GENERATION OF ENDO- AND/OR EXO-NORBORNENECARBOXALDEHYDE AS AN INTERMEDIATE TO FUNCTIONALIZED NORBORNENES
申请人:Bell Andrew
公开号:US20090118539A1
公开(公告)日:2009-05-07
Embodiments in accordance with the present invention provide for forming essentially pure diastereomers of 5/6-substituted norbornene-type monomers. Further, embodiments in accordance with the present invention encompass polymerizing such diastereomers to form addition or ROMP polymers where a desired exo-/endo-ratio of the diastereomers is provided to the polymerization, such ratio designed to provide a desired ratio of endo-/exo-structured repeating units for a resulting polymer to have desired physical or chemical properties.
Process for forming perfluorinated-alkyl sulfonamide substituted norbornene-type monomers
申请人:Bell Andrew
公开号:US20080027246A1
公开(公告)日:2008-01-31
Embodiments in accordance with the present invention are directed to providing processes for forming fluorinated-alkyl and particularly perfluorinated-alkyl sulfonamide substituted norbornene-type monomers.
本发明实施例涉及提供用于形成氟化烷基和特别是全氟烷基磺酰胺取代的诺博烯型单体的过程。
3-Acetoxy-2-dimethylphosphonoacrylates. New Dienophiles and Their Use for the Synthesis of Carbocyclic C-Nucleoside Precursors by the Aid of RRA Reaction
作者:Nobuya Katagiri、Mitsuo Yamamoto、Chikara Kaneko
DOI:10.1246/cl.1990.1855
日期:1990.10
3-acetoxy-2-dimethylphosphonoacrylates, have been prepared and their Diels-Alder reactions with cyclopentadiene investigated. The [4 + 2] adducts thus formed were converted to carbocyclic C-nucleosideprecursors by means of reductive retrograde aldol (RRA) reaction.
Photoresist composition for deep ultraviolet lithography
申请人:——
公开号:US20020187419A1
公开(公告)日:2002-12-12
The present invention relates to a novel photoresist composition sensitive in the deep ultraviolet region and a method of processing the novel photoresist, where the photoresist comprises a novel copolymer, a photoactive component, and a solvent. The novel copolymer comprises a unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and a unit derived from an unsaturated cyclic non aromatic compound.
NOVEL POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS
申请人:——
公开号:US20030013831A1
公开(公告)日:2003-01-16
The present invention relates to a novel polymer comprising at least one unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and at least one nonaromatic cyclic unit. The novel polymer is particularly useful when used in a photoresist composition sensitive in the deep ultraviolet region.