2-Hydroxy-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-6-carboxylic acid | 1189185-40-7

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 2-Hydroxy-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-6-carboxylic acid
• CAS: 1189185-40-7
• 化学式: C₉H₁₀O₅
• 分子量: 198.175
• InChiKey: LZGWBNWSMNMDTI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.2
• 重原子数：
  14
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  83.8
• 氢给体数：
  2
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  甲醇 、 2-Hydroxy-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-6-carboxylic acid 在 对甲苯磺酸 作用下， 以 甲苯 为溶剂， 反应 3.0h， 生成 Methyl 2-hydroxy-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-6-carboxylate
  参考文献：
  名称：

  Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound

  摘要：

  公开号：

  EP2105440B1
• 作为产物：
  描述：

  1-cyano-5-hydroxy-3-oxatricyclo[4.2.1.0(4,8)]nonan-2-one 在 水 、 sodium hydroxide 、 盐酸 作用下， 反应 15.0h， 生成 2-Hydroxy-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-6-carboxylic acid
  参考文献：
  名称：

  Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound

  摘要：

  公开号：

  EP2105440B1

文献信息

• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM
  申请人：Enomoto Yuichiro

  公开号：US20120282548A1

  公开（公告）日：2012-11-08

  Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.

  提供的是一种形成图案的方法，包括(i)使用光致或辐射敏感树脂组成物形成薄膜的步骤，(ii)曝光薄膜的步骤，以及(iii)使用有机溶剂含有的显影剂显影曝光后的薄膜的步骤，其中光致或辐射敏感树脂组成物包括(A)一种能够通过酸的作用降低有机溶剂含有的显影剂的溶解度的树脂，(B)一种能够在光致或辐射照射下生成酸的化合物，(D)一种溶剂，以及(G)一种具有氟原子和硅原子中的至少一种，并具有碱性或能够通过酸的作用增加碱性的化合物。
• COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：Sumitomo Chemical Company, Limited

  公开号：EP3581594B1

  公开（公告）日：2021-12-29
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE SAME, POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND
  申请人：YAMAGUCHI Shuhei

  公开号：US20090246695A1

  公开（公告）日：2009-10-01

  An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition are provided, the composition including (A) a resin containing a repeating unit having a group represented by formula (1) as defined in the specification, the resin being capable of increasing a solubility of the resin in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a polymerizable compound represented by formula (M-1) as defined in the specification and a polymer compound obtained by polymerizing the polymerizable compound are provided.
• POLYMERIZABLE COMPOUND, LACTONE-CONTAINING COMPOUND, METHOD FOR MANUFACTURING LACTONE-CONTAINING COMPOUND AND POLYMER COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND
  申请人：IIZUKA Yusuke

  公开号：US20100152400A1

  公开（公告）日：2010-06-17

  A polymerizable compound having a lactone structure represented by formula (1) is provided: wherein A represents a polymerizable site; R 2 represents a single bond or an alkylene group; R 3 represents a hydrocarbon group in which hydrogen atoms are substituted with a fluorine atom; R 4 represents a halogen atom, a cyano group, a hydroxy group, an amide group, an alkyl group, a cycloalkyl group, an alkoxy group, a phenyl group, an acyl group, an alkoxycarbonyl group, or a group represented by R—C(═O)— or R—C(═O)O—, wherein R represents an alkyl group or a cycloalkyl group; X represents an alkylene group, an oxygen atom or a sulfur atom; Z represents a single bond, an ether bond, an ester bond, an amide bond, a urethane bond or a urea bond; n represents an integer of from 0 to 5; and m represents an integer of from 0 to 7.
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
  申请人：Hirano Shuji

  公开号：US20110236828A1

  公开（公告）日：2011-09-29

  An actinic ray-sensitive or radiation-sensitive resin composition, includes: (A) a resin capable of increasing the solubility of the resin (A) in an alkali developer by the action of an acid; and (C) a resin having at least either a fluorine atom or a silicon atom and containing (c) a repeating unit having at least two or more polarity conversion groups.