2-Methyl-2-hydroxymethyl-norboran | 7106-01-6

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 2-Methyl-2-hydroxymethyl-norboran
• 英文别名: (2-Methylbicyclo[2.2.1]heptan-2-yl)methanol；(2-methyl-2-bicyclo[2.2.1]heptanyl)methanol
• CAS: 7106-01-6
• 化学式: C₉H₁₆O
• 分子量: 140.225
• InChiKey: JLHGMGQPZNWAHH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  10
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  2-甲基降冰片-5-烯-2-甲醇 在 Pd/BaCO₃ 氢气 作用下， 以 乙醇 为溶剂， 生成 2-Methyl-2-hydroxymethyl-norboran
  参考文献：
  名称：

  Kraus,W.; Schmutte,P., Chemische Berichte, 1966, vol. 99, p. 2259 - 2266

  摘要：

  DOI：

文献信息

• Polymerizable ester compounds, polymers, resist compositions and patterning process
  申请人：Watanabe Takeru

  公开号：US20080008962A1

  公开（公告）日：2008-01-10

  Novel polymerizable ester compounds having formulae (1) to (4) undergo no acid-induced decomposition by β-elimination wherein A 1 is a polymerizable functional group having a carbon-carbon double bond, R 1 is H or —C—(R 5 ) 3 , R 2 and R 3 are alkyl, R 4 is H or alkyl, R 5 is a monovalent hydrocarbon group, X is alkylene, Y is methylene, ethylene or isopropylidene, Z is alkylene, and n=1 or 2. Resist compositions comprising polymers derived from the ester compounds have excellent sensitivity and resolution and lend themselves to micropatterning lithography.

  具有式（1）至（4）的新型可聚合酯化合物在β-消除反应中不会发生酸诱导分解，其中A1是具有碳-碳双键的可聚合官能团，R1为H或-C-（R5）3，R2和R3为烷基，R4为H或烷基，R5为一价的碳氢基团，X为烷基，Y为亚甲基、乙烯基或异丙基亚甲基，Z为烷基，n=1或2。由酯化合物衍生的聚合物制备的抗蚀剂具有优异的敏感性和分辨率，并适用于微型图案制造技术。
• Substituted Pyrazolo [1,5-A] Pyrimidine Compounds as TRK Kinase Inhibitors
  申请人：Array BioPharma Inc.

  公开号：US20150031667A1

  公开（公告）日：2015-01-29

  Compounds of Formula I: and salts thereof in which R 1 , R 2 , R 3 , R 4 , X, Y and n have the meanings given in the specification, are inhibitors of Trk kinases and are useful in the treatment of diseases which can be treated with a Trk kinase inhibitor such as pain, cancer, inflammation, neurodegenerative diseases and certain infectious diseases.

  公式I的化合物及其盐，其中R1、R2、R3、R4、X、Y和n的含义如说明书所述，是Trk激酶的抑制剂，并可用于治疗可以用Trk激酶抑制剂治疗的疾病，如疼痛、癌症、炎症、神经退行性疾病和某些传染性疾病。
• Movel photoacid generators, resist compositons, and patterning processes
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2033966A2

  公开（公告）日：2009-03-11

  Photoacid generators generate sulfonic acids of formula (1a) or (1c) upon exposure to high-energy radiation.         R1-COOCH(CF3)CF2SO3-H+     (1a)         R1-O-COOCH(CF3)CF2SO3-H+     (1c) R1 is a C20-C50 hydrocarbon group having a steroid structure. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.

  光酸发生器在受到高能辐射后会生成式 (1a) 或 (1c) 的磺酸。 R1-COOCH(CF3)CF2SO3-H+ (1a) R1-O-COOCH( )CF2SO3-H+ (1c) R1 是具有类固醇结构的 C20-C50 碳氢基团。光酸发生器与树脂兼容，可以控制酸扩散，因此适合用于化学放大抗蚀剂组合物。
• Lactone-containing compound, polymer, resist composition, and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2100887A1

  公开（公告）日：2009-09-16

  Lactone-containing compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic hydrocarbon ring, R4 is H or CO2R5, R5 is a monovalent hydrocarbon group, W is CH2, O or S, and k1 is 3, 4 or 5. They are useful as monomers to produce polymers which are transparent to radiation s 500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.

  具有式（1）的含乳酮化合物是新型化合物，其中 R1 是 H、F、甲基或三氟甲基，R2 和 R3 是 H 或单价烃基，或 R2 和 R3 可共同形成脂肪族烃环，R4 是 H 或 CO2R5，R5 是单价烃基，W 是 CH2、O 或 S，k1 是 3、4 或 5。它们可用作单体，生产出对 500 纳米波长辐射透明的聚合物。以这些聚合物为基础树脂的辐射敏感抗蚀剂组合物具有优异的性能，包括分辨率、LER、图案密度依赖性和曝光余量。
• Hydroxyl-containing monomer, polymer, resist composition, and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2103592A2

  公开（公告）日：2009-09-23

  A hydroxyl-containing monomer of formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are monovalent C1-C15 hydrocarbon groups, or R2 and R3 may form an aliphatic ring. The monomers are useful for the synthesis of polymers which have high transparency to radiation of up to 500 nm and the effect of controlling acid diffusion so that the polymers may be used as a base resin to formulate radiation-sensitive resist compositions having a high resolution.

  提供了一种式（1）的含羟基单体，其中 R1 为 H、F、甲基或三氟甲基，R2 和 R3 为单价 C1-C15 烃基，或 R2 和 R3 可形成脂肪族环。这些单体可用于合成对高达 500 纳米的辐射具有高透明度的聚合物，并具有控制酸扩散的效果，从而可将这些聚合物用作基础树脂，配制出具有高分辨率的辐射敏感抗蚀剂组合物。