MATERIAL FOR RESIST PROTECTIVE FILM FOR IMMERSION LITHOGRAPHY
申请人:Takebe Yoko
公开号:US20090061360A1
公开(公告)日:2009-03-05
To provide a resist protective film material for immersion lithography.
An alkali soluble resist protective film material for immersion lithography, which comprises a polymer (F) containing repeating units (F
U
) formed by polymerizing a polymerizable compound (f
m
) having a fluorine-containing bridged cyclic structure. For example, repeating units (F
U
) are repeating units formed by polymerizing a compound (f) selected from the group consisting of the following formulae (f1) to (f4) (R
F
represents H, F, a C
1-3
alkyl group or a C
1-3
fluoroalkyl group, and X
F
represents F, OH or CH
2
OH.)
FLUOROCOMPOUND HAVING HIGHLY FLUORINATED NORBORNANE STRUCTURE, FLUOROPOLYMER, AND THEIR PRODUCTION PROCESSES
申请人:MATSUKAWA Yasuhisa
公开号:US20090192330A1
公开(公告)日:2009-07-30
To provide a novel polymerizable fluorocompound having a highly fluorinated norbornane structure, and a polymer obtained from the compound. Further, their production processes and a novel intermediate useful for the processes.
A novel compound (1) such as a compound (11) or a compound (12), and its polymer. A compound (2) such as a compound (21) or (22), and a compound (3) such as a compound (31) or (32
M
), which are useful as an intermediate for the production of the compound (1), and its production process. However, each of Z
A
to Z
E
represents such as —CH(—OC(O)C(CH
3
)═CH
2
)— or —CF
2
, Each of W
A
and W
B
represents such as F, each of Y
A
to Y
E
represents such as —CH(—OH)— or —CF(CH
2
OH), and each of X
A
to X
E
represents such as —C(O)— or —CF
2
—.
NOVEL FLUORINATED COMPOUND, FLUOROPOLYMER AND METHOD FOR PRODUCING THE COMPOUND
申请人:Murata Koichi
公开号:US20100016532A1
公开(公告)日:2010-01-21
To provide a novel fluorinated compound, a fluoropolymer and a method for producing the compound.
A compound represented by the formula CF
2
═CFCF
2
C(X)(C(O)OZ)(CH
2
)
n
CR═CHR (wherein X is a hydrogen atom, a cyano group or a group represented by the formula —C(O)OZ, Z is a hydrogen atom or a C
1-20
monovalent organic group, n is 0, 1, or 2, and R is a hydrogen atom or a C
1-20
monovalent organic group), a method for producing it, and a fluoropolymer obtained by polymerizing the compound.