spiro[bicyclo[2.2.1]heptane-2,2'-[1,3]dioxolane] | 172-98-5

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: spiro[bicyclo[2.2.1]heptane-2,2'-[1,3]dioxolane]
• 英文别名: Spiro[1,3-dioxane-2,2'-bicyclo[2.2.1]heptane]
• CAS: 172-98-5
• 化学式: C₁₀H₁₆O₂
• 分子量: 168.236
• InChiKey: YHYPZJMUKJRDMR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  spiro[bicyclo[2.2.1]heptane-2,2'-[1,3]dioxolane] 在 Zn(N₃)₂*Py₂ 、 potassium carbonate 、 N,N-二异丙基乙胺 、 三苯基膦 作用下， 以 四氢呋喃 、 甲醇 为溶剂， 反应 1.0h， 生成 2-(3-azidopropoxy)bicyclo[2.2.1]hept-2-ene
  参考文献：
  名称：

  桥联酮与1,3-和1,4-卤代烷基叠氮化物的碱促进反应：酮醇酸酯的竞争性烷基化与叠氮化反应

  摘要：

  1，3-和1，4-卤代烷基叠氮化物与2-降冰片烷酮的烯酸酯（和扩环的类似物）反应可得到高产率的多环1,2,3-三唑啉。该反应通过酮烯醇酸酯的初始叠氮化而发生，随后依次是三唑啉形成和O-烷基化。该方法的一个有趣的元素是叠氮化物烷基与烯醇酸根阴离子的优先反应，而不是更常见的烷基卤化物（包括Cl和I衍生物）反应。无环或单环烯酸酯的反应通常产生1,2,3-三唑，但是没有可替代的C-烷基化产物。

  DOI：

  10.1021/jo0356098
• 作为产物：
  描述：

  降樟脑 、 1,3-丙二醇 以90%的产率得到spiro[bicyclo[2.2.1]heptane-2,2'-[1,3]dioxolane]
  参考文献：
  名称：

  桥联酮与1,3-和1,4-卤代烷基叠氮化物的碱促进反应：酮醇酸酯的竞争性烷基化与叠氮化反应

  摘要：

  1，3-和1，4-卤代烷基叠氮化物与2-降冰片烷酮的烯酸酯（和扩环的类似物）反应可得到高产率的多环1,2,3-三唑啉。该反应通过酮烯醇酸酯的初始叠氮化而发生，随后依次是三唑啉形成和O-烷基化。该方法的一个有趣的元素是叠氮化物烷基与烯醇酸根阴离子的优先反应，而不是更常见的烷基卤化物（包括Cl和I衍生物）反应。无环或单环烯酸酯的反应通常产生1,2,3-三唑，但是没有可替代的C-烷基化产物。

  DOI：

  10.1021/jo0356098

文献信息

• SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210371376A1

  公开（公告）日：2021-12-02

  A salt represented by formula (I): wherein R 1 and R 2 each independently represent a hydroxy group, —O—R 10 , —O—CO—O—R 10 or —O-L 1 -CO—O—R 10 ; L 1 represents an alkanediyl group having 1 to 6 carbon atoms; R 4 , R 5 , R 7 and R 8 each independently represent a halogen atom, an alkyl fluoride group having 1 to 12 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, the hydrocarbon group may have a substituent, and —CH 2 — included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO 2 —; R 10 represents an acid-labile group; X 1 and X 2 each independently represent an oxygen atom or a sulfur atom; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4; and AI − represents an organic anion.

  一种由化学式（I）表示的盐：其中R1和R2分别代表一个羟基，-O-R10，-O-CO-O-R10或-O-L1-CO-O-R10；L1代表具有1至6个碳原子的烷二基基团；R4、R5、R7和R8分别独立地表示卤素原子，具有1至12个碳原子的烷基氟基团或具有1至18个碳原子的碳氢基团，碳氢基团可能有取代基，并且碳氢基团中包含的-CH2-可被-O-，-CO-，-S-或-SO2-取代；R10代表一个酸敏感基团；X1和X2分别独立地表示一个氧原子或一个硫原子；m1表示1至5的整数，m2和m8表示0至5的整数，m4、m5和m7表示0至4的整数；AI-代表一个有机阴离子。
• SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING SALT
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20200385343A1

  公开（公告）日：2020-12-10

  Disclosed are a salt represented by formula (1), and a method for producing the salt, and a quencher and a resist composition comprising the same: wherein R 1 and R 2 each represent a hydrocarbon group, and —CH 2 — included in the hydrocarbon group may be replaced by —O— or —CO—; R 3 , R 4 and R 5 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, and —CH 2 — included in the hydrocarbon group may be replaced by —O— or —CO—; m3 represents an integer of 0 to 2, and when m3 is 2, two R 3 may be the same or different from each other; and m4 and m5 represent an integer of 0 to 5, and when m4 and/or m5 is/are 2 or more, a plurality of R 4 and/or a plurality of R 5 may be the same or different from each other.

  揭示了一种由化学式（1）表示的盐，以及生产该盐的方法，以及包括该盐的熄灭剂和抗蚀组合物：其中R1和R2分别代表一个碳氢基团，碳氢基团中包含的—CH2—可以被—O—或—CO—替代；R3、R4和R5分别代表卤素原子、烷基氟基团或碳氢基团，碳氢基团中包含的— —可以被—O—或—CO—替代；m3表示0到2的整数，当m3为2时，两个R3可能相同也可能不同；m4和m5表示0到5的整数，当m4和/或m5为2或更多时，多个R4和/或多个R5可能相同也可能不同。
• SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210063875A1

  公开（公告）日：2021-03-04

  Disclosed are a salt represented by formula (I), a quencher, and a resist composition including the same:

  揭示了一种由化学式（I）表示的盐，一种淬火剂，以及包括它们的抗蚀组合物：
• CARBOXYLATE, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210371377A1

  公开（公告）日：2021-12-02

  A carboxylate represented by formula (I), a quencher and a resist composition including the same: wherein R 1 , R 2 and R 3 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group which may have a substituent, —CH 2 — included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO 2 —, m1 represents an integer of 0 to 5, m2 represents an integer of 0 to 4, m3 represents an integer of 0 to 3, and X 1 represents a single bond, —CH 2 —, —O—, —S—, —CO—, —SO— or —SO 2 —.

  一种以式(I)表示的羧酸盐、淬灭剂和包括该羧酸盐的抗蚀组合物：其中，R1、R2和R3分别表示卤素原子、氟代烷基或烃基，该烃基可以有取代基，烃基中包括的—CH2—可以被—O—、—CO—、—S—或—SO2—替换，m1表示0到5的整数，m2表示0到4的整数，m3表示0到3的整数，X1表示单键、— —、—O—、—S—、—CO—、—SO—或—SO2—。
• Compositions comprising aromatic compounds for use in oil and/or gas wells and related methods
  申请人：Flotek Chemistry, LLC

  公开号：US20190055459A1

  公开（公告）日：2019-02-21

  Compositions comprising aromatic compounds for use in various aspects of a life cycle of an oil and/or gas well, and related methods, are generally provided. In some embodiments, the composition is an emulsion or a microemulsion comprising a cashew nut shell liquid, a derivatized cashew nut shell liquid, an aromatic compound having a melting point above room temperature, and/or a non-aromatic compound having a melting point above room temperature. In some embodiments, the emulsion or the microemulsion comprises an aqueous phase, a non-aqueous phase, and at least one surfactant, and an additive which is an aromatic compound or mixture of aromatic compounds having a melting point above room temperature.