylate or methacrylate monomer. Resist compositions are also disclosed which comprise one of the disclosed new copolymers and an acid generator. The resist compositions advantageously form thinner resist films on substrates and, on the exposure to light having a short wavelength, such as KrF and ArF excimer laser light, provide finer resist pattern required in the production of advanced, highly integrated semiconductor devices. Novel 1-(1'-cyanoethenyl)adamantane is also disclosed.
                            本发明揭示了一种新的共聚物,其由1-(1'-
氰基
乙烯基)
金刚烷或2-去氢莫反烯-2-碳腈单体与
丙烯酸酯或
甲基丙烯酸酯单体共聚而成。还揭示了包括所述新的共聚物和酸发生剂的抗蚀剂组合物。这些抗蚀剂组合物在基底上形成更薄的抗蚀膜,并在短波长光的照射下,例如KrF和ArF准分子激光光,提供了在高度集成的半导体器件生产中所需的更细的抗蚀图案。此外,还揭示了新型的1-(1'-
氰基
乙烯基)
金刚烷。