endo-2-acetyl-exo-2-methylbicyclo<2.2.1>heptane | 75658-54-7

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: endo-2-acetyl-exo-2-methylbicyclo<2.2.1>heptane
• 英文别名: exo-2-acetyl-endo-2-methylbicyclo<2.2.1>heptane；endo-1-(2-methylbicyclo[2.2.1]hept-2-yl)-ethanone；1-(2-Methyl-2-bicyclo[2.2.1]heptanyl)ethanone
• CAS: 75658-54-7
• 化学式: C₁₀H₁₆O
• 分子量: 152.236
• InChiKey: MPTMBQUJFYZBJI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  11
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.9
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  降樟脑 在 盐酸 、 p-nitrobenzenesulfonyl azide 、 potassium hydrogensulfate 作用下， 反应 4.0h， 生成 endo-2-acetyl-exo-2-methylbicyclo<2.2.1>heptane
  参考文献：
  名称：

  Reaction of p-nitrobenzenesulfonyl azide with alkylidenecycloalkanes

  摘要：

  DOI：

  10.1021/jo00315a023

文献信息

• [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU AU RAYONNEMENT ET PROCÉDÉ DE FORMATION DE MOTIFS AU MOYEN DE LA COMPOSITION
  申请人：FUJIFILM CORP

  公开号：WO2010035905A1

  公开（公告）日：2010-04-01

  An actinic ray-sensitive or radiation-sensitive resin composition comprising any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, -O-, -S-, -C(=O)-, -S(=O)-, -S(=O)?2- and OS(=O)2-, provided that -C(=O)O- is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion.

  一种光化学射线敏感性或辐射敏感性树脂组合物，包括下面的通式(I)中的任何一种化合物；其中：Ar代表可能具有除了-(A-B)基团之外的取代基的芳香环；n为大于等于1的整数；A代表从单键、烷基基团、-O-、-S-、-C(=O)-、-S(=O)-、-S(=O)2-和OS(=O)2-中选取的任意一个或两个以上成员的组合，但不包括-C(=O)O-；B代表含有4个或更多碳原子的烃基团的基团，当n大于等于2时，两个或更多个-(A-B)基团可以相同或不同；M+代表有机离子。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION
  申请人：TSUCHIMURA Tomotaka

  公开号：US20110171577A1

  公开（公告）日：2011-07-14

  An actinic ray-sensitive or radiation-sensitive resin composition includes any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, —O—, —S—, —C(═O)—, —S(═O)—, —S(═O) 2 — and —OS(═O) 2 —, provided that —C(═O)O— is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M + represents an organic onium ion.

  一种感光射线敏感或辐射敏感的树脂组合物包括下列通式（I）中的任何一种化合物；其中：Ar代表可能具有除了-(A-B)基团以外的取代基的芳香环；n是大于等于1的整数；A代表从单键、烷基、—O—、—S—、—C（═O）—、—S（═O）—、—S（═O）2—和—OS（═O）2—中任意选择一个或两个或两个以上成员的组合，但不包括—C（═O）O—；B代表一个含有4个或更多碳原子的烃基团，其中包含一个三级或季级碳原子，当n大于等于2时，两个或两个以上的-(A-B)基团可以相同或不同；M+代表有机阳离子。
• METHOD FOR PRODUCING SILICON COMPOUND, AND SILICON COMPOUND
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20200115400A1

  公开（公告）日：2020-04-16

  The present invention provides a method for producing a silicon compound shown by the following general formula (3) through a hydrosilylation reaction between a hydrosilane compound shown by the following general formula (1) and a carbonyl group-containing alicyclic olefin compound shown by the following general formula (2), in which the hydrosilylation reaction takes place while an acidic compound or acidic compound precursor is gradually added in presence of a platinum-based catalyst. This provides a highly-efficient industrial method for producing an industrially useful, hydrolysable silicon compound having an alicyclic structure (particularly a norbornane ring) and a carbonyl group.
• US8900791B2
  申请人：——

  公开号：US8900791B2

  公开（公告）日：2014-12-02
• Reaction of p-nitrobenzenesulfonyl azide with alkylidenecycloalkanes
  作者：Samuel P. McManus、Margarita Ortiz、Rudolph A. Abramovitch

  DOI：10.1021/jo00315a023

  日期：1981.1